Inventor · disambiguated record
Hoite Pieter Theodoor Tolsma
Also filed as: TOLSMA HOITE P THEODOOR · TOLSMA HOITE PIETER THEODOOR
20 granted patents·1 pending application·168 citations·filing 2003–2021
95Inventor score
Files withASML NETHERLANDS BV19BIJNEN FRANCISCUS GODEFRIDUS CASPER1VAN BILSEN FRANCISCUS BERNARDUS MARIA1
Top patents by PatentIndex Score
21 records- 0196US7880880B2Alignment systems and methods for lithographic systemsASML NETHERLANDS BV·Filed 2005·Granted Feb 1, 2011·24 cites·15 claims
- 0295US7329888B2Alignment systems and methods for lithographic systemsASML NETHERLANDS BV·Filed 2005·Granted Feb 12, 2008·18 cites·28 claims
- 0393US7297971B2Alignment systems and methods for lithographic systemsASML NETHERLANDS BV·Filed 2005·Granted Nov 20, 2007·12 cites·3 claims
- 0492US8139217B2Alignment systems and methods for lithographic systemsVAN BILSEN FRANCISCUS BERNARDUS MARIA·Filed 2010·Granted Mar 20, 2012·12 cites·18 claims
- 0590US10996176B2Methods and apparatus for measuring a property of a substrateASML NETHERLANDS BV·Filed 2020·Granted May 4, 2021·2 cites·19 claims
- 0690US7439531B2Alignment systems and methods for lithographic systemsASML NETHERLANDS BV·Filed 2006·Granted Oct 21, 2008·7 cites·32 claims
- 0790US7332732B2Alignment systems and methods for lithographic systemsASML NETHERLANDS BV·Filed 2003·Granted Feb 19, 2008·22 cites·143 claims
- 0889US10317191B2Methods and apparatus for measuring a property of a substrateASML NETHERLANDS BV·Filed 2017·Granted Jun 11, 2019·4 cites·21 claims
- 0987US6995831B2Lithographic apparatus with alignment subsystem, device manufacturing method, using alignment, and alignment structureASML NETHERLANDS BV·Filed 2005·Granted Feb 7, 2006·8 cites·8 claims
- 1085US10746668B2Methods and apparatus for measuring a property of a substrateASML NETHERLANDS BV·Filed 2019·Granted Aug 18, 2020·2 cites·27 claims
- 1183US9594029B2Methods and apparatus for measuring a property of a substrateASML NETHERLANDS BV·Filed 2012·Granted Mar 14, 2017·4 cites·16 claims
- 1282US7259828B2Alignment system and method and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted Aug 21, 2007·25 cites·40 claims
- 1379US7002667B2Lithographic apparatus with alignment subsystem, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2003·Granted Feb 21, 2006·15 cites·48 claims
- 1474US11977034B2Methods and apparatus for measuring a property of a substrateASML NETHERLANDS BV·Filed 2021·Granted May 7, 2024·0 cites·18 claims
- 1566US7409302B2Method and apparatus for vibration detection and vibration analysis, and lithographic apparatus equipped with such an apparatusASML NETHERLANDS BV·Filed 2005·Granted Aug 5, 2008·6 cites·18 claims
- 1664US10705438B2Lithographic methodASML NETHERLANDS BV·Filed 2019·Granted Jul 7, 2020·0 cites·20 claims
- 1758US7410735B2Method of characterization, method of characterizing a process operation, and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Aug 12, 2008·5 cites·31 claims
- 1857US8908152B2Lithographic apparatus and device manufacturing method to determine improved absolute position of exposure fields using mark structuresBIJNEN FRANCISCUS GODEFRIDUS CASPER·Filed 2009·Granted Dec 9, 2014·1 cites·22 claims
- 1956US10571814B2Lithographic methodASML NETHERLANDS BV·Filed 2017·Granted Feb 25, 2020·0 cites·11 claims
- 2048US7773235B2Method and apparatus for vibration detection and vibration analysis, and lithographic apparatus equipped with such an apparatusASML NETHERLANDS BV·Filed 2008·Granted Aug 10, 2010·1 cites·19 claims
- 2134US2018246420A1A method and apparatus for determining at least one property of patterning device marker featuresASML NETHERLANDS BV·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →