Inventor · disambiguated record
Harm-Jan Voorma
Also filed as: VOORMA HARM-JAN
10 granted patents·2 pending applications·30 citations·filing 2003–2016
85Inventor score
Top patents by PatentIndex Score
12 records- 0182US7875863B2Illumination system, lithographic apparatus, mirror, method of removing contamination from a mirror and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Jan 25, 2011·6 cites·26 claims
- 0271US7767989B2Ex-situ removal of deposition on an optical elementASML NETHERLANDS BV·Filed 2006·Granted Aug 3, 2010·1 cites·29 claims
- 0365US7470916B2Lithographic apparatus, device manufacturing method and radiation collectorASML NETHERLANDS BV·Filed 2006·Granted Dec 30, 2008·2 cites·25 claims
- 0464US10222702B2Radiation sourceASML NETHERLANDS BV·Filed 2016·Granted Mar 5, 2019·1 cites·15 claims
- 0564US7145640B2Lithographic apparatus, device manufacturing method and variable attenuatorASML NETHERLANDS BV·Filed 2004·Granted Dec 5, 2006·8 cites·22 claims
- 0662US7098994B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted Aug 29, 2006·7 cites·29 claims
- 0760US8598550B2Ex-situ removal of deposition on an optical elementBANINE VADIM YEVGENYEVICH·Filed 2012·Granted Dec 3, 2013·0 cites·27 claims
- 0858US7023524B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Apr 4, 2006·5 cites·13 claims
- 0956US8134136B2Ex-situ removal of deposition on an optical elementBANINE VADIM YEVGENYEVICH·Filed 2010·Granted Mar 13, 2012·0 cites·11 claims
- 1047US2008218709A1Removal of deposition on an element of a lithographic apparatusASML NETHERLANDS BV·Filed 2007·Application pending·0 cites
- 1138US8077287B2Method of preparing components, prepared component, lithographic apparatus and device manufacturing methodDAMS JOHANNES ADRIANUS ANTONIUS THEODORUS·Filed 2004·Granted Dec 13, 2011·0 cites·22 claims
- 1237US2005134820A1Method for exposing a substrate, patterning device, and lithographic apparatusASML NETHERLANDS BV·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →