Inventor · disambiguated record
Guangwei Wu
Also filed as: WU GUANGWEI
10 granted patents·5 pending applications·160 citations·filing 1997–2014
88Inventor score
Top patents by PatentIndex Score
15 records- 0191US9162341B2Chemical-mechanical planarization pad including patterned structural domainsINNOPAD INC·Filed 2013·Granted Oct 20, 2015·15 cites·5 claims
- 0284US8684794B2Chemical mechanical planarization pad with void networkLEFEVRE PAUL·Filed 2008·Granted Apr 1, 2014·15 cites·25 claims
- 0382US5770103AComposition and method for polishing a composite comprising titaniumRODEL INC·Filed 1997·Granted Jun 23, 1998·66 cites·17 claims
- 0476US6001269AMethod for polishing a composite comprising an insulator, a metal, and titaniumRODEL INC·Filed 1997·Granted Dec 14, 1999·48 cites·10 claims
- 0567US8758659B2Method of grooving a chemical-mechanical planarization padLEFEVRE PAUL·Filed 2010·Granted Jun 24, 2014·2 cites·19 claims
- 0665US7118461B2Smooth pads for CMP and polishing substratesTHOMAS WEST INC·Filed 2003·Granted Oct 10, 2006·12 cites·8 claims
- 0762US8435099B2Chemical-mechanical planarization pad including patterned structural domainsLEFEVRE PAUL·Filed 2010·Granted May 7, 2013·1 cites·14 claims
- 0860US9796063B2Multi-layered chemical-mechanical planarization padFNS TECH CO LTD·Filed 2014·Granted Oct 24, 2017·0 cites·13 claims
- 0956US8377351B2Polishing pad with controlled void formationINNOPAD INC·Filed 2008·Granted Feb 19, 2013·1 cites·16 claims
- 1051US8790165B2Multi-layered chemical-mechanical planarization padLEFEVRE PAUL·Filed 2010·Granted Jul 29, 2014·0 cites·8 claims
- 1142US2004053132A1Improved fuel for a zinc-based fuel cell and regeneration thereofFiled 2003·Application pending·0 cites
- 1239US2004251126A1Recirculating anodeFiled 2001·Application pending·0 cites
- 1337US2003194955A1Conditioner and conditioning methods for smooth padsFiled 2003·Application pending·0 cites
- 1435US2007087177A1Stacked pad and method of useWU GUANGWEI·Filed 2004·Application pending·0 cites
- 1531US2002137431A1Methods and apparatus for polishing and planarizationFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →