Inventor · disambiguated record
Jacqueline S. Wrench
Also filed as: WRENCH JACQUELINE · WRENCH JACQUELINE S · WRENCH JACQUELINE SAMANTHA
30 granted patents·8 pending applications·9 citations·filing 2018–2024
93Inventor score
Files withAPPLIED MATERIALS INC38
Top patents by PatentIndex Score
38 records- 0195US12022650B2Low resistivity DRAM buried word line stackAPPLIED MATERIALS INC·Filed 2023·Granted Jun 25, 2024·2 cites·20 claims
- 0294US11587936B2Low resistivity DRAM buried word line stackAPPLIED MATERIALS INC·Filed 2021·Granted Feb 21, 2023·2 cites·20 claims
- 0393US11417517B2Treatments to enhance material structuresAPPLIED MATERIALS INC·Filed 2020·Granted Aug 16, 2022·2 cites·20 claims
- 0488US11245022B2Integrated dipole flow for transistorAPPLIED MATERIALS INC·Filed 2020·Granted Feb 8, 2022·2 cites·7 claims
- 0582US2024266163A1Treatments to enhance material structuresAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0681US11359282B2Methods for forming impurity free metal alloy filmsAPPLIED MATERIALS INC·Filed 2020·Granted Jun 14, 2022·1 cites·10 claims
- 0778US11961734B2Treatments to enhance material structuresAPPLIED MATERIALS INC·Filed 2022·Granted Apr 16, 2024·0 cites·10 claims
- 0878US11955332B2Treatments to enhance material structuresAPPLIED MATERIALS INC·Filed 2022·Granted Apr 9, 2024·0 cites·18 claims
- 0976US11894233B2Electronic device having an oxygen free platinum group metal filmAPPLIED MATERIALS INC·Filed 2022·Granted Feb 6, 2024·0 cites·9 claims
- 1076US2024287678A1Methods for forming impurity free metal alloy filmsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1175US12051734B2PMOS high-k metal gatesAPPLIED MATERIALS INC·Filed 2022·Granted Jul 30, 2024·0 cites·13 claims
- 1272US12453086B2Low resistivity metal contact stackAPPLIED MATERIALS INC·Filed 2021·Granted Oct 21, 2025·0 cites·15 claims
- 1372US12328872B2Liner for V-NAND word line stackAPPLIED MATERIALS INC·Filed 2022·Granted Jun 10, 2025·0 cites·7 claims
- 1472US2024268108A1V-nand stacks with dipole regionsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1571US2024154018A1Methods of forming semiconductor structuresAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1668US11888045B2Integrated dipole flow for transistorAPPLIED MATERIALS INC·Filed 2021·Granted Jan 30, 2024·0 cites·16 claims
- 1767US2022267904A1Methods for forming impurity free metal alloy filmsAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1866US11997849B2V-NAND stacks with dipole regionsAPPLIED MATERIALS INC·Filed 2021·Granted May 28, 2024·0 cites·19 claims
- 1966US11908914B2Methods of forming semiconductor structuresAPPLIED MATERIALS INC·Filed 2021·Granted Feb 20, 2024·0 cites·16 claims
- 2066US11552177B2PMOS high-K metal gatesAPPLIED MATERIALS INC·Filed 2020·Granted Jan 10, 2023·0 cites·7 claims
- 2162US12183798B2Threshold voltage modulation for gate-all-around FET architectureAPPLIED MATERIALS INC·Filed 2021·Granted Dec 31, 2024·0 cites·20 claims
- 2262US11476267B2Liner for V-NAND word line stackAPPLIED MATERIALS INC·Filed 2020·Granted Oct 18, 2022·0 cites·8 claims
- 2359US12114488B2Enhancing gapfill performance of dram word lineAPPLIED MATERIALS INC·Filed 2021·Granted Oct 8, 2024·0 cites·13 claims
- 2459US11488830B2Oxygen free deposition of platinum group metal filmsAPPLIED MATERIALS INC·Filed 2019·Granted Nov 1, 2022·0 cites·14 claims
- 2558US12230688B2MOSFET gate engineerinng with dipole filmsAPPLIED MATERIALS INC·Filed 2022·Granted Feb 18, 2025·0 cites·10 claims
- 2658US12104243B2Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2021·Granted Oct 1, 2024·0 cites·20 claims
- 2757US12438044B2Methods and apparatus for seam reduction or eliminationAPPLIED MATERIALS INC·Filed 2021·Granted Oct 7, 2025·0 cites·3 claims
- 2857US11869806B2Methods of forming molybdenum contactsAPPLIED MATERIALS INC·Filed 2021·Granted Jan 9, 2024·0 cites·16 claims
- 2955US12100595B2Amorphous silicon-based scavenging and sealing EOTAPPLIED MATERIALS INC·Filed 2021·Granted Sep 24, 2024·0 cites·19 claims
- 3055US11171047B2Fluorine-doped nitride films for improved high-k reliabilityAPPLIED MATERIALS INC·Filed 2020·Granted Nov 9, 2021·0 cites·18 claims
- 3154US11776980B2Methods for reflector film growthAPPLIED MATERIALS INC·Filed 2020·Granted Oct 3, 2023·0 cites·17 claims
- 3252US10991586B2In-situ tungsten deposition without barrier layerAPPLIED MATERIALS INC·Filed 2020·Granted Apr 27, 2021·0 cites·20 claims
- 3349US10559578B2Deposition of cobalt films with high deposition rateAPPLIED MATERIALS INC·Filed 2018·Granted Feb 11, 2020·0 cites·20 claims
- 3449US2022165852A1Methods and apparatus for metal fill in metal gate stackAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 3546US11101128B1Methods for gapfill in substratesAPPLIED MATERIALS INC·Filed 2020·Granted Aug 24, 2021·0 cites·20 claims
- 3646US2021134972A1PMOS High-K Metal GatesAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 3744US11421318B2Methods and apparatus for high reflectivity aluminum layersAPPLIED MATERIALS INC·Filed 2019·Granted Aug 23, 2022·0 cites·15 claims
- 3840US2018340255A1Cobalt Oxide Film DepositionAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →