Inventor · disambiguated record
Ingo Saenger
Also filed as: SAENGER INGO
30 granted patents·1 pending application·27 citations·filing 2010–2016
93Inventor score
Top patents by PatentIndex Score
31 records- 0189US9551941B2Illumination system for an EUV lithography device and facet mirror thereforZEISS CARL SMT GMBH·Filed 2015·Granted Jan 24, 2017·4 cites·24 claims
- 0288US9645503B2CollectorZEISS CARL SMT GMBH·Filed 2014·Granted May 9, 2017·5 cites·22 claims
- 0382US10151982B2Illumination system of a microlithographic projection exposure apparatus with a birefringent elementZEISS CARL SMT GMBH·Filed 2016·Granted Dec 11, 2018·2 cites·23 claims
- 0482US9678439B2MirrorZEISS CARL SMT GMBH·Filed 2015·Granted Jun 13, 2017·3 cites·23 claims
- 0577US9632413B2Apparatus and method for compensating a defect of a channel of a microlithographic projection exposure systemZEISS CARL SMT GMBH·Filed 2014·Granted Apr 25, 2017·2 cites·28 claims
- 0670US9955563B2EUV light source for generating a usable output beam for a projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Apr 24, 2018·2 cites·20 claims
- 0770US9678432B2Optical assembly for increasing the etendueZEISS CARL SMT GMBH·Filed 2015·Granted Jun 13, 2017·2 cites·20 claims
- 0870US9665008B2Mirror system comprising at least one mirror for use for guiding illumination and imaging light in EUV projection lithographyZEISS CARL SMT GMBH·Filed 2014·Granted May 30, 2017·1 cites·13 claims
- 0967US9507269B2Illumination optical unit for projection lithographyZEISS CARL SMT GMBH·Filed 2013·Granted Nov 29, 2016·1 cites·22 claims
- 1067US9411245B2Polarization-influencing optical arrangement, in particular in a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2013·Granted Aug 9, 2016·1 cites·22 claims
- 1165US9946161B2Optical system for a microlithographic projection exposure apparatus and microlithographic exposure methodZEISS CARL SMT GMBH·Filed 2012·Granted Apr 17, 2018·1 cites·27 claims
- 1263US8098366B2Optical system, in particular of a microlithographic projection exposure apparatusSAENGER INGO·Filed 2010·Granted Jan 17, 2012·2 cites·15 claims
- 1362US8891060B2Optical system, in particular of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2013·Granted Nov 18, 2014·1 cites·20 claims
- 1453US9798249B2Method and apparatus for compensating at least one defect of an optical systemZEISS CARL SMS LTD·Filed 2014·Granted Oct 24, 2017·0 cites·20 claims
- 1551US9588433B2Optical system, in particular of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Mar 7, 2017·0 cites·21 claims
- 1651US9442385B2Optical system for a microlithographic projection exposure apparatus and microlithographic exposure methodZEISS CARL SMT GMBH·Filed 2014·Granted Sep 13, 2016·0 cites·17 claims
- 1751US9182677B2Optical system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Nov 10, 2015·0 cites·25 claims
- 1850US9817317B2Optical system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Nov 14, 2017·0 cites·27 claims
- 1949US9195057B2Illumination optical unit for a projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Nov 24, 2015·0 cites·20 claims
- 2048US9316920B2Illumination system of a microlithographic projection exposure apparatus with a birefringent elementFIOLKA DAMIAN·Filed 2010·Granted Apr 19, 2016·0 cites·27 claims
- 2148US8917433B2Optical system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2013·Granted Dec 23, 2014·0 cites·20 claims
- 2247US9323156B2Optical system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2012·Granted Apr 26, 2016·0 cites·23 claims
- 2347US8922753B2Optical system for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Dec 30, 2014·0 cites·22 claims
- 2446US9500956B2Optical system of a microlithographic projection exposure apparatus, and microlithographic exposureZEISS CARL SMT GMBH·Filed 2013·Granted Nov 22, 2016·0 cites·18 claims
- 2543US10041836B2Polarization measuring device, lithography apparatus, measuring arrangement, and method for polarization measurementZEISS CARL SMT GMBH·Filed 2015·Granted Aug 7, 2018·0 cites·30 claims
- 2643US9581910B2Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Feb 28, 2017·0 cites·21 claims
- 2742US9488918B2Optical system for a microlithographic projection exposure apparatus and microlithographic exposure methodZEISS CARL SMT GMBH·Filed 2015·Granted Nov 8, 2016·0 cites·30 claims
- 2842US9405202B2Optical system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Aug 2, 2016·0 cites·24 claims
- 2940US9477025B2EUV light source for generating a used output beam for a projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Oct 25, 2016·0 cites·11 claims
- 3040US9140994B2Method for adjusting an optical system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Sep 22, 2015·0 cites·21 claims
- 3138US2011194093A1Polarization-influencing optical arrangement and an optical system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →