Inventor · disambiguated record
Ingo Bork
Also filed as: BORK INGO
12 granted patents·7 pending applications·100 citations·filing 2011–2016
90Inventor score
Top patents by PatentIndex Score
19 records- 0196US8473875B2Method and system for forming high accuracy patterns using charged particle beam lithographyFUJIMURA AKIRA·Filed 2011·Granted Jun 25, 2013·39 cites·16 claims
- 0295US8719739B2Method and system for forming patterns using charged particle beam lithographyD2S INC·Filed 2013·Granted May 6, 2014·22 cites·33 claims
- 0393US9057956B2Method and system for design of enhanced edge slope patterns for charged particle beam lithographyFUJIMURA AKIRA·Filed 2011·Granted Jun 16, 2015·9 cites·24 claims
- 0491US9043734B2Method and system for forming high accuracy patterns using charged particle beam lithographyD2S INC·Filed 2013·Granted May 26, 2015·13 cites·8 claims
- 0589US9612530B2Method and system for design of enhanced edge slope patterns for charged particle beam lithographyD2S INC·Filed 2016·Granted Apr 4, 2017·4 cites·16 claims
- 0682US10031413B2Method and system for forming patterns using charged particle beam lithographyD2S INC·Filed 2016·Granted Jul 24, 2018·3 cites·20 claims
- 0780US9400857B2Method and system for forming patterns using charged particle beam lithographyD2S INC·Filed 2013·Granted Jul 26, 2016·5 cites·12 claims
- 0880US9034542B2Method and system for forming patterns with charged particle beam lithographyD2S INC·Filed 2014·Granted May 19, 2015·3 cites·29 claims
- 0967US9091946B2Method and system for forming non-manhattan patterns using variable shaped beam lithographyD2S INC·Filed 2013·Granted Jul 28, 2015·1 cites·11 claims
- 1064US8703389B2Method and system for forming patterns with charged particle beam lithographyFUJIMURA AKIRA·Filed 2011·Granted Apr 22, 2014·1 cites·28 claims
- 1158US9164372B2Method and system for forming non-manhattan patterns using variable shaped beam lithographyD2S INC·Filed 2014·Granted Oct 20, 2015·0 cites·26 claims
- 1255US9465297B2Method and system for forming patterns with charged particle beam lithographyD2S INC·Filed 2015·Granted Oct 11, 2016·0 cites·12 claims
- 1352US2017023862A1Method and system for forming patterns with charged particle beam lithographyD2S INC·Filed 2016·Application pending·0 cites
- 1452US2012278770A1Method and system for forming non-manhattan patterns using variable shaped beam lithographyFUJIMURA AKIRA·Filed 2012·Application pending·0 cites
- 1549US2015338737A1Method and System for Design of Enhanced Edge Slope Patterns for Charged Particle Beam LithographyD2S INC·Filed 2015·Application pending·0 cites
- 1647US2013252143A1Method and system for design of enhanced accuracy patterns for charged particle beam lithographyD2S INC·Filed 2013·Application pending·0 cites
- 1744US2014352873A1Winding method for the production of a rotationally symmetric, tube-like hollow body preform, device and method for the production of a device for producing the sameBOSCH GMBH ROBERT·Filed 2012·Application pending·0 cites
- 1838US2012221980A1Method and system for design of enhanced accuracy patterns for charged particle beam lithographyFUJIMURA AKIRA·Filed 2011·Application pending·0 cites
- 1936US2014360360A1Method for determining a position of a piston in a piston pressure accumulator by means of inductive sensors and suitably designed piston pressure accumulatorBOSCH GMBH ROBERT·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →