Inventor · disambiguated record
Haico Victor Kok
Also filed as: KOK HAICO V · KOK HAICO VICTOR
31 granted patents·6 pending applications·101 citations·filing 2002–2022
96Inventor score
Files withASML NETHERLANDS BV30ASML HOLDING NV2VAN DE KERKHOF MARCUS ADRIANUS2CORBEIJ WILHELMUS MARIA1KOK HAICO VICTOR1
Top patents by PatentIndex Score
37 records- 0191US12032299B2Metrology method and associated metrology and lithographic apparatusesASML NETHERLANDS BV·Filed 2020·Granted Jul 9, 2024·2 cites·25 claims
- 0289US9331117B2Sensor and lithographic apparatusASML NETHERLANDS BV·Filed 2013·Granted May 3, 2016·6 cites·7 claims
- 0389US7282701B2Sensor for use in a lithographic apparatusASML NETHERLANDS BV·Filed 2005·Granted Oct 16, 2007·12 cites·3 claims
- 0486US7453078B2Sensor for use in a lithographic apparatusASML NETHERLANDS BV·Filed 2007·Granted Nov 18, 2008·8 cites·3 claims
- 0584US8482718B2Lithographic apparatus and device manufacturing methodCORBEIJ WILHELMUS MARIA·Filed 2010·Granted Jul 9, 2013·5 cites·16 claims
- 0681US8760620B2Lithographic method to apply a pattern to a substrate and lithographic apparatusASML NETHERLANDS BV·Filed 2013·Granted Jun 24, 2014·2 cites·20 claims
- 0779US7443485B2Apodization measurement for lithographic apparatusASML NETHERLANDS BV·Filed 2005·Granted Oct 28, 2008·4 cites·20 claims
- 0875US9423688B2Lithographic method to apply a pattern to a substrate and lithographic apparatusASML NETHERLANDS BV·Filed 2014·Granted Aug 23, 2016·1 cites·4 claims
- 0975US7315353B2Apodization measurement for lithographic apparatusASML NETHERLANDS BV·Filed 2004·Granted Jan 1, 2008·11 cites·19 claims
- 1075US6747282B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2002·Granted Jun 8, 2004·12 cites·24 claims
- 1173US8436977B2Lithographic method to apply a pattern to a substrate and lithographic apparatusKOK HAICO VICTOR·Filed 2009·Granted May 7, 2013·3 cites·12 claims
- 1268US8049864B2Device manufacturing method and lithographic apparatusASML NETHERLANDS BV·Filed 2008·Granted Nov 1, 2011·2 cites·34 claims
- 1367US9753382B2Sensor, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Sep 5, 2017·1 cites·20 claims
- 1466US7409302B2Method and apparatus for vibration detection and vibration analysis, and lithographic apparatus equipped with such an apparatusASML NETHERLANDS BV·Filed 2005·Granted Aug 5, 2008·6 cites·18 claims
- 1566US7388652B2Wave front sensor with grey filter and lithographic apparatus comprising sameASML NETHERLANDS BV·Filed 2006·Granted Jun 17, 2008·2 cites·18 claims
- 1662US7242475B2Method of determining aberration of a projection system of a lithographic apparatusASML NETHERLANDS BV·Filed 2004·Granted Jul 10, 2007·6 cites·19 claims
- 1760US9891532B2Lithographic method to apply a pattern to a substrate and lithographic apparatusASML NETHERLANDS BV·Filed 2016·Granted Feb 13, 2018·0 cites·4 claims
- 1859US7187431B2Lithographic apparatus, method of determining properties thereof and computer programASML NETHERLANDS BV·Filed 2004·Granted Mar 6, 2007·5 cites·22 claims
- 1958US9690207B2Sensor system for lithographyASML NETHERLANDS BV·Filed 2013·Granted Jun 27, 2017·0 cites·20 claims
- 2058US2025028258A1Compensating optical system for nonuniform surfaces, a metrology system, lithographic apparatus, and methods thereofASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2157US9864282B2Sensor system for lithographyASML NETHERLANDS BV·Filed 2017·Granted Jan 9, 2018·0 cites·20 claims
- 2257US9170498B2Lithographic apparatus and a method for determining a polarization property of a projection system using an adjustable polarizer and interferometric sensorASML NETHERLANDS BV·Filed 2013·Granted Oct 27, 2015·0 cites·12 claims
- 2355US9971254B2Sensor, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted May 15, 2018·0 cites·20 claims
- 2455US8013977B2Lithographic apparatus, radiation sensor and method of manufacturing a radiation sensorASML NETHERLANDS BV·Filed 2006·Granted Sep 6, 2011·2 cites·25 claims
- 2555US6888151B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted May 3, 2005·3 cites·55 claims
- 2654US11022902B2Sensor, lithographic apparatus, and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Jun 1, 2021·0 cites·14 claims
- 2754US10481507B2Measurement method comprising in-situ printing of apparatus mark and corresponding apparatusASML HOLDING NV·Filed 2017·Granted Nov 19, 2019·0 cites·20 claims
- 2852US8629418B2Lithographic apparatus and sensor thereforVAN DE KERKHOF MARCUS ADRIANUS·Filed 2006·Granted Jan 14, 2014·0 cites·23 claims
- 2950US7113255B2Grating patch arrangement, lithographic apparatus, method of testing, device manufacturing method, and device manufactured therebyASML HOLDING NV·Filed 2003·Granted Sep 26, 2006·2 cites·29 claims
- 3050US2006203221A1Lithographic apparatus and a method for determining a polarization propertyASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 3148US7773235B2Method and apparatus for vibration detection and vibration analysis, and lithographic apparatus equipped with such an apparatusASML NETHERLANDS BV·Filed 2008·Granted Aug 10, 2010·1 cites·19 claims
- 3247US2009153830A1Device for Transmission Image Detection for Use in a Lithographic Projection Apparatus and a Method for Determining Third Order Distortions of a Patterning Device and/or a Projection System of Such a Lithographic ApparatusASML NETHERLANDS BV·Filed 2008·Application pending·0 cites
- 3344US7308368B2Method and apparatus for vibration detection, method and apparatus for vibration analysis, lithographic apparatus, device manufacturing method, and computer programASML NETHERLANDS BV·Filed 2004·Granted Dec 11, 2007·5 cites·20 claims
- 3440US9116446B2Lithographic apparatus and methodVOOGD ROBBERT JAN·Filed 2011·Granted Aug 25, 2015·0 cites·18 claims
- 3539US2010118288A1Lithographic projection system and projection lens polarization sensorVAN DE KERKHOF MARCUS ADRIANUS·Filed 2006·Application pending·0 cites
- 3639US2010182582A1Passive reticle tool, a lithographic apparatus and a method of patterning a device in a lithography toolASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 3739US2010045956A1Lithographic Apparatus, Method for Determining at Least One Polarization Property Thereof, Polarization Analyzer and Polarization Sensor ThereofASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →