Inventor · disambiguated record
Jianheng Li
Also filed as: LI JIANHENG
28 granted patents·11 pending applications·444 citations·filing 2013–2025
95Inventor score
Files withVERSUM MAT US LLC22APPLIED MATERIALS INC8AIR PROD & CHEM6HEFEI ADCHEM SEMI TECH CO LTD1TECHNO FUJIAN FOOD INGREDIENTS CO LTD1
Top patents by PatentIndex Score
39 records- 0198US10468244B2Precursors and flowable CVD methods for making low-K films to fill surface featuresVERSUM MAT US LLC·Filed 2017·Granted Nov 5, 2019·388 cites·9 claims
- 0297US9243324B2Methods of forming non-oxygen containing silicon-based filmsAIR PROD & CHEM·Filed 2013·Granted Jan 26, 2016·17 cites·22 claims
- 0394US10421766B2Bisaminoalkoxysilane compounds and methods for using same to deposit silicon-containing filmsAIR PROD & CHEM·Filed 2016·Granted Sep 24, 2019·5 cites·13 claims
- 0492US10145008B2Compositions and methods using same for carbon doped silicon containing filmsVERSUM MAT US LLC·Filed 2016·Granted Dec 4, 2018·8 cites·20 claims
- 0591US9922818B2Alkyl-alkoxysilacyclic compoundsAIR PROD & CHEM·Filed 2015·Granted Mar 20, 2018·8 cites·31 claims
- 0688US10354860B2Method and precursors for manufacturing 3D devicesAIR PROD & CHEM·Filed 2015·Granted Jul 16, 2019·5 cites·34 claims
- 0786US2025188605A1Compositions and Methods Using Same for Deposition of Silicon-Containing FilmVERSUM MAT US LLC·Filed 2024·Application pending·0 cites
- 0885US10106890B2Compositions and methods using same for deposition of silicon-containing filmVERSUM MAT US LLC·Filed 2015·Granted Oct 23, 2018·3 cites·9 claims
- 0982US12021152B2Process to reduce plasma induced damageAPPLIED MATERIALS INC·Filed 2023·Granted Jun 25, 2024·0 cites·20 claims
- 1082US10319862B2Barrier materials for display devicesAIR PROD & CHEM·Filed 2013·Granted Jun 11, 2019·6 cites·10 claims
- 1180US11268190B2Processes for depositing silicon-containing films using halidosilane compoundsVERSUM MAT US LLC·Filed 2016·Granted Mar 8, 2022·2 cites·10 claims
- 1279US10395920B2Alkyl-alkoxysilacyclic compoundsVERSUM MAT US LLC·Filed 2018·Granted Aug 27, 2019·2 cites·14 claims
- 1378US11670722B2Process to reduce plasma induced damageAPPLIED MATERIALS INC·Filed 2022·Granted Jun 6, 2023·0 cites·20 claims
- 1476US2024191346A1Halidosilane compounds and compositions and processes for depositing silicon-containing films using sameVERSUM MAT US LLC·Filed 2024·Application pending·0 cites
- 1574US12505999B2Precursors and flowable CVD methods for making low-K films to fill surface featuresVERSUM MAT US LLC·Filed 2022·Granted Dec 23, 2025·0 cites·9 claims
- 1674US11913112B2Processes for depositing silicon-containing films using halidosilane compounds and compositionsVERSUM MAT US LLC·Filed 2022·Granted Feb 27, 2024·0 cites·5 claims
- 1772US11142658B2Bisaminoalkoxysilane compounds and methods for using same to deposit silicon-containing filmsVERSUM MAT US LLC·Filed 2019·Granted Oct 12, 2021·0 cites·5 claims
- 1871US11380801B2Process to reduce plasma induced damageAPPLIED MATERIALS INC·Filed 2020·Granted Jul 5, 2022·0 cites·12 claims
- 1969US2024392434A1Compositions and methods using same for deposition of silicon-containing filmVERSUM MAT US LLC·Filed 2024·Application pending·0 cites
- 2065US11270880B2Precursors and flowable CVD methods for making low-k films to fill surface featuresVERSUM MAT US LLC·Filed 2019·Granted Mar 8, 2022·0 cites·6 claims
- 2164US11732351B2Methods for depositing a conformal metal or metalloid silicon nitride film and resultant filmsVERSUM MAT US LLC·Filed 2021·Granted Aug 22, 2023·0 cites·20 claims
- 2262US10804408B2Process to reduce plasma induced damageAPPLIED MATERIALS INC·Filed 2018·Granted Oct 13, 2020·0 cites·13 claims
- 2362US2025022653A1Magnetic material preparation apparatus, magnetic material and preparation method thereof, and preparation method for neodymium-iron-boron materialUNIV HANGZHOU DIANZI·Filed 2024·Application pending·0 cites
- 2462US2025283219A1Methods of depositing silicon nitrideAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 2560US2021043446A1Precursors and Flowable CVD Methods for Making Low-K Films to Fill Surface FeaturesVERSUM MAT US LLC·Filed 2020·Application pending·0 cites
- 2659US12454753B2Compositions and methods using same for deposition of silicon-containing filmVERSUM MAT US LLC·Filed 2020·Granted Oct 28, 2025·0 cites·7 claims
- 2758US2014308422A1Liquid composite high-intensity sweetener and preparation method thereofTECHNO FUJIAN FOOD INGREDIENTS CO LTD·Filed 2014·Application pending·0 cites
- 2857US10985013B2Method and precursors for manufacturing 3D devicesVERSUM MAT US LLC·Filed 2019·Granted Apr 20, 2021·0 cites·32 claims
- 2957US10923327B2Chamber linerAPPLIED MATERIALS INC·Filed 2018·Granted Feb 16, 2021·0 cites·20 claims
- 3055US11017998B2Precursors and flowable CVD methods for making low-K films to fill surface featuresVERSUM MAT US LLC·Filed 2018·Granted May 25, 2021·0 cites·9 claims
- 3152US10748759B2Methods for improved silicon nitride passivation filmsAPPLIED MATERIALS INC·Filed 2019·Granted Aug 18, 2020·0 cites·13 claims
- 3252US2018277360A1Method and Composition for Providing Pore Sealing Layer on Porous Low Dielectric Constant FilmsVERSUM MAT US LLC·Filed 2018·Application pending·0 cites
- 3350US11104990B2Methods for depositing a conformal metal or metalloid silicon nitride film and resultant filmsVERSUM MAT US LLC·Filed 2016·Granted Aug 31, 2021·0 cites·13 claims
- 3449US12398463B1Organic small molecule inhibitors and application method thereof in thin film depositionHEFEI ADCHEM SEMI TECH CO LTD·Filed 2025·Granted Aug 26, 2025·0 cites·2 claims
- 3547US2019292658A1Compositions and methods using same for deposition of silicon-containing filmVERSUM MAT US LLC·Filed 2016·Application pending·0 cites
- 3646US12312684B2Siloxane compositions and methods for using the compositions to deposit silicon containing filmsVERSUM MAT US LLC·Filed 2019·Granted May 27, 2025·0 cites·10 claims
- 3746US2016049293A1Method and composition for providing pore sealing layer on porous low dielectric constant filmsAIR PROD & CHEM·Filed 2015·Application pending·0 cites
- 3840US12428722B2Compositions and methods using same for deposition of silicon-containing filmVERSUM MAT US LLC·Filed 2017·Granted Sep 30, 2025·0 cites·15 claims
- 3939US2020098549A1Heat conductive spacer for plasma processing chamberAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →