Inventor · disambiguated record
Hironobu Hyakutake
Also filed as: HYAKUTAKE HIRONOBU
15 granted patents·4 pending applications·39 citations·filing 1999–2023
88Inventor score
Technology areasH10P
Top patents by PatentIndex Score
19 records- 0185US11232959B2Substrate processing apparatus and substrate processing meihodTOKYO ELECTRON LTD·Filed 2018·Granted Jan 25, 2022·4 cites·5 claims
- 0280US11087992B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Aug 10, 2021·1 cites·13 claims
- 0376US9027573B2Substrate processing apparatus for maintaining a more uniform temperature during substrate processingHYAKUTAKE HIRONOBU·Filed 2011·Granted May 12, 2015·5 cites·12 claims
- 0470US11075096B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Jul 27, 2021·1 cites·6 claims
- 0567US10840081B2Liquid processing apparatus, liquid processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2019·Granted Nov 17, 2020·1 cites·19 claims
- 0664US8778092B2Substrate processing apparatus, substrate processing method and storage mediumTANAKA HIROSHI·Filed 2011·Granted Jul 15, 2014·1 cites·13 claims
- 0763US11915947B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Feb 27, 2024·0 cites·6 claims
- 0861US6293288B2Cleaning method and apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Sep 25, 2001·7 cites·12 claims
- 0956US6203627B1Cleaning methodTOKYO ELECTRON LTD·Filed 1999·Granted Mar 20, 2001·18 cites·13 claims
- 1056US2024035168A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1153US8685169B2Substrate processing apparatus, substrate processing method and storage mediumHYAKUTAKE HIRONOBU·Filed 2010·Granted Apr 1, 2014·1 cites·13 claims
- 1253US2014283887A1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 1345US8577502B2Liquid processing apparatus, liquid processing method, computer program, and storage mediumTANAKA HIROSHI·Filed 2007·Granted Nov 5, 2013·0 cites·10 claims
- 1445US2021384049A1System and Method for Wet Chemical Etching in Semiconductor ProcessingTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 1542US8882961B2Substrate treatment apparatusHYAKUTAKE HIRONOBU·Filed 2009·Granted Nov 11, 2014·0 cites·10 claims
- 1639US10916456B2Substrate liquid processing apparatus and substrate liquid processing methodTOKYO ELECTRON LTD·Filed 2017·Granted Feb 9, 2021·0 cites·11 claims
- 1736US2010223805A1Substrate processing device, recycling method of filtration material and recording mediumTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
- 1829US10928732B2Substrate liquid processing apparatus, substrate liquid processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2016·Granted Feb 23, 2021·0 cites·13 claims
- 1929US10458010B2Substrate liquid processing apparatus, substrate liquid processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2016·Granted Oct 29, 2019·0 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →