Inventor · disambiguated record
Jay Wallace
Also filed as: WALLACE JAY · WALLACE JAY R
25 granted patents·6 pending applications·1,148 citations·filing 2000–2021
96Inventor score
Files withTOKYO ELECTRON LTD15APPLIED MATERIALS INC6VARIAN SEMICONDUCTOR EQUIPMENT ASS INC4WALLACE JAY R3GWINN MATTHEW C1
Top patents by PatentIndex Score
31 records- 0198US7651583B2Processing system and method for treating a substrateTOKYO ELECTRON LTD·Filed 2004·Granted Jan 26, 2010·558 cites·21 claims
- 0297US6951821B2Processing system and method for chemically treating a substrateTOKYO ELECTRON LTD·Filed 2003·Granted Oct 4, 2005·306 cites·36 claims
- 0392US7462564B2Processing system and method for treating a substrateTOKYO ELECTRON LTD·Filed 2006·Granted Dec 9, 2008·18 cites·41 claims
- 0491US7079760B2Processing system and method for thermally treating a substrateTOKYO ELECTRON LTD·Filed 2003·Granted Jul 18, 2006·61 cites·28 claims
- 0591US7029536B2Processing system and method for treating a substrateTOKYO ELECTRON LTD·Filed 2003·Granted Apr 18, 2006·49 cites·23 claims
- 0690US7964058B2Processing system and method for chemically treating a substrateTOKYO ELECTRON LTD·Filed 2005·Granted Jun 21, 2011·13 cites·9 claims
- 0788US7462243B2Chemical processing system and methodTOKYO ELECTRON LTD·Filed 2005·Granted Dec 9, 2008·13 cites·44 claims
- 0887US8303716B2High throughput processing system for chemical treatment and thermal treatment and method of operatingWALLACE JAY R·Filed 2008·Granted Nov 6, 2012·12 cites·20 claims
- 0987US6558506B1Etching system and etching chamberTOKYO ELECTRON LTD·Filed 2000·Granted May 6, 2003·48 cites·20 claims
- 1081US8791430B2Scanner for GCIB systemGWINN MATTHEW C·Filed 2012·Granted Jul 29, 2014·7 cites·21 claims
- 1179US9865433B1Gas injection system for ion beam deviceVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Jan 9, 2018·2 cites·20 claims
- 1278US8409399B2Reduced maintenance chemical oxide removal (COR) processing systemLAFLAMME JR ARTHUR H·Filed 2009·Granted Apr 2, 2013·7 cites·21 claims
- 1378US7214274B2Method and apparatus for thermally insulating adjacent temperature controlled processing chambersTOKYO ELECTRON LTD·Filed 2003·Granted May 8, 2007·22 cites·12 claims
- 1475US8287688B2Substrate support for high throughput chemical treatment systemWALLACE JAY R·Filed 2008·Granted Oct 16, 2012·5 cites·20 claims
- 1574US7461614B2Method and apparatus for improved baffle plateTOKYO ELECTRON LTD·Filed 2003·Granted Dec 9, 2008·16 cites·11 claims
- 1672US8323410B2High throughput chemical treatment system and method of operatingWALLACE JAY R·Filed 2008·Granted Dec 4, 2012·4 cites·20 claims
- 1761US11948781B2Apparatus and system including high angle extraction opticsAPPLIED MATERIALS INC·Filed 2021·Granted Apr 2, 2024·0 cites·20 claims
- 1861US11495430B2Tunable extraction assembly for wide angle ion beamAPPLIED MATERIALS INC·Filed 2020·Granted Nov 8, 2022·0 cites·13 claims
- 1961US11361935B2Apparatus and system including high angle extraction opticsAPPLIED MATERIALS INC·Filed 2020·Granted Jun 14, 2022·0 cites·20 claims
- 2058US12106943B2Substrate halo arrangement for improved process uniformityAPPLIED MATERIALS INC·Filed 2021·Granted Oct 1, 2024·0 cites·9 claims
- 2157US6695318B2Electronic device processing equipment having contact gasket between chamber partsTOKYO ELECTRON LTD·Filed 2001·Granted Feb 24, 2004·3 cites·31 claims
- 2253US8115140B2Heater assembly for high throughput chemical treatment systemLAUNSBY CHARLES R·Filed 2008·Granted Feb 14, 2012·2 cites·20 claims
- 2352US12191117B2Compact low angle ion beam extraction assembly and processing apparatusAPPLIED MATERIALS INC·Filed 2021·Granted Jan 7, 2025·0 cites·16 claims
- 2450US2013061878A1High throughput processing system for chemical treatment and thermal treatment and method of operatingTOKYO ELECTRON LTD·Filed 2012·Application pending·0 cites
- 2549US2011204029A1Processing system and method for chemically treating a substrateTOKYO ELECTRON LTD·Filed 2011·Application pending·0 cites
- 2646US2023197422A1Fastening assembly for beam blocker in ion processing apparatusAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 2745US7083161B2Method and apparatus for providing vacuum isolationTOKYO ELECTRON LTD·Filed 2004·Granted Aug 1, 2006·2 cites·14 claims
- 2843US10062548B2Gas injection system for ion beam deviceVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Aug 28, 2018·0 cites·10 claims
- 2942US2004182315A1Reduced maintenance chemical oxide removal (COR) processing systemTOKYO ELECTRON LTD·Filed 2003·Application pending·0 cites
- 3040US2019272983A1Substrate halo arrangement for improved process uniformityVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Application pending·0 cites
- 3137US2018122670A1Removable substrate plane structure ringVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →