Inventor · disambiguated record
Huiyuan Wang
Also filed as: WANG HUIYUAN
14 granted patents·5 pending applications·10 citations·filing 2015–2023
84Inventor score
Top patents by PatentIndex Score
19 records- 0194US10886140B23D NAND etchAPPLIED MATERIALS INC·Filed 2019·Granted Jan 5, 2021·9 cites·19 claims
- 0277US12198936B2Defect free germanium oxide gap fillAPPLIED MATERIALS INC·Filed 2023·Granted Jan 14, 2025·0 cites·20 claims
- 0367US11781218B2Defect free germanium oxide gap fillAPPLIED MATERIALS INC·Filed 2020·Granted Oct 10, 2023·0 cites·20 claims
- 0467US11515170B23D NAND etchAPPLIED MATERIALS INC·Filed 2020·Granted Nov 29, 2022·0 cites·18 claims
- 0565US2022319841A1Deposition of low-stress carbon-containing layersAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 0664US11962474B2Performance modeling for cloud applicationsERICSSON TELEFON AB L M·Filed 2019·Granted Apr 16, 2024·1 cites·19 claims
- 0764US11404263B2Deposition of low-stress carbon-containing layersAPPLIED MATERIALS INC·Filed 2020·Granted Aug 2, 2022·0 cites·17 claims
- 0855US11830734B2Thermal deposition of silicon-germaniumAPPLIED MATERIALS INC·Filed 2021·Granted Nov 28, 2023·0 cites·19 claims
- 0955US11791155B2Diffusion barriers for germaniumAPPLIED MATERIALS INC·Filed 2020·Granted Oct 17, 2023·0 cites·19 claims
- 1055US2019330736A1Low Temperature Atomic Layer Deposition Of Silicon NitrideAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 1154US12018364B2Super-conformal germanium oxide filmsAPPLIED MATERIALS INC·Filed 2020·Granted Jun 25, 2024·0 cites·15 claims
- 1254US11495454B2Deposition of low-stress boron-containing layersAPPLIED MATERIALS INC·Filed 2020·Granted Nov 8, 2022·0 cites·20 claims
- 1352US12046468B2Conformal silicon-germanium film depositionAPPLIED MATERIALS INC·Filed 2020·Granted Jul 23, 2024·0 cites·17 claims
- 1451US11702751B2Non-conformal high selectivity film for etch critical dimension controlAPPLIED MATERIALS INC·Filed 2020·Granted Jul 18, 2023·0 cites·20 claims
- 1547US2022108888A1Selective Deposition of GermaniumAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 1647US2021384015A1Plasma cleaning methods for processing chambersAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 1747US2021327891A1Stack for 3d-nand memory cellAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 1846US11960468B1Late-binding database viewsAMAZON TECH INC·Filed 2018·Granted Apr 16, 2024·0 cites·20 claims
- 1935US10488903B2Extended base of mobile terminal and power supply management method for extended baseHUAWEI TECH CO LTD·Filed 2015·Granted Nov 26, 2019·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →