Inventor · disambiguated record
Houssam Chouaib
Also filed as: CHOUAIB HOUSSAM
18 granted patents·12 pending applications·62 citations·filing 2007–2025
91Inventor score
Top patents by PatentIndex Score
30 records- 0196US11555689B2Measuring thin films on grating and bandgap on gratingKLA TENCOR CORP·Filed 2020·Granted Jan 17, 2023·4 cites·19 claims
- 0295US11573077B2Scatterometry based methods and systems for measurement of strain in semiconductor structuresKLA CORP·Filed 2021·Granted Feb 7, 2023·4 cites·7 claims
- 0394US11036898B2Measurement models of nanowire semiconductor structures based on re-useable sub-structuresKLA TENCOR CORP·Filed 2019·Granted Jun 15, 2021·13 cites·20 claims
- 0493US10458912B2Model based optical measurements of semiconductor structures with anisotropic dielectric permittivityKLA TENCOR CORP·Filed 2017·Granted Oct 29, 2019·6 cites·27 claims
- 0592US11099137B2Visualization of three-dimensional semiconductor structuresKLA CORP·Filed 2020·Granted Aug 24, 2021·3 cites·21 claims
- 0688US11156548B2Measurement methodology of advanced nanostructuresKLA TENCOR CORP·Filed 2018·Granted Oct 26, 2021·6 cites·20 claims
- 0786US11378451B2Bandgap measurements of patterned film stacks using spectroscopic metrologyKLA TENCOR CORP·Filed 2017·Granted Jul 5, 2022·3 cites·44 claims
- 0886US7659979B2Optical inspection apparatus and methodKLA TENCOR CORP·Filed 2007·Granted Feb 9, 2010·18 cites·5 claims
- 0985US10794839B2Visualization of three-dimensional semiconductor structuresKLA TENCOR CORP·Filed 2019·Granted Oct 6, 2020·4 cites·21 claims
- 1074US12480893B2Optical and X-ray metrology methods for patterned semiconductor structures with randomnessKLA CORP·Filed 2024·Granted Nov 25, 2025·0 cites·39 claims
- 1174US2025370352A1Methods And Systems For Measurement Of Semiconductor Structures With Mechanical Stress ModulationKLA CORP·Filed 2025·Application pending·0 cites
- 1271US11796390B2Bandgap measurements of patterned film stacks using spectroscopic metrologyKLA CORP·Filed 2022·Granted Oct 24, 2023·0 cites·14 claims
- 1368US2025237619A1Optical and x-ray metrology methods for patterned semiconductor structures with randomnessKLA CORP·Filed 2025·Application pending·0 cites
- 1468US2025053098A1Spatially-varying spectral metrology for local variation detectionKLA CORP·Filed 2024·Application pending·0 cites
- 1563US2025378376A1Metrology using reference-based synthetic spectraKLA CORP·Filed 2024·Application pending·0 cites
- 1663US2025251283A1Metrology with parallel subsystems and mueller signals trainingKLA CORP·Filed 2024·Application pending·0 cites
- 1760US2024151770A1Methods And Systems For Measurement Of Semiconductor Structures Based On Derivative Measurement SignalsKLA CORP·Filed 2023·Application pending·0 cites
- 1860US2025147434A1Metrology in the Presence of CMOS Under Array (CUA) Structures Utilizing Model-Less Machine LearningKLA CORP·Filed 2023·Application pending·0 cites
- 1959US12379672B2Metrology of nanosheet surface roughness and profileKLA CORP·Filed 2023·Granted Aug 5, 2025·0 cites·40 claims
- 2059US11060846B2Scatterometry based methods and systems for measurement of strain in semiconductor structuresKLA CORP·Filed 2019·Granted Jul 13, 2021·0 cites·21 claims
- 2159US2025146893A1Transistor channel stress and mobility metrology using multipass spectroscopic ellipsometry and raman joint measurementKLA CORP·Filed 2024·Application pending·0 cites
- 2258US2025224344A1Measurements Of Semiconductor Structures Based On Data Collected At Prior Process StepsKLA CORP·Filed 2024·Application pending·0 cites
- 2358US2025053096A1Flexible Measurement Models For Model Based Measurements Of Semiconductor StructuresKLA CORP·Filed 2023·Application pending·0 cites
- 2458US2025123225A1Spectra delta metrologyKLA CORP·Filed 2024·Application pending·0 cites
- 2556US10663286B2Measuring thin films on grating and bandgap on gratingKLA TENCOR CORP·Filed 2017·Granted May 26, 2020·0 cites·22 claims
- 2656US2025012734A1Multiple Pass Optical Measurements Of Semiconductor StructuresKLA CORP·Filed 2024·Application pending·0 cites
- 2755US12380367B2Metrology in the presence of CMOS under array (CuA) structures utilizing machine learning and physical modelingKLA CORP·Filed 2023·Granted Aug 5, 2025·0 cites·22 claims
- 2855US12372882B2Metrology in the presence of CMOS under array (CUA) structures utilizing an effective medium model with classification of CUA structuresKLA CORP·Filed 2023·Granted Jul 29, 2025·0 cites·36 claims
- 2954US12510590B2Metrology in the presence of CMOS under array (CuA) structures utilizing an effective medium model with physical modelingKLA CORP·Filed 2023·Granted Dec 30, 2025·0 cites·35 claims
- 3046US8804106B2System and method for nondestructively measuring concentration and thickness of doped semiconductor layersZHU NANCHANG·Filed 2012·Granted Aug 12, 2014·1 cites·23 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →