Inventor · disambiguated record
Jeremy Tucker
Also filed as: TUCKER JEREMY · TUCKER JEREMY A
9 granted patents·3 pending applications·92 citations·filing 2013–2019
86Inventor score
Top patents by PatentIndex Score
12 records- 0195US10619245B2Hollow cathode discharge (HCD) suppressing capacitively coupled plasma electrode and gas distribution faceplateLAM RES CORP·Filed 2018·Granted Apr 14, 2020·25 cites·25 claims
- 0295US10217614B2Ceramic gas distribution plate with embedded electrodeLAM RES CORP·Filed 2015·Granted Feb 26, 2019·32 cites·18 claims
- 0393US9490149B2Chemical deposition apparatus having conductance controlLAM RES CORP·Filed 2013·Granted Nov 8, 2016·18 cites·31 claims
- 0489US10077497B2Hollow cathode discharge (HCD) suppressing capacitively coupled plasma electrode and gas distribution faceplateLAM RES CORP·Filed 2015·Granted Sep 18, 2018·6 cites·31 claims
- 0586US10442721B1Microgravity-based method and system for fabricating optical fibersTUCKER DENNIS S·Filed 2019·Granted Oct 15, 2019·9 cites·24 claims
- 0674US10781516B2Chemical deposition chamber having gas sealLAM RES CORP·Filed 2016·Granted Sep 22, 2020·2 cites·14 claims
- 0754US10808317B2Deposition apparatus including an isothermal processing zoneLAM RES CORP·Filed 2013·Granted Oct 20, 2020·0 cites·16 claims
- 0854US2013316094A1Rf-powered, temperature-controlled gas diffuserNOVELLUS SYSTEMS INC·Filed 2013·Application pending·0 cites
- 0951US9875883B2Metrology methods to detect plasma in wafer cavity and use of the metrology for station-to-station and tool-to-tool matchingLAM RES CORP·Filed 2017·Granted Jan 23, 2018·0 cites·18 claims
- 1048US9754769B2Metrology methods to detect plasma in wafer cavity and use of the metrology for station-to-station and tool-to-tool matchingLAM RES CORP·Filed 2015·Granted Sep 5, 2017·0 cites·18 claims
- 1145US2017009348A1Chemical Deposition Apparatus Having Conductance ControlLAM RES CORP·Filed 2016·Application pending·0 cites
- 1236US2019032211A1Monolithic ceramic gas distribution plateLAM RES CORP·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →