Inventor · disambiguated record
Hartmut Enkisch
Also filed as: ENKISCH HARTMUT · TRENKLER JOHANN
26 granted patents·7 pending applications·45 citations·filing 2004–2024
93Inventor score
Top patents by PatentIndex Score
33 records- 0193US10545323B2Projection optical unit for EUV projection lithographyZEISS CARL SMT GMBH·Filed 2018·Granted Jan 28, 2020·13 cites·21 claims
- 0288US9304405B2Microlithography illumination system and microlithography illumination optical unitFIOLKA DAMIAN·Filed 2010·Granted Apr 5, 2016·5 cites·13 claims
- 0384US10423073B2Method for producing a mirror elementZEISS CARL SMT GMBH·Filed 2016·Granted Sep 24, 2019·5 cites·10 claims
- 0483US10809625B2Intensity adaptation filter for EUV microlithography, method for producing same, and illumination system having a corresponding filterZEISS CARL SMT GMBH·Filed 2019·Granted Oct 20, 2020·2 cites·20 claims
- 0580US10061204B2Mirror, in particular for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Aug 28, 2018·2 cites·11 claims
- 0675US9341958B2Deflection mirror and projection exposure apparatus for microlithography comprising such a deflection mirrorZEISS CARL SMT GMBH·Filed 2013·Granted May 17, 2016·2 cites·20 claims
- 0774US9720329B2Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Aug 1, 2017·1 cites·19 claims
- 0873US9778576B2Microlithography illumination system and microlithography illumination optical unitZEISS CARL SMT GMBH·Filed 2016·Granted Oct 3, 2017·1 cites·20 claims
- 0970US10331048B2Mirror, in particular for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2018·Granted Jun 25, 2019·1 cites·20 claims
- 1070US8605255B2Imaging optical system and projection exposure system including the sameMANN HANS-JUERGEN·Filed 2010·Granted Dec 10, 2013·2 cites·25 claims
- 1170US8164077B2Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical elementWEDOWSKI MARCO·Filed 2009·Granted Apr 24, 2012·3 cites·33 claims
- 1269US11073765B2Method for producing a reflective optical element and reflective optical elementZEISS CARL SMT GMBH·Filed 2018·Granted Jul 27, 2021·1 cites·14 claims
- 1368US10146136B2Reflecting coating with optimized thicknessZEISS CARL SMT GMBH·Filed 2015·Granted Dec 4, 2018·1 cites·19 claims
- 1467US7646004B2Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical elementZEISS CARL SMT AG·Filed 2006·Granted Jan 12, 2010·2 cites·50 claims
- 1565US7672044B2Lens made of a crystalline materialZEISS CARL SMT AG·Filed 2007·Granted Mar 2, 2010·3 cites·20 claims
- 1661US2010007866A1Method for producing facet mirrors and projection exposure apparatusZEISS CARL SMT AG·Filed 2009·Application pending·0 cites
- 1761US2025060517A1Optical system comprising an euv mirror and method for operating an optical systemZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 1858US12406777B2Optical element for a EUV projection exposure systemZEISS CARL SMT GMBH·Filed 2022·Granted Sep 2, 2025·0 cites·14 claims
- 1957US2023305290A1Mirror, optical system and method for operating an optical systemZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 2055US10598921B2Mirror element, in particular for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2017·Granted Mar 24, 2020·0 cites·19 claims
- 2153US2013242278A1Projection objective of a microlithographic projection exposure apparatus designed for EUV and a method of optically adjusting a projection objectiveZEISS CARL SMT GMBH·Filed 2013·Application pending·0 cites
- 2251US9285515B2Imaging optical system and projection exposure system including the sameZEISS CARL SMT GMBH·Filed 2013·Granted Mar 15, 2016·0 cites·29 claims
- 2351US2013100426A1Method for producing facet mirrors and projection exposure apparatusZEISS CARL SMT GMBH·Filed 2012·Application pending·0 cites
- 2450US2017176741A1Mirror element, in particular for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Application pending·0 cites
- 2547US10916356B2Reflective optical elementZEISS CARL SMT GMBH·Filed 2019·Granted Feb 9, 2021·0 cites·15 claims
- 2647US7429116B2Projection objective and method for its manufactureZEISS CARL SMT AG·Filed 2004·Granted Sep 30, 2008·1 cites·11 claims
- 2745US10520827B2Optical system, in particular for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2019·Granted Dec 31, 2019·0 cites·21 claims
- 2844US7292388B2Lens made of a crystalline materialZEISS CARL SMT AG·Filed 2004·Granted Nov 6, 2007·0 cites·30 claims
- 2942US9606446B2Reflective optical element for EUV lithography and method of manufacturing a reflective optical elementZEISS CARL SMT GMBH·Filed 2015·Granted Mar 28, 2017·0 cites·18 claims
- 3037US2009015951A1Projection objective and method for its manufactureZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 3134US9915873B2Reflective optical element, and optical system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Mar 13, 2018·0 cites·24 claims
- 3234US8457281B2Method for producing a multilayer coating, optical element and optical arrangementENKISCH HARTMUT·Filed 2010·Granted Jun 4, 2013·0 cites·16 claims
- 3333US9568845B2Mirror for use in a microlithography projection exposure apparatusROCKTAESCHEL MARTIN·Filed 2012·Granted Feb 14, 2017·0 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →