Inventor · disambiguated record
Hyo-San Lee
Also filed as: LEE HYO-SAN
35 granted patents·15 pending applications·182 citations·filing 2004–2025
96Inventor score
Top patents by PatentIndex Score
50 records- 0197US8344385B2Vertical-type semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2010·Granted Jan 1, 2013·43 cites·20 claims
- 0293US10679843B2Method of treating substrates using supercritical fluidsSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Jun 9, 2020·7 cites·10 claims
- 0391US7709277B2PAA-based etchant, methods of using same, and resultant structuresSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted May 4, 2010·22 cites·26 claims
- 0489US10029332B2Spot heater and device for cleaning wafer using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Jul 24, 2018·6 cites·16 claims
- 0588US8766343B2Integrated circuit capacitors having sidewall supportsKANG DAE-HYUK·Filed 2012·Granted Jul 1, 2014·10 cites·20 claims
- 0688US8119476B2Methods of forming integrated circuit capacitors having sidewall supports and capacitors formed therebyKANG DAE-HYUK·Filed 2010·Granted Feb 21, 2012·10 cites·16 claims
- 0787US10083829B2Apparatus for treating substrates using supercritical fluids, substrate treatment system including the same and method of treating substrates using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Sep 25, 2018·4 cites·14 claims
- 0887US8790470B2Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methodsLEE HYO-SAN·Filed 2011·Granted Jul 29, 2014·8 cites·35 claims
- 0987US7176041B2PAA-based etchant, methods of using same, and resultant structuresSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Feb 13, 2007·32 cites·17 claims
- 1084US8084367B2Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methodsLEE HYO-SAN·Filed 2007·Granted Dec 27, 2011·9 cites·31 claims
- 1182US8585917B2Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methodsLEE HYO-SAN·Filed 2011·Granted Nov 19, 2013·5 cites·36 claims
- 1279US11142694B2Etchant composition and method of fabricating semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Oct 12, 2021·2 cites·18 claims
- 1379US10576582B2Spot heater and device for cleaning wafer using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Mar 3, 2020·2 cites·12 claims
- 1477US7857939B2Apparatus for treating wafers using supercritical fluidSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Dec 28, 2010·4 cites·11 claims
- 1574US8795541B2Substrate processing method and substrate processing system for performing the sameCHO YONG-JHIN·Filed 2011·Granted Aug 5, 2014·3 cites·11 claims
- 1673US8951383B2Apparatus for treating wafers using supercritical fluidLEE HYO-SAN·Filed 2010·Granted Feb 10, 2015·2 cites·13 claims
- 1771US10525566B2Preparing conditioning disk for chemical mechanical polishing and chemical mechanical polishing method including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Jan 7, 2020·2 cites·17 claims
- 1871US8685272B2Composition for etching silicon oxide layer, method for etching semiconductor device using the same, and composition for etching semiconductor deviceKIM GO-UN·Filed 2009·Granted Apr 1, 2014·5 cites·15 claims
- 1969US8211804B2Methods of forming a hole having a vertical profile and semiconductor devices having a vertical holeLEE HYO-SAN·Filed 2011·Granted Jul 3, 2012·2 cites·20 claims
- 2068US11227761B2Method of removing chemicals from a substrateSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Jan 18, 2022·0 cites·9 claims
- 2166US8557651B2Method of manufacturing a semiconductor device using an etchantLEE HYO-SAN·Filed 2011·Granted Oct 15, 2013·2 cites·19 claims
- 2265US2025236793A1Etching compositions and methods for fabricating semiconductor devices by using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2025·Application pending·0 cites
- 2365US2023211456A1Polishing pad for chemical mechanical polishing, chemical mechanical polishing apparatus inluding the same, and method of fabricating semiconductor device using the chemical mechanical polishing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 2464US10395951B2Method of cleaning a substrate and apparatus for performing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Aug 27, 2019·1 cites·12 claims
- 2562US12297385B2Etching compositions and methods for fabricating semiconductor devices by using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted May 13, 2025·0 cites·9 claims
- 2661US9754806B2Apparatus for treating wafers using supercritical fluidSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Sep 5, 2017·0 cites·19 claims
- 2761US8518772B2Fabricating method of semiconductor deviceBAI KEUN-HEE·Filed 2011·Granted Aug 27, 2013·1 cites·18 claims
- 2857US12476114B2Chemical mechanical polishing method and method for fabricating semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Granted Nov 18, 2025·0 cites·20 claims
- 2954US10795263B2Compositions for removing photoresistSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Oct 6, 2020·0 cites·7 claims
- 3054US2023193080A1Slurry compositions for polishing metal layers, chemical mechanical polishing apparatuses using the same, and methods for fabricating semiconductor devices using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 3153US12046464B2Substrate cleaning composition, method for cleaning substrate using the same, and method for fabricating semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Jul 23, 2024·0 cites·20 claims
- 3253US2008160743A1Composition for cleaning substrates and method of forming gate using the compositionSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 3353US2014283886A1Substrate processing method and substrate processing system for performing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2014·Application pending·0 cites
- 3450US9394509B2Cleaning solution composition and method of cleaning semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Jul 19, 2016·0 cites·15 claims
- 3549US2007051700A1Composition for cleaning substrates and method of forming gate using the compositionLEE HYO-SAN·Filed 2006·Application pending·0 cites
- 3648US10025192B2Methods of manufacturing semiconductor devices using a composition for removing photoresist and methods of removing photoresist from a semiconductor substrateSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Jul 17, 2018·0 cites·19 claims
- 3747US2020071566A1Slurry composition for chemical mechanical polishingSAMSUNG ELECTRONICS CO LTD·Filed 2019·Application pending·0 cites
- 3847US2010267225A1Method of manufacturing semiconductor deviceLEE HYO-SAN·Filed 2009·Application pending·0 cites
- 3945US7959738B2Method of removing photoresist and method of manufacturing a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Jun 14, 2011·0 cites·19 claims
- 4042US10668403B2Source supplier for a supercritical fluid, substrate processing apparatus having the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Jun 2, 2020·0 cites·17 claims
- 4142US2006097220A1Etching solution and method for removing low-k dielectric layerSAMSUNG ELECTRONICS CO LTD·Filed 2005·Application pending·0 cites
- 4242US2006228890A1Cleaning solution and method of forming a metal pattern for a semiconductor device using the sameLEE HYO-SAN·Filed 2006·Application pending·0 cites
- 4341US2015151336A1Nozzle and apparatus for processing a substrate including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2014·Application pending·0 cites
- 4440US11676824B2Chemical mechanical polishing apparatus for controlling polishing uniformitySAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Jun 13, 2023·0 cites·19 claims
- 4540US11149234B2Cleaning composition, cleaning apparatus, and method of fabricating semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Oct 19, 2021·0 cites·9 claims
- 4640US2006246666A1Method of fabricating flash memory with u-shape floating gateHAN JEONG-NAM·Filed 2006·Application pending·0 cites
- 4737US10332762B2Chemical liquid supply apparatus and semiconductor processing apparatus having the sameSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Jun 25, 2019·0 cites·20 claims
- 4834US2017069513A1Semiconductor cleaning process system and methods of manufacturing semiconductor devicesSAMSUNG ELECTRONICS CO LTD·Filed 2016·Application pending·0 cites
- 4933US2017110316A1Method of cleaning substrate and method of fabricating semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2016·Application pending·0 cites
- 5032US2012064727A1Substrate treatment equipment and method of treating substrate using the sameOH JUNG-MIN·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →