Inventor · disambiguated record
Jeroen Jonkers
Also filed as: JONKERS JEROEN
24 granted patents·7 pending applications·351 citations·filing 2001–2024
95Inventor score
Files withASML NETHERLANDS BV10KONINKL PHILIPS ELECTRONICS NV9II VI DELAWARE INC5JONKERS JEROEN2FRAUNHOFER GES FORSCHUNG1
Top patents by PatentIndex Score
31 records- 0197US6576912B2Lithographic projection apparatus equipped with extreme ultraviolet window serving simultaneously as vacuum windowFiled 2001·Granted Jun 10, 2003·128 cites·23 claims
- 0291US6683936B2EUV-transparent interface structureKONINKL PHILIPS ELECTRONICS NV·Filed 2002·Granted Jan 27, 2004·51 cites·14 claims
- 0389US7088424B2Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Aug 8, 2006·18 cites·20 claims
- 0488US6859259B2Lithographic projection apparatus and reflector assembly for use thereinASML NETHERLANDS BV·Filed 2003·Granted Feb 22, 2005·29 cites·23 claims
- 0582US7427766B2Method and apparatus for producing extreme ultraviolet radiation or soft X-ray radiationKONINKL PHILIPS ELECTRONICS NV·Filed 2004·Granted Sep 23, 2008·31 cites·26 claims
- 0680US8173975B2Method and device for removing particles generated by means of a radiation source during generation of short-wave radiationJONKERS JEROEN·Filed 2005·Granted May 8, 2012·6 cites·20 claims
- 0780US7315346B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Jan 1, 2008·27 cites·20 claims
- 0879US7026629B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2002·Granted Apr 11, 2006·22 cites·20 claims
- 0971US7852460B2Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Dec 14, 2010·4 cites·9 claims
- 1068US2025353105A1Beam shaping for cuttingII VI DELAWARE INC·Filed 2024·Application pending·0 cites
- 1165US2024420306A1Method for selection of camera image sectionsII VI DELAWARE INC·Filed 2024·Application pending·0 cites
- 1261US8633572B2Low ohmic through substrate interconnection for semiconductor carriersVOGTMEIER GEREON·Filed 2007·Granted Jan 21, 2014·2 cites·22 claims
- 1360US7897948B2EUV plasma discharge lamp with conveyor belt electrodesKONINKL PHILIPS ELECTRONICS NV·Filed 2007·Granted Mar 1, 2011·6 cites·15 claims
- 1459US2023241716A1Cross-jet nozzle for laser processing headII VI DELAWARE INC·Filed 2023·Application pending·0 cites
- 1558US8253123B2Method and device for generating EUV radiation or soft X-rays with enhanced efficiencyJONKERS JEROEN·Filed 2009·Granted Aug 28, 2012·6 cites·15 claims
- 1658US6987275B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Jan 17, 2006·6 cites·24 claims
- 1756US7397190B2Gas discharge lamp for extreme UV radiationKONINKL PHILIPS ELECTRONICS NV·Filed 2003·Granted Jul 8, 2008·5 cites·13 claims
- 1854US2024429670A1Cooling For Galvo Mirrors In Laser Material ProcessingII VI DELAWARE INC·Filed 2023·Application pending·0 cites
- 1951US7170586B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Jan 30, 2007·0 cites·21 claims
- 2049US8040030B2Method of increasing the conversion efficiency of an EUV and/or soft X-ray lamp and a corresponding apparatusKONINKL PHILIPS ELECTRONICS NV·Filed 2007·Granted Oct 18, 2011·2 cites·17 claims
- 2149US7518300B2Method and device for the generation of a plasma through electric discharge in a discharge spaceKONINKL PHILIPS ELECTRONICS NV·Filed 2004·Granted Apr 14, 2009·5 cites·19 claims
- 2248US7671965B2Lithographic projection apparatus, device manufacturing method and device manufactured therebyASML NETHERLANDS BV·Filed 2001·Granted Mar 2, 2010·2 cites·24 claims
- 2346US6714279B2Lithographic projection apparatus, device manufacturing method and device manufactured therebyASML NETHERLANDS BV·Filed 2001·Granted Mar 30, 2004·1 cites·15 claims
- 2445US12083619B2Method for selection of camera image sectionsII VI DELAWARE INC·Filed 2019·Granted Sep 10, 2024·0 cites·20 claims
- 2544US7030963B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Apr 18, 2006·0 cites·13 claims
- 2642US8749178B2Electrode system, in particular for gas discharge light sourcesMETZMACHER CHRISTOF·Filed 2010·Granted Jun 10, 2014·0 cites·11 claims
- 2739US2014374625A1Euv discharge lamp with moving protective componentFRAUNHOFER GES FORSCHUNG·Filed 2014·Application pending·0 cites
- 2836US2006245044A1Filter for retaining a substance originating from a radiation source and method for the manufacture of the sameKONINKL PHILIPS ELECTRONICS NV·Filed 2004·Application pending·0 cites
- 2935US7688948B2Method and apparatus for generating radiation in the wavelength range from about 1 nm to about 30 nm, and use in a lithography device or in metrologyKONINKL PHILIPS ELECTRONICS NV·Filed 2005·Granted Mar 30, 2010·0 cites·26 claims
- 3035US2008203325A1Method of Protecting a Radiation Source Producing Euv-Radiation and/or Soft X-Rays Against Short CircuitsKONINKL PHILIPS ELECTRONICS NV·Filed 2006·Application pending·0 cites
- 3131US9414476B2Method and device for generating optical radiation by means of electrically operated pulsed dischargesPRUEMMER RALF·Filed 2012·Granted Aug 9, 2016·0 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →