Inventor · disambiguated record
Holger Kierey
Also filed as: KIEREY HOLGER
12 granted patents·6 pending applications·44 citations·filing 2003–2024
86Inventor score
Top patents by PatentIndex Score
18 records- 0186US8342701B2Reflective optical element for use in an EUV systemZEISS CARL LASER OPTICS GMBH·Filed 2010·Granted Jan 1, 2013·14 cites·25 claims
- 0285US9541685B2Method for producing a reflective optical component for an EUV projection exposure apparatus and component of this typeZEISS CARL LASER OPTICS GMBH·Filed 2013·Granted Jan 10, 2017·10 cites·16 claims
- 0383US7629572B2Optical devices and related systems and methodsZEISS CARL LASER OPTICS GMBH·Filed 2006·Granted Dec 8, 2009·7 cites·22 claims
- 0476US2024203687A1Multi-beam particle microscope with improved beam current controlCARL ZEISS MULTISEM GMBH·Filed 2024·Application pending·0 cites
- 0573US7175773B1Method for manufacturing a blazed grating, such a blazed grating and a spectrometer having such a blazed gratingZEISS CARL LASER OPTICS GMBH·Filed 2004·Granted Feb 13, 2007·12 cites·28 claims
- 0669US10649340B2Reflective optical element for EUV lithographyZEISS CARL SMT GMBH·Filed 2019·Granted May 12, 2020·1 cites·18 claims
- 0762US2024402104A1Multi-beam particle microscope for reducing particle beam-induced traces on a sampleCARL ZEISS MULTISEM GMBH·Filed 2024·Application pending·0 cites
- 0856US12111578B2Mirror for an illumination optical unit of a projection exposure apparatus comprising a spectral filter in the form of a grating structure and method for producing a spectral filter in the form of a grating structure on a mirrorZEISS CARL SMT GMBH·Filed 2021·Granted Oct 8, 2024·0 cites·24 claims
- 0954US10578974B2Optical element, in particular for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2019·Granted Mar 3, 2020·0 cites·20 claims
- 1053US11231658B2Arrangement for an EUV lithography apparatusZEISS CARL SMT GMBH·Filed 2020·Granted Jan 25, 2022·0 cites·17 claims
- 1153US11099484B2Method for repairing reflective optical elements for EUV lithographyZEISS CARL SMT GMBH·Filed 2019·Granted Aug 24, 2021·0 cites·20 claims
- 1248US10578972B2EUV collector for use in an EUV projection exposure apparatusZEISS CARL SMT GMBH·Filed 2018·Granted Mar 3, 2020·0 cites·20 claims
- 1345US10303067B2Cooler for use in a device in a vacuumZEISS CARL SMT GMBH·Filed 2016·Granted May 28, 2019·0 cites·22 claims
- 1444US10503075B2EUV CollectorZEISS CARL SMT GMBH·Filed 2018·Granted Dec 10, 2019·0 cites·20 claims
- 1542US2013176614A1Euv collector mirror shell of an euv collector for euv lithographyZEISS CARL LASER OPTICS GMBH·Filed 2013·Application pending·0 cites
- 1638US2015092170A1Method for repairing optical elements, and optical elementZEISS CARL LASER OPTICS GMBH·Filed 2014·Application pending·0 cites
- 1735US2004179564A1Method for manufacturing an optical element having a structured surface, such optical element, and projection illumination system having such an optical elementFiled 2003·Application pending·0 cites
- 1834US2015083938A1Cooler for plasma generation chamber of euv radiation sourceZEISS CARL LASER OPTICS GMBH·Filed 2014·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →