Inventor · disambiguated record
Hwan J. Jeong
Also filed as: JEONG HWAN J · JEONG HWAN JOO
34 granted patents·2 pending applications·821 citations·filing 1992–2025
97Inventor score
Top patents by PatentIndex Score
36 records- 0198US6531681B1Apparatus having line source of radiant energy for exposing a substrateULTRATECH STEPPER INC·Filed 2000·Granted Mar 11, 2003·241 cites·27 claims
- 0295US10133193B2Piecewise alignment modeling methodAPPLIED MATERIALS INC·Filed 2017·Granted Nov 20, 2018·6 cites·20 claims
- 0393US6142641AFour-mirror extreme ultraviolet (EUV) lithography projection systemULTRATECH STEPPER INC·Filed 1998·Granted Nov 7, 2000·131 cites·31 claims
- 0491US6381077B1Scanning microlithographic apparatus and method for projecting a large field-of-view image on a substrateULTRATECH STEPPER INC·Filed 2000·Granted Apr 30, 2002·44 cites·24 claims
- 0590US7986412B2Interferometric defect detection and classificationJZW LLC·Filed 2010·Granted Jul 26, 2011·11 cites·22 claims
- 0689US11899198B2Controlling light source wavelengths for selectable phase shifts between pixels in digital lithography systemsAPPLIED MATERIALS INC·Filed 2022·Granted Feb 13, 2024·1 cites·20 claims
- 0787US10983441B2Resolution enhanced digital lithography with anti-blazed DMDAPPLIED MATERIALS INC·Filed 2019·Granted Apr 20, 2021·2 cites·13 claims
- 0887US7199946B2Systems configured to provide illumination of a specimen during inspectionKLA TENCOR TECH CORP·Filed 2005·Granted Apr 3, 2007·11 cites·21 claims
- 0987US5822066APoint diffraction interferometer and pin mirror for use therewithULTRATECH STEPPER INC·Filed 1997·Granted Oct 13, 1998·68 cites·74 claims
- 1086US10495983B2Piecewise alignment modeling methodAPPLIED MATERIALS INC·Filed 2018·Granted Dec 3, 2019·2 cites·10 claims
- 1186US7864334B2Interferometric defect detectionJZW LLC·Filed 2008·Granted Jan 4, 2011·12 cites·129 claims
- 1286US6751373B2Wavelength division multiplexing with narrow band reflective filtersGAZILLION BITS INC·Filed 2002·Granted Jun 15, 2004·24 cites·8 claims
- 1385US12372779B2Controlling light source wavelengths for selectable phase shifts between pixels in digital lithography systemsAPPLIED MATERIALS INC·Filed 2024·Granted Jul 29, 2025·0 cites·20 claims
- 1482US5852693ALow-loss light redirection apparatusULTRATECH STEPPER INC·Filed 1996·Granted Dec 22, 1998·63 cites·55 claims
- 1581US7397557B2Serrated Fourier filters and inspection systemsKLA TENCOR TECH CORP·Filed 2005·Granted Jul 8, 2008·7 cites·21 claims
- 1676US5621813APattern recognition alignment systemULTRATECH STEPPER INC·Filed 1995·Granted Apr 15, 1997·68 cites·16 claims
- 1773US9304410B2Apparatus and method of direct writing with photons beyond the diffraction limitMARKLE DAVID A·Filed 2013·Granted Apr 5, 2016·2 cites·20 claims
- 1873US8642232B2Method of direct writing with photons beyond the diffraction limitMARKLE DAVID A·Filed 2012·Granted Feb 4, 2014·2 cites·19 claims
- 1972US5557469ABeamsplitter in single fold optical system and optical variable magnification method and systemULTRATECH STEPPER INC·Filed 1994·Granted Sep 17, 1996·36 cites·28 claims
- 2068US8559014B2High-resolution, common-path interferometric imaging systems and methodsJEONG HWAN J·Filed 2010·Granted Oct 15, 2013·5 cites·23 claims
- 2168US5303001AIllumination system for half-field dyson stepperULTRATECH STEPPER INC·Filed 1992·Granted Apr 12, 1994·31 cites·25 claims
- 2268US2025334888A1Digital lithography overlay metrologyAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 2367US9052494B2Optical imaging system with catoptric objective; broadband objective with mirror; and refractive lenses and broadband optical imaging system having two or more imaging pathsHWANG SHIOW-HWEI·Filed 2010·Granted Jun 9, 2015·2 cites·47 claims
- 2466US9189705B2Phase-controlled model-based overlay measurement systems and methodsJSMSW Technology LLC·Filed 2014·Granted Nov 17, 2015·3 cites·21 claims
- 2566US8817273B2Dark field diffraction based overlayJEONG HWAN J·Filed 2012·Granted Aug 26, 2014·2 cites·32 claims
- 2664US5266790AFocusing technique suitable for use with an unpatterned specular substrateULTRATECH STEPPER INC·Filed 1992·Granted Nov 30, 1993·19 cites·40 claims
- 2762US10372042B2Resolution enhanced digital lithography with anti-blazed DMDAPPLIED MATERIALS INC·Filed 2018·Granted Aug 6, 2019·0 cites·6 claims
- 2861US5402205AAlignment system for a Half-Field Dyson projection systemULTRATECH STEPPER INC·Filed 1992·Granted Mar 28, 1995·17 cites·23 claims
- 2956US6907167B2Optical interleaving with enhanced spectral response and reduced polarization sensitivityGAZILLION BITS INC·Filed 2001·Granted Jun 14, 2005·3 cites·47 claims
- 3053US10451564B2Empirical detection of lens aberration for diffraction-limited optical systemAPPLIED MATERIALS INC·Filed 2018·Granted Oct 22, 2019·0 cites·20 claims
- 3153US10429744B2Image improvement for alignment through incoherent illumination blendingAPPLIED MATERIALS INC·Filed 2018·Granted Oct 1, 2019·0 cites·17 claims
- 3250US12099308B2Methods and apparatus for correcting lithography systemsAPPLIED MATERIALS INC·Filed 2020·Granted Sep 24, 2024·0 cites·20 claims
- 3350US11243480B2System for making accurate grating patterns using multiple writing columns each making multiple scansAPPLIED MATERIALS INC·Filed 2019·Granted Feb 8, 2022·0 cites·20 claims
- 3447US9075013B2Apparatus and methods for microscopy having resolution beyond the Abbe limitPERIODIC STRUCTURES INC·Filed 2013·Granted Jul 7, 2015·0 cites·20 claims
- 3546US5329332ASystem for achieving a parallel relationship between surfaces of wafer and reticle of half-field dyson stepperULTRATECH STEPPER INC·Filed 1992·Granted Jul 12, 1994·8 cites·13 claims
- 3640US2011280038A1Systems for and methods of illumination at a high optical solid angleJEONG HWAN J·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →