Inventor · disambiguated record
Hidong Kwak
Also filed as: KWAK HIDONG
16 granted patents·4 pending applications·249 citations·filing 2003–2024
93Inventor score
Top patents by PatentIndex Score
20 records- 0195US7755764B2Purge gas flow control for high-precision film measurements using ellipsometry and reflectometryKLA TENCOR CORP·Filed 2008·Granted Jul 13, 2010·40 cites·20 claims
- 0294US7369233B2Optical system for measuring samples using short wavelength radiationKLA TENCOR TECH CORP·Filed 2003·Granted May 6, 2008·62 cites·227 claims
- 0394US6999180B1Optical film topography and thickness measurementKLA TENCOR TECH CORP·Filed 2003·Granted Feb 14, 2006·84 cites·22 claims
- 0491US10605722B2Metrology system calibration refinementKLA TENCOR CORP·Filed 2017·Granted Mar 31, 2020·5 cites·20 claims
- 0589US7408641B1Measurement systems configured to perform measurements of a specimen and illumination subsystems configured to provide illumination for a measurement systemKLA TENCOR TECH CORP·Filed 2005·Granted Aug 5, 2008·20 cites·16 claims
- 0687US9574992B1Single wavelength ellipsometry with improved spot size capabilityKLA TENCOR CORP·Filed 2016·Granted Feb 21, 2017·5 cites·20 claims
- 0784US9857291B2Metrology system calibration refinementKLA TENCOR CORP·Filed 2014·Granted Jan 2, 2018·5 cites·21 claims
- 0880US8830486B2Atmospheric molecular contamination control with local purgingKWAK HIDONG·Filed 2012·Granted Sep 9, 2014·6 cites·7 claims
- 0974US7869040B1Measurement systems configured to perform measurements of a specimen and illumination subsystems configured to provide illumination for a measurement systemKLA TENCOR TECH CORP·Filed 2008·Granted Jan 11, 2011·6 cites·7 claims
- 1070US9046474B2Multi-analyzer angle spectroscopic ellipsometryKWAK HIDONG·Filed 2012·Granted Jun 2, 2015·2 cites·18 claims
- 1163US7295325B2Time-resolved measurement technique using radiation pulsesKLA TENCOR TECH CORP·Filed 2003·Granted Nov 13, 2007·4 cites·91 claims
- 1261US7190441B1Methods and systems for preparing a sample for thin film analysisKLA TENCOR TECH CORP·Filed 2004·Granted Mar 13, 2007·9 cites·20 claims
- 1361US2025217960A1Defect region detection device and wafer defect detection system including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1459US10088413B2Spectral matching based calibrationKLA TENCOR CORP·Filed 2012·Granted Oct 2, 2018·1 cites·23 claims
- 1559US2025290860A1Optical inspection apparatus, optical inspection method, and optical inspection system including optical inspection apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1657US12436106B2Apparatus and method for inspecting semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2023·Granted Oct 7, 2025·0 cites·17 claims
- 1757US2025027875A1Optical imaging deviceSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1855US12303307B2Semiconductor device measurement method using x-ray scattering and semiconductor device manufacturing method including the measurement methodSAMSUNG ELECTRONICS CO LTD·Filed 2023·Granted May 20, 2025·0 cites·20 claims
- 1953US2024353350A1Wafer abnormality detection method and a semiconductor device manufacturing method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 2051US9110020B2Atmospheric molecular contamination control with local purgingKLA TENCOR CORP·Filed 2014·Granted Aug 18, 2015·0 cites·9 claims
Join the waitlist — get patent alerts
Get an alert when Hidong Kwak files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →