Inventor · disambiguated record
Jacek Tyminski
Also filed as: TYMINSKI JACEK · TYMINSKI JACEK K · TYMINSKI JACEK KAZIMIERZ
14 granted patents·3 pending applications·117 citations·filing 2003–2022
90Inventor score
Top patents by PatentIndex Score
17 records- 0195US6842223B2Enhanced illuminator for use in photolithographic systemsNIKON PREC INC·Filed 2003·Granted Jan 11, 2005·82 cites·25 claims
- 0292US10488763B2Pattern-edge placement predictor and monitor for lithographic exposure toolNIKON CORP·Filed 2019·Granted Nov 26, 2019·4 cites·27 claims
- 0391US8365107B2Scanner based optical proximity correction system and method of useNIKON CORP·Filed 2008·Granted Jan 29, 2013·10 cites·28 claims
- 0489US9286416B2Scanner based optical proximity correction system and method of useNIKON CORP·Filed 2012·Granted Mar 15, 2016·4 cites·23 claims
- 0587US8572518B2Predicting pattern critical dimensions in a lithographic exposure processTYMINSKI JACEK K·Filed 2011·Granted Oct 29, 2013·9 cites·29 claims
- 0684US9753363B2Scanner based optical proximity correction system and method of useNIKON CORP·Filed 2016·Granted Sep 5, 2017·3 cites·22 claims
- 0782US10234756B2Scanner based optical proximity correction system and method of useNIKON CORP·Filed 2017·Granted Mar 19, 2019·2 cites·12 claims
- 0876US9529253B2Predicting pattern critical dimensions in a lithographic exposure processNIKON PREC INC·Filed 2013·Granted Dec 27, 2016·2 cites·18 claims
- 0970US11175691B1Power-optimized ranging sequence by snapshot clock switchingNXP BV·Filed 2020·Granted Nov 16, 2021·1 cites·20 claims
- 1065US12241990B2Method, device and system for verifying UWB ranging resultsNXP BV·Filed 2022·Granted Mar 4, 2025·0 cites·20 claims
- 1163US2019163050A1Scanner based optical proximity correction system and method of useNIKON CORP·Filed 2019·Application pending·0 cites
- 1258US10345715B2Pattern-edge placement predictor and monitor for lithographic exposure toolNIKON CORP·Filed 2018·Granted Jul 9, 2019·0 cites·37 claims
- 1357US2022293390A1E-beam position trackerNIKON CORP·Filed 2022·Application pending·0 cites
- 1456US2024157641A1Directed energy beam deflection field monitor and correctorNIKON CORP·Filed 2022·Application pending·0 cites
- 1554US12196838B2Method of determining a distance between a first device and a second deviceNXP BV·Filed 2022·Granted Jan 14, 2025·0 cites·20 claims
- 1651USRE41681EEnhanced illuminator for use in photolithographic systemsNIKON PREC INC·Filed 2006·Granted Sep 14, 2010·0 cites·70 claims
- 1738US10018922B2Tuning of optical projection system to optimize image-edge placementNIKON CORP·Filed 2016·Granted Jul 10, 2018·0 cites·37 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →