Inventor · disambiguated record
Inkyun Shin
Also filed as: SHIN INKYUN
12 granted patents·15 pending applications·2 citations·filing 2011–2024
80Inventor score
Top patents by PatentIndex Score
27 records- 0178US12481212B2Blank mask and photomask using the sameSK ENPULSE CO LTD·Filed 2024·Granted Nov 25, 2025·0 cites·16 claims
- 0275US10056229B2Charged-particle beam exposure method and charged-particle beam correction methodSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Aug 21, 2018·2 cites·20 claims
- 0366US2022214609A1Blank mask and photomask using the sameSKC SOLMICS CO LTD·Filed 2022·Application pending·0 cites
- 0463US12455501B2Blank mask and photomask using the sameSK ENPULSE CO LTD·Filed 2022·Granted Oct 28, 2025·0 cites·15 claims
- 0562US2023193043A1Method of preparing laminate and laminate for optical useSKC SOLMICS CO LTD·Filed 2022·Application pending·0 cites
- 0660US2023418150A1Blank mask and photomask using the sameSK ENPULSE CO LTD·Filed 2023·Application pending·0 cites
- 0758US12487517B2Blank mask and photomask using the sameSK ENPULSE CO LTD·Filed 2022·Granted Dec 2, 2025·0 cites·18 claims
- 0858US2023305382A1Photomask for extreme ultravioletSK ENPULSE CO LTD·Filed 2023·Application pending·0 cites
- 0957US2023213849A1Blank mask and photomask using the sameSKC SOLMICS CO LTD·Filed 2022·Application pending·0 cites
- 1057US2023408903A1Shadow mask and method of manufacturing blank mask using the sameSK ENPULSE CO LTD·Filed 2023·Application pending·0 cites
- 1156US2023185185A1Method and apparatus for forming a blank mask and a layer for a blank maskSKC SOLMICS CO LTD·Filed 2022·Application pending·0 cites
- 1255US12461439B2Blank mask and photomask using the sameSK ENPULSE CO LTD·Filed 2022·Granted Nov 4, 2025·0 cites·18 claims
- 1355US2023135037A1Blank mask and photomask using the sameSKC SOLMICS CO LTD·Filed 2022·Application pending·0 cites
- 1455US2023110529A1Blank mask and photomask using the sameSKC SOLMICS CO LTD·Filed 2022·Application pending·0 cites
- 1554US2023064333A1Method of cleaning substrate for blank mask, substrate for blank mask, and blank mask including the sameSKC SOLMICS CO LTD·Filed 2022·Application pending·0 cites
- 1653US12461438B2Blank mask and photomask using the sameSK ENPULSE CO LTD·Filed 2022·Granted Nov 4, 2025·0 cites·15 claims
- 1753US2022397819A1Blank mask and photomask using the sameSKC SOLMICS CO LTD·Filed 2022·Application pending·0 cites
- 1853US2023367200A1Blank mask and photomask using the sameSK ENPULSE CO LTD·Filed 2023·Application pending·0 cites
- 1952US9223199B2Photomask and method of forming the sameSAMSUNG ELECTRONICS CO LTD·Filed 2013·Granted Dec 29, 2015·0 cites·11 claims
- 2051US2024192584A1Blank mask and photomask using the sameSK ENPULSE CO LTD·Filed 2022·Application pending·0 cites
- 2150US9766540B2Method of forming photomaskSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Sep 19, 2017·0 cites·9 claims
- 2249US12276905B2Blank mask and photomask using the sameSK ENPULSE CO LTD·Filed 2022·Granted Apr 15, 2025·0 cites·9 claims
- 2347US2022350238A1Photomask blank, photomask, and manufacturing method of semiconductor elementSKC SOLMICS CO LTD·Filed 2022·Application pending·0 cites
- 2445US9323142B2Methods of reducing registration errors of photomasks and photomasks formed using the methodsSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Apr 26, 2016·0 cites·19 claims
- 2540US10007185B2Electron beam lithography method and apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Jun 26, 2018·0 cites·20 claims
- 2633US9709893B2Exposure method using electron beam and substrate manufacturing method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Jul 18, 2017·0 cites·18 claims
- 2724US2011253043A1Nozzle, Substrate Processing Apparatus Including The Nozzle, And Processing Solution Supply Method Using The ApparatusSAMSUNG ELECTRONICS CO LTD·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →