Inventor · disambiguated record
Ian J. Morey
Also filed as: MOREY IAN · MOREY IAN J · MOREY IAN JAMES
10 granted patents·1 pending application·499 citations·filing 1992–2003
93Inventor score
Technology areasH10P
Top patents by PatentIndex Score
11 records- 0192US6426304B1Post etch photoresist strip with hydrogen for organosilicate glass low-κ etch applicationsLAM RES CORP·Filed 2000·Granted Jul 30, 2002·69 cites·17 claims
- 0292US6410437B1Method for etching dual damascene structures in organosilicate glassLAM RES CORP·Filed 2000·Granted Jun 25, 2002·66 cites·10 claims
- 0390US6383931B1Convertible hot edge ring to improve low-K dielectric etchLAM RES CORP·Filed 2000·Granted May 7, 2002·59 cites·17 claims
- 0485US6696366B1Technique for etching a low capacitance dielectric layerLAM RES CORP·Filed 1999·Granted Feb 24, 2004·86 cites·28 claims
- 0584US6653734B2Convertible hot edge ring to improve low-K dielectric etchLAM RES CORP·Filed 2002·Granted Nov 25, 2003·31 cites·19 claims
- 0680US6114250ATechniques for etching a low capacitance dielectric layer on a substrateLAM RES CORP·Filed 1998·Granted Sep 5, 2000·61 cites·20 claims
- 0779US6777344B2Post-etch photoresist strip with O2 and NH3 for organosilicate glass low-K dielectric etch applicationsLAM RES CORP·Filed 2001·Granted Aug 17, 2004·25 cites·13 claims
- 0875US6841483B2Unique process chemistry for etching organic low-k materialsLAM RES CORP·Filed 2001·Granted Jan 11, 2005·19 cites·13 claims
- 0975US5242538AReactive ion etch process including hydrogen radicalsAPPLIED MATERIALS INC·Filed 1992·Granted Sep 7, 1993·63 cites·29 claims
- 1055US6165910ASelf-aligned contacts for semiconductor deviceLAM RES CORP·Filed 1997·Granted Dec 26, 2000·20 cites·26 claims
- 1137US2004115565A1Method for patterning a layer of a low dielectric constant materialLAM RES CORP·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →