Inventor · disambiguated record
Hidefumi Matsui
Also filed as: AOYAMA TORU · MATSUI HIDEFUMI
13 granted patents·6 pending applications·80 citations·filing 2000–2024
90Inventor score
Top patents by PatentIndex Score
19 records- 0183US7401988B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2007·Granted Jul 22, 2008·7 cites·15 claims
- 0280US2025118542A1Measurement system, measurement method, and plasma processing deviceTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0377US8940638B2Substrate wiring method and semiconductor manufacturing deviceHOSHINO SATOHIKO·Filed 2011·Granted Jan 27, 2015·5 cites·12 claims
- 0475US6617095B2Evaluating method of hydrophobic process, forming method of resist pattern, and forming system of resist patternTOKYO ELECTRON LTD·Filed 2001·Granted Sep 9, 2003·21 cites·18 claims
- 0573US6875466B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2002·Granted Apr 5, 2005·14 cites·8 claims
- 0673US6485203B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Nov 26, 2002·17 cites·16 claims
- 0772US8945313B2Vacuum exhaust method and a substrate processing apparatus thereforTOKYO ELECTRON LTD·Filed 2012·Granted Feb 3, 2015·2 cites·18 claims
- 0872US8585831B2Substrate cleaning methodMATSUI HIDEFUMI·Filed 2010·Granted Nov 19, 2013·3 cites·6 claims
- 0969US12211676B2Measurement system, measurement method, and plasma processing deviceTOKYO ELECTRON LTD·Filed 2021·Granted Jan 28, 2025·0 cites·9 claims
- 1067US9209010B2Substrate cleaning method and substrate cleaning deviceMATSUI HIDEFUMI·Filed 2011·Granted Dec 8, 2015·2 cites·24 claims
- 1164US8475602B2Substrate cleaning method and apparatusMATSUI HIDEFUMI·Filed 2009·Granted Jul 2, 2013·2 cites·14 claims
- 1263US7208066B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2003·Granted Apr 24, 2007·7 cites·9 claims
- 1355US2010104760A1Vacuum exhaust method and a substrate processing apparatus thereforTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 1453US12442635B2Substrate processing apparatus, substrate processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2022·Granted Oct 14, 2025·0 cites·9 claims
- 1548US2023357931A1Parameter selection method and information processing deviceTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 1647US12498276B2Process estimation system, process data estimation method, and recording mediumTOKYO ELECTRON LTD·Filed 2021·Granted Dec 16, 2025·0 cites·13 claims
- 1746US2005130445A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 1836US2020126829A1Maintenance control method of controlling maintenance of processing device and control deviceTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 1934US2013056024A1Substrate cleaning method and semiconductor manufacturing apparatusHOSHINO SATOHIKO·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →