Inventor · disambiguated record
Go Higashihara
Also filed as: HIGASHIHARA GO
10 granted patents·4 pending applications·25 citations·filing 2008–2016
82Inventor score
Top patents by PatentIndex Score
14 records- 0192US9316913B2Underlayer film-forming material for lithography, underlayer film for lithography, and pattern formation methodECHIGO MASATOSHI·Filed 2012·Granted Apr 19, 2016·15 cites·9 claims
- 0275US8592134B2Composition for forming base film for lithography and method for forming multilayer resist patternOGURO DAI·Filed 2008·Granted Nov 26, 2013·5 cites·18 claims
- 0367US10160824B2Cyanate ester compound, curable resin composition containing said compound, and cured product of said compositionMITSUBISHI GAS CHEMICAL CO·Filed 2014·Granted Dec 25, 2018·1 cites·9 claims
- 0467US8741553B2Aromatic hydrocarbon resin, underlayer film forming composition for lithography, and method for forming multilayer resist patternHIGASHIHARA GO·Filed 2011·Granted Jun 3, 2014·3 cites·12 claims
- 0560US9562130B2Aromatic hydrocarbon formaldehyde resin, modified aromatic hydrocarbon formaldehyde resin and epoxy resin, and methods for producing theseMITSUBISHI GAS CHEMICAL CO·Filed 2014·Granted Feb 7, 2017·0 cites·20 claims
- 0657US9725551B2Aromatic hydrocarbon formaldehyde resin, modified aromatic hydrocarbon formaldehyde resin and epoxy resin, and method for producing theseMITSUBISHI GAS CHEMICAL CO·Filed 2014·Granted Aug 8, 2017·0 cites·19 claims
- 0754US9110373B2Phenolic resin and material for forming underlayer film for lithographyUCHIYAMA NAOYA·Filed 2012·Granted Aug 18, 2015·1 cites·14 claims
- 0851US9200105B2Naphthalene formaldehyde resin, deacetalized naphthalene formaldehyde resin, and modified naphthalene formaldehyde resinMITSUBISHI GAS CHEMICAL CO·Filed 2013·Granted Dec 1, 2015·0 cites·2 claims
- 0947US2015037736A1Acidic treatment-subjected monoalkylnaphthalene formaldehyde resinMITSUBISHI GAS CHEMICAL CO·Filed 2013·Application pending·0 cites
- 1037US10359701B2Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming methodMITSUBISHI GAS CHEMICAL CO·Filed 2016·Granted Jul 23, 2019·0 cites·15 claims
- 1134US10338471B2Composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming methodMITSUBISHI GAS CHEMICAL CO·Filed 2015·Granted Jul 2, 2019·0 cites·11 claims
- 1234US2018101097A1Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming methodMITSUBISHI GAS CHEMICAL CO·Filed 2016·Application pending·0 cites
- 1333US2018052392A1Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, resist pattern forming method, and circuit pattern forming methodMITSUBISHI GAS CHEMICAL CO·Filed 2016·Application pending·0 cites
- 1433US2014246400A1Resin having fluorene structure and material for forming underlayer film for lithographyHIGASHIHARA GO·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →