Inventor · disambiguated record
Huatan Qiu
Also filed as: QIU HUATAN
22 granted patents·9 pending applications·152 citations·filing 2005–2024
95Inventor score
Top patents by PatentIndex Score
31 records- 0197US11608559B2Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film depositionLAM RES CORP·Filed 2021·Granted Mar 21, 2023·6 cites·20 claims
- 0296US11920239B2Minimizing radical recombination using ALD silicon oxide surface coating with intermittent restoration plasmaLAM RES CORP·Filed 2022·Granted Mar 5, 2024·3 cites·15 claims
- 0396US11365479B2Ex situ coating of chamber components for semiconductor processingLAM RES CORP·Filed 2020·Granted Jun 21, 2022·8 cites·16 claims
- 0496US9828672B2Minimizing radical recombination using ALD silicon oxide surface coating with intermittent restoration plasmaLAM RES CORP·Filed 2015·Granted Nov 28, 2017·25 cites·19 claims
- 0594US12227837B2Ex situ coating of chamber components for semiconductor processingLAM RES CORP·Filed 2022·Granted Feb 18, 2025·2 cites·19 claims
- 0694US11101164B2Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film depositionLAM RES CORP·Filed 2020·Granted Aug 24, 2021·3 cites·24 claims
- 0794US10760158B2Ex situ coating of chamber components for semiconductor processingLAM RES CORP·Filed 2018·Granted Sep 1, 2020·14 cites·23 claims
- 0894US7528386B2Submicron particle removalUNIV ILLINOIS·Filed 2005·Granted May 5, 2009·41 cites·19 claims
- 0993US12000047B2Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film depositionLAM RES CORP·Filed 2023·Granted Jun 4, 2024·1 cites·20 claims
- 1093US10604841B2Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film depositionLAM RES CORP·Filed 2016·Granted Mar 31, 2020·7 cites·24 claims
- 1189US9591738B2Plasma generator systems and methods of forming plasmaQIU HUATAN·Filed 2008·Granted Mar 7, 2017·15 cites·18 claims
- 1287US12331402B2Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film depositionLAM RES CORP·Filed 2024·Granted Jun 17, 2025·0 cites·20 claims
- 1383US8110068B2Gas flow distribution receptacles, plasma generator systems, and methods for performing plasma stripping processesQIU HUATAN·Filed 2008·Granted Feb 7, 2012·11 cites·18 claims
- 1481US2024218509A1Minimizing radical recombination using ald silicon oxide surface coating with intermittent restoration plasmaLAM RES CORP·Filed 2024·Application pending·0 cites
- 1579US12163219B2Ex situ coating of chamber components for semiconductor processingLAM RES CORP·Filed 2022·Granted Dec 10, 2024·0 cites·19 claims
- 1677US9194045B2Continuous plasma and RF bias to regulate damage in a substrate processing systemNOVELLUS SYSTEMS INC·Filed 2013·Granted Nov 24, 2015·5 cites·30 claims
- 1776US8431033B2High density plasma etchback process for advanced metallization applicationsZHOU CHUNMING·Filed 2010·Granted Apr 30, 2013·7 cites·18 claims
- 1870US11702748B2Wafer level uniformity control in remote plasma film depositionLAM RES CORP·Filed 2017·Granted Jul 18, 2023·1 cites·8 claims
- 1969US2023304156A1Wafer level uniformity control in remote plasma film depositionLAM RES CORP·Filed 2023·Application pending·0 cites
- 2068US9209000B2Gas flow distribution receptacles, plasma generator systems, and methods for performing plasma stripping processesQIU HUATAN·Filed 2012·Granted Dec 8, 2015·2 cites·24 claims
- 2160US8273259B1Ashing methodQIU HUATAN·Filed 2009·Granted Sep 25, 2012·1 cites·36 claims
- 2257US11557460B2Radio frequency (RF) signal source supplying RF plasma generator and remote plasma generatorLAM RES CORP·Filed 2019·Granted Jan 17, 2023·0 cites·22 claims
- 2357US2018044791A1Minimizing radical recombination using ald silicon oxide surface coating with intermittent restoration plasmaLAM RES CORP·Filed 2017·Application pending·0 cites
- 2456US2023332291A1Remote plasma architecture for true radical processingLAM RES CORP·Filed 2021·Application pending·0 cites
- 2553US2025132127A1Transformer coupled plasma source design for thin dielectric film depositionLAM RES CORP·Filed 2022·Application pending·0 cites
- 2648US12230495B2Method of depositing silicon nitride filmsLAM RES CORP·Filed 2019·Granted Feb 18, 2025·0 cites·17 claims
- 2748US2023223238A1Increasing plasma uniformity in a receptacleLAM RES CORP·Filed 2021·Application pending·0 cites
- 2840US2014127912A1Plasma process etch-to-deposition ratio modulation via ground surface designWU LIQI·Filed 2012·Application pending·0 cites
- 2939US2012228125A1Creation of magnetic field (vector potential) well for improved plasma deposition and resputtering uniformityWU LIQI·Filed 2012·Application pending·0 cites
- 3038US2012070589A1Creation of magnetic field (vector potential) well for improved plasma deposition and resputtering uniformityWU LIQI·Filed 2011·Application pending·0 cites
- 3133US11004662B2Temperature controlled spacer for use in a substrate processing chamberLAM RES CORP·Filed 2017·Granted May 11, 2021·0 cites·26 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →