Inventor · disambiguated record
Han-Kwang Nienhuys
Also filed as: NIENHUYS HAN-KWANG
31 granted patents·7 pending applications·55 citations·filing 2010–2023
95Inventor score
Top patents by PatentIndex Score
38 records- 0191US11175596B2Particle traps and barriers for particle suppressionASML NETHERLANDS BV·Filed 2018·Granted Nov 16, 2021·5 cites·26 claims
- 0291US8730448B2Lithographic apparatus and device manufacturing methodNIENHUYS HAN-KWANG·Filed 2012·Granted May 20, 2014·9 cites·19 claims
- 0388US12140875B2Metrology measurement method and apparatusASML NETHERLANDS BV·Filed 2021·Granted Nov 12, 2024·2 cites·15 claims
- 0484US11092902B2Method and apparatus for detecting substrate surface variationsASML NETHERLANDS BV·Filed 2018·Granted Aug 17, 2021·2 cites·14 claims
- 0584US9606445B2Lithographic apparatus and method of manufacturing a deviceASML NETHERLANDS BV·Filed 2013·Granted Mar 28, 2017·5 cites·21 claims
- 0684US9513566B2Lithographic apparatusASML NETHERLANDS BV·Filed 2013·Granted Dec 6, 2016·6 cites·19 claims
- 0783US10580545B2Beam delivery apparatus and methodASML NETHERLANDS BV·Filed 2014·Granted Mar 3, 2020·6 cites·38 claims
- 0883US8970818B2Lithographic apparatus and component with repeating structure having increased thermal accommodation coefficientNIENHUYS HAN-KWANG·Filed 2012·Granted Mar 3, 2015·5 cites·19 claims
- 0981US10725381B2Optical systems, metrology apparatus and associated methodASML NETHERLANDS BV·Filed 2018·Granted Jul 28, 2020·3 cites·15 claims
- 1079US10678140B2Suppression filter, radiation collector and radiation source for a lithographic apparatus; method of determining a separation distance between at least two reflective surface levels of a suppression filterASML NETHERLANDS BV·Filed 2016·Granted Jun 9, 2020·3 cites·7 claims
- 1174US10168621B2Radiation beam apparatusASML NETHERLANDS BV·Filed 2015·Granted Jan 1, 2019·2 cites·21 claims
- 1272US10580546B2Radiation systemASML NETHERLANDS BV·Filed 2016·Granted Mar 3, 2020·1 cites·18 claims
- 1371US10216101B2ReflectorASML NETHERLANDS BV·Filed 2015·Granted Feb 26, 2019·1 cites·19 claims
- 1469US9823572B2Lithographic methodASML NETHERLANDS BV·Filed 2014·Granted Nov 21, 2017·2 cites·15 claims
- 1568US8917380B2Lithographic apparatus and methodLOOPSTRA ERIK ROELOF·Filed 2012·Granted Dec 23, 2014·1 cites·13 claims
- 1667US8797504B2Lithographic apparatus and device manufacturing methodNIENHUYS HAN-KWANG·Filed 2012·Granted Aug 5, 2014·1 cites·19 claims
- 1763US11984236B2Radiation systemASML NETHERLANDS BV·Filed 2020·Granted May 14, 2024·0 cites·20 claims
- 1863US8625068B2Lithographic apparatus configured to suppress contamination from passing into the projection system and methodNIENHUYS HAN-KWANG·Filed 2010·Granted Jan 7, 2014·1 cites·19 claims
- 1963US2025298325A1Method for aligning an illumination-detection system of a metrology device and associated metrology deviceASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 2058US2025189904A1Method for correcting measurements in the manufacture of integrated circuits and associated apparatusesASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 2157US11803119B2Contaminant detection metrology system, lithographic apparatus, and methods thereofASML HOLDING NV·Filed 2020·Granted Oct 31, 2023·0 cites·20 claims
- 2257US10900829B2Radiation sensor apparatusASML NETHERLANDS BV·Filed 2019·Granted Jan 26, 2021·0 cites·21 claims
- 2356US11099489B2Method of measuring a parameter of a lithographic process, metrology apparatusASML NETHERLANDS BV·Filed 2019·Granted Aug 24, 2021·0 cites·20 claims
- 2452US11353796B2Method and apparatus for determining a radiation beam intensity profileASML NETHERLANDS BV·Filed 2019·Granted Jun 7, 2022·0 cites·17 claims
- 2551US10422691B2Radiation sensor apparatusASML NETHERLANDS BV·Filed 2016·Granted Sep 24, 2019·0 cites·20 claims
- 2650US11140765B2Radiation sourceASML NETHERLANDS BV·Filed 2018·Granted Oct 5, 2021·0 cites·20 claims
- 2750US10495976B2Attenuation apparatus and methodASML NETHERLANDS BV·Filed 2016·Granted Dec 3, 2019·0 cites·16 claims
- 2850US2024168392A1Assembly for separating radiation in the far fieldASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2950US2024255279A1Metrology measurement method and apparatusASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 3049US11112618B2Beam splitting apparatusASML NETHERLANDS BV·Filed 2016·Granted Sep 7, 2021·0 cites·48 claims
- 3149US9846365B2Component for a radiation source, associated radiation source and lithographic apparatusASML NETHERLANDS BV·Filed 2014·Granted Dec 19, 2017·0 cites·18 claims
- 3248US12164125B2Manufacturing a reflective diffraction gratingASML NETHERLANDS BV·Filed 2020·Granted Dec 10, 2024·0 cites·14 claims
- 3348US2023040124A1Method for correcting measurements in the manufacture of integrated circuits and associated apparatusesASML NETHERLANDS BV·Filed 2020·Application pending·0 cites
- 3446US11137694B2Particle suppression systems and methodsASML NETHERLANDS BV·Filed 2018·Granted Oct 5, 2021·0 cites·27 claims
- 3545US9952513B2UndulatorASML NETHERLANDS BV·Filed 2015·Granted Apr 24, 2018·0 cites·20 claims
- 3643US2015331338A1Substrate Support for a Lithographic Apparatus and Lithographic ApparatusASML NETHERLANDS BV·Filed 2013·Application pending·0 cites
- 3740US2019049861A1Methods and Apparatus for Determining the Position of a Spot of Radiation, Inspection Apparatus, Device Manufacturing MethodASML NETHERLANDS BV·Filed 2018·Application pending·0 cites
- 3838US11009800B2Measurement system, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted May 18, 2021·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →