Inventor · disambiguated record
Henan Zhang
Also filed as: ZHANG HENAN
23 granted patents·3 pending applications·10 citations·filing 2015–2022
90Inventor score
Files withTOKYO ELECTRON LTD12BEIJING BAIDU NETCOM SCI & TECH CO LTD8BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD5BEIJING BAIDU NETCOM SCI & TEC1
Top patents by PatentIndex Score
26 records- 0191US11455765B2Method and apparatus for generating virtual avatarBEIJING BAIDU NETCOM SCI & TECH CO LTD·Filed 2021·Granted Sep 27, 2022·3 cites·16 claims
- 0288US11875601B2Meme generation method, electronic device and storage mediumBEIJING BAIDU NETCOM SCI & TECH CO LTD·Filed 2021·Granted Jan 16, 2024·2 cites·9 claims
- 0387US12100598B2Methods for planarizing a substrate using a combined wet etch and chemical mechanical polishing (CMP) processTOKYO ELECTRON LTD·Filed 2022·Granted Sep 24, 2024·1 cites·21 claims
- 0485US11463631B2Method and apparatus for generating face imageBEIJING BAIDU NETCOM SCI & TECH CO LTD·Filed 2020·Granted Oct 4, 2022·2 cites·20 claims
- 0580US11424123B2Forming a semiconductor feature using atomic layer etchTOKYO ELECTRON LTD·Filed 2020·Granted Aug 23, 2022·1 cites·20 claims
- 0664US11289325B2Radiation of substrates during processing and systems thereofTOKYO ELECTRON LTD·Filed 2021·Granted Mar 29, 2022·0 cites·16 claims
- 0761US10937672B2Heating device and heating chamberBEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD·Filed 2015·Granted Mar 2, 2021·1 cites·18 claims
- 0861US2022189764A1Radiation of Substrates During Processing and Systems ThereofTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 0959US12148624B2Wet etch process and method to control fin height and channel area in a fin field effect transistor (FinFET)TOKYO ELECTRON LTD·Filed 2022·Granted Nov 19, 2024·0 cites·20 claims
- 1058US12243749B2Methods to provide uniform wet etching of material within high aspect ratio features provided on a patterned substrateTOKYO ELECTRON LTD·Filed 2022·Granted Mar 4, 2025·0 cites·20 claims
- 1158US12100599B2Wet etch process and method to provide uniform etching of material formed within features having different critical dimension (CD)TOKYO ELECTRON LTD·Filed 2022·Granted Sep 24, 2024·0 cites·20 claims
- 1258US11810310B2Satellite image processing method, network training method, related devices and electronic deviceBEIJING BAIDU NETCOM SCI & TECH CO LTD·Filed 2021·Granted Nov 7, 2023·0 cites·12 claims
- 1357US12148625B2Methods to prevent surface charge induced cd-dependent etching of material formed within features on a patterned substrateTOKYO ELECTRON LTD·Filed 2022·Granted Nov 19, 2024·0 cites·22 claims
- 1457US11748895B2Method and apparatus for processing video frameBEIJING BAIDU NETCOM SCI & TECH CO LTD·Filed 2021·Granted Sep 5, 2023·0 cites·13 claims
- 1557US10861133B1Super-resolution video reconstruction method, device, apparatus and computer-readable storage mediumBEIJING BAIDU NETCOM SCI & TEC·Filed 2020·Granted Dec 8, 2020·0 cites·13 claims
- 1655US12482702B2Wet etch process and methods to form air gaps between metal interconnectsTOKYO ELECTRON LTD·Filed 2022·Granted Nov 25, 2025·0 cites·24 claims
- 1755US12237216B2Method for filling recessed features in semiconductor devices with a low-resistivity metalTOKYO ELECTRON LTD·Filed 2022·Granted Feb 25, 2025·0 cites·21 claims
- 1855US11315768B2Loading apparatus and physical vapor deposition apparatusBEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD·Filed 2018·Granted Apr 26, 2022·0 cites·18 claims
- 1953US12400872B2Sacrificial capping layer for gate protectionTOKYO ELECTRON LTD·Filed 2022·Granted Aug 26, 2025·0 cites·20 claims
- 2053US2023290029A1Generation of virtual idolBEIJING BAIDU NETCOM SCI & TECH CO LTD·Filed 2022·Application pending·0 cites
- 2151US11568590B2Cartoonlization processing method for image, electronic device, and storage mediumBEIJING BAIDU NETCOM SCI & TECH CO LTD·Filed 2021·Granted Jan 31, 2023·0 cites·17 claims
- 2249US11532517B2Localized etch stop layerTOKYO ELECTRON LTD·Filed 2020·Granted Dec 20, 2022·0 cites·16 claims
- 2346US2021312686A1Method and apparatus for generating human body three-dimensional model, device and storage mediumBEIJING BAIDU NETCOM SCI & TECH CO LTD·Filed 2021·Application pending·0 cites
- 2444US10984994B2Deposition apparatus and physical vapor deposition chamberBEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD·Filed 2016·Granted Apr 20, 2021·0 cites·20 claims
- 2541US11710624B2Sputtering methodBEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD·Filed 2020·Granted Jul 25, 2023·0 cites·9 claims
- 2636US11107706B2Gas phase etching device and gas phase etching apparatusBEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD·Filed 2019·Granted Aug 31, 2021·0 cites·9 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →