Inventor · disambiguated record
Hsu-Ting Huang
Also filed as: HUANG HSU-TING
37 granted patents·3 pending applications·279 citations·filing 2003–2025
97Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD30CADENCE DESIGN SYSTEMS INC3TOKYO ELECTRON LTD3SEZGINER ABDURRAHMAN2INVARIUM INC1
Top patents by PatentIndex Score
40 records- 0197US11320747B2Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted May 3, 2022·3 cites·20 claims
- 0297US11061318B2Lithography model calibrationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jul 13, 2021·7 cites·20 claims
- 0396US11415890B2Method of mask data synthesis and mask makingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 16, 2022·3 cites·20 claims
- 0496US9529959B2System and method for pattern correction in e-beam lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Dec 27, 2016·27 cites·17 claims
- 0595US11675958B2Lithography simulation methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jun 13, 2023·4 cites·20 claims
- 0695US11092899B2Method for mask data synthesis with wafer target adjustmentTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Aug 17, 2021·7 cites·20 claims
- 0794US10866505B2Mask process correctionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 15, 2020·9 cites·20 claims
- 0893US11709435B2Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jul 25, 2023·1 cites·20 claims
- 0992US10942443B2Method of mask data synthesis and mask makingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Mar 9, 2021·3 cites·20 claims
- 1092US10495967B2Method of mask simulation model for OPC and mask makingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 3, 2019·7 cites·20 claims
- 1192US7193715B2Measurement of overlay using diffraction gratings when overlay exceeds the grating periodTOKYO ELECTRON LTD·Filed 2003·Granted Mar 20, 2007·46 cites·22 claims
- 1291US11662657B2Photo mask data correction methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted May 30, 2023·1 cites·20 claims
- 1391US8279409B1System and method for calibrating a lithography modelSEZGINER ABDURRAHMAN·Filed 2009·Granted Oct 2, 2012·45 cites·15 claims
- 1490US7519940B2Apparatus and method for compensating a lithography projection toolCADENCE DESIGN SYSTEMS INC·Filed 2005·Granted Apr 14, 2009·13 cites·35 claims
- 1590US7230703B2Apparatus and method for measuring overlay by diffraction gratingsTOKYO ELECTRON LTD·Filed 2004·Granted Jun 12, 2007·38 cites·20 claims
- 1688US12271107B2Method of manufacturing integrated circuitTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Apr 8, 2025·0 cites·20 claims
- 1786US12235589B2Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Feb 25, 2025·0 cites·20 claims
- 1886US9747408B2Generating final mask pattern by performing inverse beam technology processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Aug 29, 2017·5 cites·20 claims
- 1986US7230704B2Diffracting, aperiodic targets for overlay metrology and method to detect gross overlayTOKYO ELECTRON LTD·Filed 2004·Granted Jun 12, 2007·29 cites·23 claims
- 2085US11080458B2Lithography simulation methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Aug 3, 2021·2 cites·20 claims
- 2185US9990460B2Source beam optimization method for improving lithography printabilityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jun 5, 2018·2 cites·20 claims
- 2285US8122389B2Apparatus and method for segmenting edges for optical proximity correctionSEZGINER ABDURRAHMAN·Filed 2010·Granted Feb 21, 2012·4 cites·36 claims
- 2384US7743359B2Apparatus and method for photomask designCADENCE DESIGN SYSTEMS INC·Filed 2005·Granted Jun 22, 2010·8 cites·33 claims
- 2482US11093683B2Test pattern generation systems and methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Aug 17, 2021·2 cites·20 claims
- 2582US7379170B2Apparatus and method for characterizing an image system in lithography projection toolINVARIUM INC·Filed 2005·Granted May 27, 2008·6 cites·31 claims
- 2681US11947254B2Method of mask data synthesis and mask makingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Apr 2, 2024·0 cites·20 claims
- 2781US7743358B2Apparatus and method for segmenting edges for optical proximity correctionCADENCE DESIGN SYSTEMS INC·Filed 2005·Granted Jun 22, 2010·5 cites·32 claims
- 2881US2025199394A1Method of manufacturing integrated circuitTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2978US10417376B2Source beam optimization method for improving lithography printabilityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Sep 17, 2019·1 cites·20 claims
- 3078US2025147431A1Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3176US10962875B2Method of mask simulation model for OPC and mask makingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Mar 30, 2021·1 cites·20 claims
- 3272US11360379B2Photo mask data correction methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jun 14, 2022·0 cites·20 claims
- 3371US11841619B2Method for mask data synthesis with wafer target adjustmentTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Dec 12, 2023·0 cites·20 claims
- 3469US10866525B2Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 15, 2020·0 cites·20 claims
- 3568US12039247B2Test pattern generation systems and methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jul 16, 2024·0 cites·20 claims
- 3667US10866506B2Photo mask data correction methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 15, 2020·0 cites·20 claims
- 3760US11429027B2Photolithography method and apparatusTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Aug 30, 2022·0 cites·20 claims
- 3854US11204897B2Importing and exporting circuit layoutsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 21, 2021·0 cites·20 claims
- 3950US10867112B2Methods of making mask using transmission cross coefficient (TCC) matrix of lithography process optical systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 15, 2020·0 cites·21 claims
- 4037US2004066517A1Interferometry-based method and apparatus for overlay metrologyFiled 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →