Inventor · disambiguated record
Hiroya Ohta
Also filed as: OHTA HIROYA
46 granted patents·7 pending applications·533 citations·filing 1992–2024
98Inventor score
Top patents by PatentIndex Score
53 records- 0197US7880143B2Electron beam apparatusHITACHI HIGH TECH CORP·Filed 2007·Granted Feb 1, 2011·54 cites·17 claims
- 0295US8350214B2Charged particle beam applied apparatusHITACHI HIGH TECH CORP·Filed 2010·Granted Jan 8, 2013·88 cites·17 claims
- 0392US6159644AMethod of fabricating semiconductor circuit devices utilizing multiple exposuresHITACHI LTD·Filed 1996·Granted Dec 12, 2000·100 cites·7 claims
- 0491US7906761B2Charged particle beam apparatusHITACHI HIGH TECH CORP·Filed 2008·Granted Mar 15, 2011·16 cites·25 claims
- 0590US6870171B2Exposure apparatusCANON KK·Filed 2004·Granted Mar 22, 2005·32 cites·8 claims
- 0690US6667486B2Electron beam exposure method, electron beam exposure apparatus and device manufacturing method using the sameHITACHI LTD·Filed 2002·Granted Dec 23, 2003·34 cites·8 claims
- 0789US7425714B2Measurement method of electron beam current, electron beam writing system and electron beam detectorHITACHI HIGH TECH CORP·Filed 2005·Granted Sep 16, 2008·12 cites·12 claims
- 0888US7230252B2Aberration adjusting method, device fabrication method, and charged particle beam lithography machineHITACHI HIGH TECH CORP·Filed 2006·Granted Jun 12, 2007·10 cites·8 claims
- 0987US8330103B2Charged particle beam apparatus and specimen inspection methodENYAMA MOMOYO·Filed 2008·Granted Dec 11, 2012·13 cites·17 claims
- 1084US7126140B2Multi-electron beam exposure method and apparatusADVANTEST CORP·Filed 2005·Granted Oct 24, 2006·7 cites·9 claims
- 1184US2025060678A1Pattern Measurement Device and Pattern Measurement MethodHITACHI HIGH TECH CORP·Filed 2024·Application pending·0 cites
- 1283US11353798B2Pattern measurement device and pattern measurement methodHITACHI HIGH TECH CORP·Filed 2017·Granted Jun 7, 2022·2 cites·19 claims
- 1383US7423274B2Electron beam writing system and electron beam writing methodHITACHI HIGH TECH CORP·Filed 2006·Granted Sep 9, 2008·7 cites·12 claims
- 1482US9966225B2Charged particle beam device, simulation method, and simulation deviceHITACHI LTD·Filed 2014·Granted May 8, 2018·5 cites·13 claims
- 1582US7378671B2Aberration measuring apparatus for charged particle beam optical system, charged particle beam lithography machine having the aberration measuring apparatus, and device fabrication method using the apparatusCANON KK·Filed 2006·Granted May 27, 2008·6 cites·6 claims
- 1681US8592776B2Charged particle beam apparatusENYAMA MOMOYO·Filed 2009·Granted Nov 26, 2013·6 cites·10 claims
- 1781US8193493B2Charged particle beam apparatusTANIMOTO SAYAKA·Filed 2011·Granted Jun 5, 2012·6 cites·10 claims
- 1880US10816332B2Pattern measurement device and pattern measurement methodHITACHI HIGH TECH CORP·Filed 2016·Granted Oct 27, 2020·3 cites·11 claims
- 1979US7067830B2Multi-electron beam exposure method and apparatusADVANTEST CORP·Filed 2003·Granted Jun 27, 2006·13 cites·9 claims
- 2077US12174551B2Pattern measurement device and pattern measurement methodHITACHI HIGH TECH CORP·Filed 2022·Granted Dec 24, 2024·0 cites·31 claims
- 2176US6784442B2Exposure apparatus, control method thereof, and device manufacturing methodCANON KK·Filed 2002·Granted Aug 31, 2004·23 cites·10 claims
- 2274US6946665B2Charged particle beam exposure method and apparatus and device manufacturing method using the apparatusHITACHI HIGH TECH CORP·Filed 2004·Granted Sep 20, 2005·18 cites·9 claims
- 2374US2024363306A1Charged particle beam deviceHITACHI HIGH TECH CORP·Filed 2024·Application pending·0 cites
- 2473US9508611B2Semiconductor inspection method, semiconductor inspection device and manufacturing method of semiconductor elementHITACHI LTD·Filed 2013·Granted Nov 29, 2016·3 cites·15 claims
- 2572US6809319B2Electron beam writing equipment and electron beam writing methodHITACHI HIGH TECH CORP·Filed 2003·Granted Oct 26, 2004·8 cites·12 claims
- 2671US7005659B2Charged particle beam exposure apparatus, charged particle beam exposure method, and device manufacturing method using the same apparatusHITACHI HIGH TECH CORP·Filed 2004·Granted Feb 28, 2006·8 cites·12 claims
- 2771US6768118B2Electron beam monitoring sensor and electron beam monitoring methodHITACHI LTD·Filed 2003·Granted Jul 27, 2004·8 cites·11 claims
- 2870US8552373B2Charged particle beam device and sample observation methodENYAMA MOMOYO·Filed 2010·Granted Oct 8, 2013·2 cites·20 claims
- 2968US7863565B2Electron beam inspection method and electron beam inspection apparatusHITACHI LTD·Filed 2008·Granted Jan 4, 2011·1 cites·15 claims
- 3067US6511048B1Electron beam lithography apparatus and pattern forming methodHITACHI LTD·Filed 1998·Granted Jan 28, 2003·20 cites·15 claims
- 3166US8288722B2Electron beam inspection method and electron beam inspection apparatusHASEGAWA MASAKI·Filed 2010·Granted Oct 16, 2012·1 cites·12 claims
- 3266US8022365B2Charged particle beam equipments, and charged particle beam microscopeHITACHI LTD·Filed 2008·Granted Sep 20, 2011·1 cites·12 claims
- 3365US8268209B2Pattern forming method and its moldOGINO MASAHIKO·Filed 2007·Granted Sep 18, 2012·3 cites·7 claims
- 3464US7189979B2Electron gunHITACHI HIGH TECH CORP·Filed 2004·Granted Mar 13, 2007·5 cites·12 claims
- 3560US12400383B2Training method for learning apparatus, and image generation systemHITACHI HIGH TECH CORP·Filed 2022·Granted Aug 26, 2025·0 cites·17 claims
- 3660US6838682B2Electron beam exposure equipment and electron beam exposure methodHITACHI HIGH TECH CORP·Filed 2003·Granted Jan 4, 2005·4 cites·20 claims
- 3758US12205790B2Charged particle beam deviceHITACHI HIGH TECH CORP·Filed 2019·Granted Jan 21, 2025·0 cites·10 claims
- 3858US6992307B2Electron beam source and electron beam exposure apparatus employing the electron beam sourceHITACHI HIGH TECH CORP·Filed 2004·Granted Jan 31, 2006·3 cites·6 claims
- 3956US7049607B2Electron beam writing equipment and electron beam writing methodCANON KK·Filed 2004·Granted May 23, 2006·2 cites·15 claims
- 4056US6870310B2Multibeam generating apparatus and electron beam drawing apparatusCANON KK·Filed 2003·Granted Mar 22, 2005·5 cites·15 claims
- 4154US2022216032A1Charged particle beam deviceHITACHI HIGH TECH CORP·Filed 2019·Application pending·0 cites
- 4251US10262830B2Scanning electron microscope and electron trajectory adjustment method thereforHITACHI LTD·Filed 2014·Granted Apr 16, 2019·0 cites·12 claims
- 4349US11869745B2Charged particle beam deviceHITACHI HIGH TECH CORP·Filed 2019·Granted Jan 9, 2024·0 cites·7 claims
- 4449US2011049344A1Diffraction pattern capturing method and charged particle beam deviceHITACHI LTD·Filed 2009·Application pending·0 cites
- 4546US11435178B2Calibration sample, electron beam adjustment method and electron beam apparatus using sameHITACHI HIGH TECH CORP·Filed 2017·Granted Sep 6, 2022·0 cites·15 claims
- 4645US2008067376A1Charged particle beam apparatusTANIMOTO SAYAKA·Filed 2007·Application pending·0 cites
- 4744US2013248731A1Electron beam apparatus and lens arrayHITACHI HIGH TECH CORP·Filed 2013·Application pending·0 cites
- 4842US10636618B2Charged particle beam apparatusHITACHI HIGH TECH CORP·Filed 2018·Granted Apr 28, 2020·0 cites·15 claims
- 4942US10629408B2Charged particle beam deviceHITACHI HIGH TECH CORP·Filed 2016·Granted Apr 21, 2020·0 cites·10 claims
- 5040US9846133B2Semiconductor inspection device including a counter electrode with adjustable potentials used to obtain images for detection of defects, and inspection method using charged particle beamHITACHI LTD·Filed 2012·Granted Dec 19, 2017·0 cites·4 claims
Showing the top 50 of 53 patent records by PatentIndex Score.
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