Inventor · disambiguated record
Henricus Johannes Lambertus Megens
Also filed as: MEGENS HENRICUS JOHANNES LAMBE · MEGENS HENRICUS JOHANNES LAMBERTUS
17 granted patents·1 pending application·221 citations·filing 2005–2021
93Inventor score
Files withASML NETHERLANDS BV12CRAMER HUGO AUGUSTINUS JOSEPH2MEGENS HENRICUS JOHANNES LAMBERTUS2ENGELEN ADRIANUS FRANSISCUS PETRUS1MOS EVERHARDUS CORNELIS1
Top patents by PatentIndex Score
18 records- 0197US9081303B2Methods and scatterometers, lithographic systems, and lithographic processing cellsCRAMER HUGO AUGUSTINUS JOSEPH·Filed 2010·Granted Jul 14, 2015·73 cites·24 claims
- 0297US8706442B2Alignment system, lithographic system and methodMOS EVERHARDUS CORNELIS·Filed 2009·Granted Apr 22, 2014·89 cites·20 claims
- 0396US8994944B2Methods and scatterometers, lithographic systems, and lithographic processing cellsASML NETHERLANDS BV·Filed 2014·Granted Mar 31, 2015·24 cites·16 claims
- 0494US10527958B2Lithographic methodASML NETHERLANDS BV·Filed 2018·Granted Jan 7, 2020·7 cites·21 claims
- 0591US12032299B2Metrology method and associated metrology and lithographic apparatusesASML NETHERLANDS BV·Filed 2020·Granted Jul 9, 2024·2 cites·25 claims
- 0691US11079684B2Measurement apparatus and a method for determining a substrate gridASML NETHERLANDS BV·Filed 2018·Granted Aug 3, 2021·3 cites·20 claims
- 0788US11966166B2Measurement apparatus and a method for determining a substrate gridASML NETHERLANDS BV·Filed 2021·Granted Apr 23, 2024·1 cites·20 claims
- 0886US10180628B2Method of determining critical-dimension-related properties, inspection apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted Jan 15, 2019·4 cites·21 claims
- 0985US11029610B2Lithographic methodASML NETHERLANDS BV·Filed 2018·Granted Jun 8, 2021·2 cites·21 claims
- 1084US7468795B2Method of selecting a grid model for correcting a process recipe for grid deformations in a lithographic apparatus and lithographic assembly using the sameASML NETHERLANDS BV·Filed 2006·Granted Dec 23, 2008·9 cites·34 claims
- 1179US10962887B2Lithographic methodASML NETHERLANDS BV·Filed 2019·Granted Mar 30, 2021·1 cites·20 claims
- 1273US9518936B2Method and apparatus for determining lithographic quality of a structureASML NETHERLANDS BV·Filed 2013·Granted Dec 13, 2016·2 cites·6 claims
- 1372US8390823B2Method, inspection apparatus and substrate for determining an approximate structure of an object on a substrateCRAMER HUGO AUGUSTINUS JOSEPH·Filed 2010·Granted Mar 5, 2013·2 cites·13 claims
- 1456US9696635B2Method of controlling a lithographic apparatus, device manufacturing method, lithographic apparatus, computer program product and method of improving a mathematical model of a lithographic processENGELEN ADRIANUS FRANSISCUS PETRUS·Filed 2012·Granted Jul 4, 2017·1 cites·20 claims
- 1554US11016397B2Source separation from metrology dataASML NETHERLANDS BV·Filed 2016·Granted May 25, 2021·0 cites·20 claims
- 1654US8502955B2Method of determining a characteristicMEGENS HENRICUS JOHANNES LAMBERTUS·Filed 2009·Granted Aug 6, 2013·1 cites·12 claims
- 1746US2007048626A1Device manufacturing method, mask and deviceASML NETHERLANDS BV·Filed 2005·Application pending·0 cites
- 1843US8982328B2Method and apparatus for overlay measurementMEGENS HENRICUS JOHANNES LAMBERTUS·Filed 2010·Granted Mar 17, 2015·0 cites·18 claims
Join the waitlist — get patent alerts
Get an alert when Henricus Johannes Lambertus Megens files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →