Inventor · disambiguated record
Jacques Schmitt
Also filed as: SCHMITT JACQUES
33 granted patents·4 pending applications·1,753 citations·filing 1986–2014
98Inventor score
Files withBALZERS HOCHVAKUUM7UNAXIS BALZERS AG7OERLIKON TRADING AG4SOLEMS SA4OC OERLIKON BALZERS AG2
Top patents by PatentIndex Score
37 records- 0198US6228438B1Plasma reactor for the treatment of large size substratesUNAXIS BALZERS AG·Filed 1999·Granted May 8, 2001·157 cites·3 claims
- 0297US6502530B1Design of gas injection for the electrode in a capacitively coupled RF plasma reactorUNAXIS BALZERS AG·Filed 2000·Granted Jan 7, 2003·537 cites·20 claims
- 0396US6869641B2Method and apparatus for ALD on a rotary susceptorUNAXIS BALZERS LTD·Filed 2003·Granted Mar 22, 2005·80 cites·23 claims
- 0494USD353129SSemi-transparent solar module panelPhototronics OHG·Filed 1992·Granted Dec 6, 1994·153 cites·1 claims
- 0594US4989543AProcess and means for producing films for use in electronics and/or optoelectronics using plasmaSOLEMS SA·Filed 1988·Granted Feb 5, 1991·74 cites·4 claims
- 0692US5981899ACapacitively coupled RF-plasma reactorBALZERS HOCHVAKUUM·Filed 1997·Granted Nov 9, 1999·76 cites·29 claims
- 0791US7784426B2Plasma reactor for the treatment of large size substratesOC OERLIKON BALZERS AG·Filed 2007·Granted Aug 31, 2010·10 cites·6 claims
- 0890US6281469B1Capacitively coupled RF-plasma reactorUNAXIS BALZERS AG·Filed 1999·Granted Aug 28, 2001·67 cites·45 claims
- 0990US5254179APhotovoltaic device and solar module having a partial transparencySOLEMS SA·Filed 1992·Granted Oct 19, 1993·131 cites·13 claims
- 1086US7661388B2Plasma reactor for the treatment of large size substratesOERLIKON SOLAR IP AG TRUEBBACH·Filed 2007·Granted Feb 16, 2010·9 cites·5 claims
- 1184US5693238AMethod for improving the rate of a plasma enhanced vacuum treatmentBALZERS HOCHVAKUUM·Filed 1994·Granted Dec 2, 1997·45 cites·31 claims
- 1284US5039353AProcess for improving the spectral response of a photoconductive structure, and improved solar cell and photoreceptive structureSOLEMS SOCIETE ANONYME·Filed 1990·Granted Aug 13, 1991·80 cites·12 claims
- 1383US5515986APlasma treatment apparatus and method for operating sameBALZERS HOCHVAKUUM·Filed 1994·Granted May 14, 1996·91 cites·27 claims
- 1479US6074691AMethod for monitoring the flow of a gas into a vacuum reactorBALZERS HOCHVAKUUM·Filed 1997·Granted Jun 13, 2000·57 cites·25 claims
- 1578US7306829B2RF plasma reactor having a distribution chamber with at least one gridUNAXIS BALZERS AG·Filed 2002·Granted Dec 11, 2007·11 cites·6 claims
- 1673US6177129B1Process for handling workpieces and apparatus thereforBALZERS HOCHVAKUUM·Filed 1999·Granted Jan 23, 2001·35 cites·26 claims
- 1771US9045828B2RF plasma reactor having a distribution chamber with at least one gridTURLOT EMMANUEL·Filed 2007·Granted Jun 2, 2015·3 cites·13 claims
- 1870US6890862B2Processes for vacuum treating workpieces, and corresponding process equipmentUNAXIS BALZERS AG·Filed 2001·Granted May 10, 2005·10 cites·55 claims
- 1969US5252139APhotovoltaic thin layers panel structureSOLEMS SA·Filed 1992·Granted Oct 12, 1993·36 cites·17 claims
- 2065US7687117B2Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substratesOERLIKON TRADING AG·Filed 2008·Granted Mar 30, 2010·1 cites·3 claims
- 2163US7504279B2Method for producing semi-conducting devices and devices obtained with this methodOERLIKON TRADING AG·Filed 2007·Granted Mar 17, 2009·2 cites·6 claims
- 2263US4798739APlasma-assisted method for thin film fabricationSOLEMS SA·Filed 1986·Granted Jan 17, 1989·20 cites·1 claims
- 2361US6533534B2Method for improving the rate of a plasma enhanced vacuum treatmentUNAXIS BALZERS AG·Filed 1999·Granted Mar 18, 2003·19 cites·1 claims
- 2457US5789851AField emission deviceBALZERS HOCHVAKUUM·Filed 1995·Granted Aug 4, 1998·18 cites·9 claims
- 2556US2005160984A1Method and apparatus for ALD on a rotary susceptorFiled 2005·Application pending·0 cites
- 2654US10658159B2Plasma reactor vessel having improved plasma uniformity comprised of a first electrode, a second electrode opposed to the first electrode, and a third electrode between a substrate carrier and the second electrodeINDEOTEC SA·Filed 2014·Granted May 19, 2020·2 cites·11 claims
- 2749US2009127673A1Method for producing semi-conducting devices and devices obtained with this methodOERLIKON TRADING AG·Filed 2009·Application pending·0 cites
- 2848US7662302B2Lifting and supporting deviceOERLIKON SOLAR IP AG TRUBBACH·Filed 2002·Granted Feb 16, 2010·3 cites·53 claims
- 2947US5749985AProcess for optimizing multilayered tubes made of composite materials and tubes obtained through the processINST FRANCAIS DU PETROLE·Filed 1993·Granted May 12, 1998·16 cites·7 claims
- 3046US7487740B2Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substratesOERLIKON TRADING AG·Filed 2004·Granted Feb 10, 2009·1 cites·11 claims
- 3144US7344909B2Method for producing semi-conducting devices and devices obtained with this methodOC OERLIKON BALZERS AG·Filed 2003·Granted Mar 18, 2008·2 cites·7 claims
- 3243US8056504B2Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substratesSCHMITT JACQUES·Filed 2010·Granted Nov 15, 2011·0 cites·12 claims
- 3343US2001023742A1Plasma reactor for the treatment of large size substratesUNAXIS BALZERS AG FL 9496 BALZ·Filed 2001·Application pending·0 cites
- 3436US6507145B1Ballast layer for field emissive deviceBALZERS HOCHVAKUUM·Filed 2000·Granted Jan 14, 2003·0 cites·14 claims
- 3535US6391377B1Process for vacuum treating workpieces, and corresponding process equipmentUNAXIS BALZERS AG·Filed 1999·Granted May 21, 2002·4 cites·13 claims
- 3635US2006016398A1Supporting and lifting device for substrates in vacuumDUBOST LAURENT·Filed 2005·Application pending·0 cites
- 3727US6127271AProcess for dry etching and vacuum treatment reactorBALZERS HOCHVAKUUM AG·Filed 1998·Granted Oct 3, 2000·3 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →