Scanner based optical proximity correction system and method of use

Abstract

A modeling technique is provided. The modeling technique includes inputting tool parameters into a model and inputting basic model parameters into the model. The technique further includes generating a simulated, corrected reticle design using the tool parameters and the basic model parameters. An image of test patterns is compared against the simulated, corrected reticle design. A determination is made as to whether δ1<ε1, wherein δ1 represents model vs. exposure difference and ε1 represents predetermined criteria. The technique further includes completing the model when δ1<ε1.

What is claimed is: 
     
         1 . A modeling method, comprising:
 obtaining an encrypted parameter of a projection tool which projects an image of a reticle onto a substrate; and   inputting the encrypted parameter of the projection tool into a model which calculates a pattern image of the reticle.   
     
     
         2 . The modeling method of  claim 1 , further comprising:
 inputting pattern information of the reticle into the model which was inputted with the encrypted parameter; and   calculating the pattern image by using the model which was inputted with the pattern information.   
     
     
         3 . The modeling method of  claim 1 , further comprising:
 preparing a test pattern;   inputting information regarding the test pattern into the model; and   calculating the pattern image by using the model which was inputted with the information regarding the test pattern.   
     
     
         4 . The modeling method of  claim 3 , further comprising:
 exposing the test pattern by using the projection tool; and   correcting the model by using an exposure result of the test pattern.   
     
     
         5 . The modeling method of  claim 4 , wherein the encrypted parameter comprises at least one of:
 illuminator details;   lens signature as defined in terms of a Jones Matrix Map representing a lens signature;   local and global flare data;   longitudinal chromatic aberrations;   an illuminator spectrum; and   transverse and longitudinal synchronization errors.   
     
     
         6 . The modeling method of  claim 5 , wherein the encrypted parameter further comprises at least one of: NA error; Sigma error; and thermal aberration. 
     
     
         7 . The modeling method of  claim 1 , further comprising:
 conducting an optical proximity effect (OPE) sensitivity analysis in order to determine which encrypted parameters are to be used in the model.