Inventor · disambiguated record
Jean-Louis Stehle
Also filed as: STEHLE JEAN-LOUIS
9 granted patents·2 pending applications·1,284 citations·filing 1993–2006
91Inventor score
Files withPRODUCTION ET DE RECH S APPLIQ4KLA TENCOR CORP1KLA TENCOR TECH CORP1SOC D PRODUCTION ET DE RECH AP1SOPRA SOCIETE DE PRODUCTION ET1
Top patents by PatentIndex Score
11 records- 0195US5910842AFocused beam spectroscopic ellipsometry method and systemKLA TENCOR CORP·Filed 1996·Granted Jun 8, 1999·196 cites·18 claims
- 0295US5608526AFocused beam spectroscopic ellipsometry method and systemTENCOR INSTRUMENTS·Filed 1995·Granted Mar 4, 1997·745 cites·72 claims
- 0391US5329357ASpectroscopic ellipsometry apparatus including an optical fiberSOPRA SOCIETE DE PRODUCTION ET·Filed 1993·Granted Jul 12, 1994·176 cites·15 claims
- 0490US6734967B1Focused beam spectroscopic ellipsometry method and systemKLA TENCOR TECH CORP·Filed 1999·Granted May 11, 2004·136 cites·32 claims
- 0574US7763394B2Protected pattern mask for reflection lithography in the extreme UV or soft X-ray rangePRODUCTION ET DE RECH S APPLIQ·Filed 2005·Granted Jul 27, 2010·4 cites·17 claims
- 0666US6687002B2Method and apparatus for ellipsometric metrology for a sample contained in a chamber or the likePRODUCTION ET DE RECH S APPLIQ·Filed 2001·Granted Feb 3, 2004·13 cites·18 claims
- 0750US2005105090A1Focused beam spectroscopic ellipsometry method and systemFiled 2004·Application pending·0 cites
- 0849US2004100632A1Focused beam spectroscopic ellipsometry method and systemFiled 2003·Application pending·0 cites
- 0942US5991037AHigh spatial resolution ellipsometry deviceSOC D PRODUCTION ET DE RECH AP·Filed 1996·Granted Nov 23, 1999·12 cites·18 claims
- 1041US7714992B2Equipment and method for monitoring an immersion lithography devicePRODUCTION ET DE RECH S APPLIQ·Filed 2006·Granted May 11, 2010·0 cites·19 claims
- 1141US7230701B2Compact spectroscopic ellipsometerPRODUCTION ET DE RECH S APPLIQ·Filed 2001·Granted Jun 12, 2007·2 cites·28 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →