Inventor · disambiguated record
Jian Li
Also filed as: LI JIAN · LI JIAN-REN
27 granted patents·28 pending applications·120 citations·filing 1996–2025
94Inventor score
Files withAPPLIED MATERIALS INC47BEVAN MALCOLM J2TALLAVARJULA SAIRAJU2BOE TECHNOLOGY GROUP CO LTD1LI JIAN1
Top patents by PatentIndex Score
55 records- 0192US11587817B2High temperature bipolar electrostatic chuckAPPLIED MATERIALS INC·Filed 2020·Granted Feb 21, 2023·2 cites·20 claims
- 0289US11501993B2Semiconductor substrate supports with improved high temperature chuckingAPPLIED MATERIALS INC·Filed 2020·Granted Nov 15, 2022·2 cites·20 claims
- 0388US8101906B2Method and apparatus for calibrating optical path degradation useful for decoupled plasma nitridation chambersTALLAVARJULA SAIRAJU·Filed 2008·Granted Jan 24, 2012·14 cites·11 claims
- 0487US11981998B2Systems and methods for substrate support temperature controlAPPLIED MATERIALS INC·Filed 2020·Granted May 14, 2024·1 cites·12 claims
- 0585US12421607B2Systems and methods for substrate support temperature controlAPPLIED MATERIALS INC·Filed 2024·Granted Sep 23, 2025·0 cites·15 claims
- 0685US12057339B2Bipolar electrostatic chuck to limit DC dischargeAPPLIED MATERIALS INC·Filed 2020·Granted Aug 6, 2024·1 cites·7 claims
- 0785US11594440B2Real time bias detection and correction for electrostatic chuckAPPLIED MATERIALS INC·Filed 2020·Granted Feb 28, 2023·1 cites·13 claims
- 0885US11584994B2Pedestal for substrate processing chambersAPPLIED MATERIALS INC·Filed 2019·Granted Feb 21, 2023·1 cites·21 claims
- 0984US8481433B2Methods and apparatus for forming nitrogen-containing layersBEVAN MALCOLM J·Filed 2010·Granted Jul 9, 2013·6 cites·21 claims
- 1082US5655249AToothbrush with concave brushing surfaceFiled 1996·Granted Aug 12, 1997·81 cites·13 claims
- 1180US12131934B2Semiconductor substrate support leveling apparatusAPPLIED MATERIALS INC·Filed 2020·Granted Oct 29, 2024·1 cites·7 claims
- 1280US12000048B2Pedestal for substrate processing chambersAPPLIED MATERIALS INC·Filed 2023·Granted Jun 4, 2024·0 cites·20 claims
- 1379US11699602B2Substrate support assemblies and componentsAPPLIED MATERIALS INC·Filed 2020·Granted Jul 11, 2023·1 cites·5 claims
- 1478US11133212B2High temperature electrostatic chuckAPPLIED MATERIALS INC·Filed 2019·Granted Sep 28, 2021·2 cites·15 claims
- 1576US2025014934A1Bipolar electrostatic chuck to limit dc dischargeAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1675US11901209B2High temperature bipolar electrostatic chuckAPPLIED MATERIALS INC·Filed 2023·Granted Feb 13, 2024·0 cites·12 claims
- 1775US8546273B2Methods and apparatus for forming nitrogen-containing layersBEVAN MALCOLM J·Filed 2011·Granted Oct 1, 2013·3 cites·19 claims
- 1874US12080584B2Real time bias detection and correction for electrostatic chuckAPPLIED MATERIALS INC·Filed 2023·Granted Sep 3, 2024·0 cites·19 claims
- 1974US10892147B2Method and apparatus for calibrating optical path degradation useful for decoupled plasma nitridation chambersAPPLIED MATERIALS INC·Filed 2018·Granted Jan 12, 2021·1 cites·6 claims
- 2072US2025054797A1Semiconductor substrate support leveling apparatusAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2171US9865438B2Method and apparatus for calibrating optical path degradation useful for decoupled plasma nitridation chambersTALLAVARJULA SAIRAJU·Filed 2011·Granted Jan 9, 2018·2 cites·8 claims
- 2267US11499229B2Substrate supports including metal-ceramic interfacesAPPLIED MATERIALS INC·Filed 2019·Granted Nov 15, 2022·1 cites·20 claims
- 2366US2025283205A1Manufacturing of mesas using deposited layer for substrate supportsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2466US2022181120A1Semiconductor processing apparatus for high rf power processAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 2566US2025361614A1Increased life substrate support assemblyAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2665US12476092B2AFE (active far edge) heater/bipolar ESC with simplified and optimized structure for greater reliability, lower cost and better manufacturabilityAPPLIED MATERIALS INC·Filed 2023·Granted Nov 18, 2025·0 cites·14 claims
- 2762US2025379077A1Substrate supports including measurement assemblies, and related apparatus, methods, and processing chambersAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2861US2025391700A1Hybrid vacuum electrostatic chuckAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2961US2025308967A1Chucking sensor using floating esc power suppliesAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3061US2025273506A1Substrate support with sensorAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3160US2025391694A1Substrate supportAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3260US2025118578A1Pedestal heater with substrate temperature measurement systemAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3360US2025372432A1Substrate heater having reduced surface roughnessAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 3459US2025285902A1Arc current reduction from an electrostatic chuckAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3559US2025201538A1Esc design with enhanced tunability for wafer far edge plasma profile controlAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3658US2025389022A1Heater materials to prevent arcingAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3758US2025316520A1Bipolar esc to prevent substrate backside dischargingAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3857US2024312770A1Apparatus and methods for controlling substrate temperature during processingAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3957US2025116001A1Arc reduction and rf control for electrostatic chucks in semiconductor processingAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4056US2025331068A1Heater with external outer zone thermocouple channel through heater shaftAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 4156US2020013586A1Semiconductor processing apparatus for high rf power processAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 4255US12300474B2Semiconductor substrate support power transmission componentsAPPLIED MATERIALS INC·Filed 2020·Granted May 13, 2025·0 cites·16 claims
- 4355US2024249924A1Bipolar electrostatic chuck electrode designsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4453US12094748B2Bipolar esc with balanced RF impedanceAPPLIED MATERIALS INC·Filed 2021·Granted Sep 17, 2024·0 cites·19 claims
- 4553US12040210B2Multi-pressure bipolar electrostatic chuckingAPPLIED MATERIALS INC·Filed 2020·Granted Jul 16, 2024·0 cites·20 claims
- 4652US2025299993A1Method and apparatus for securing a substrateAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 4751US11851758B2Fabrication of a high temperature showerheadAPPLIED MATERIALS INC·Filed 2021·Granted Dec 26, 2023·0 cites·11 claims
- 4850US11830706B2Heated pedestal design for improved heat transfer and temperature uniformityAPPLIED MATERIALS INC·Filed 2019·Granted Nov 28, 2023·0 cites·19 claims
- 4950US2023011261A1Multi-zone heater with minimum rf lossAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 5048USD1103515SWasherLI JIAN·Filed 2024·Granted Nov 25, 2025·0 cites·1 claims
Showing the top 50 of 55 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →