Inventor · disambiguated record
Jiang Lu
Also filed as: LU JIANG
31 granted patents·36 pending applications·72 citations·filing 2004–2025
95Inventor score
Top patents by PatentIndex Score
67 records- 0189US9209074B2Cobalt deposition on barrier surfacesAPPLIED MATERIALS INC·Filed 2015·Granted Dec 8, 2015·5 cites·20 claims
- 0287US10043709B2Methods for thermally forming a selective cobalt layerAPPLIED MATERIALS INC·Filed 2015·Granted Aug 7, 2018·5 cites·19 claims
- 0386US9418890B2Method for tuning a deposition rate during an atomic layer deposition processMA PAUL·Filed 2014·Granted Aug 16, 2016·8 cites·25 claims
- 0486US8725283B2Generalized kinematics systemGRAY PAUL J·Filed 2007·Granted May 13, 2014·19 cites·16 claims
- 0584US9051641B2Cobalt deposition on barrier surfacesLU JIANG·Filed 2008·Granted Jun 9, 2015·8 cites·25 claims
- 0680US10752990B2Apparatus and methods to remove residual precursor inside gas lines post-depositionAPPLIED MATERIALS INC·Filed 2017·Granted Aug 25, 2020·1 cites·16 claims
- 0778US10049101B2Method and system for processing semantic fragmentsIBM·Filed 2015·Granted Aug 14, 2018·3 cites·20 claims
- 0875US10600685B2Methods to fill high aspect ratio features on semiconductor substrates with MOCVD cobalt filmAPPLIED MATERIALS INC·Filed 2017·Granted Mar 24, 2020·2 cites·20 claims
- 0973US10665542B2Cobalt manganese vapor phase depositionAPPLIED MATERIALS INC·Filed 2018·Granted May 26, 2020·0 cites·20 claims
- 1070US10453657B2Apparatus for depositing metal films with plasma treatmentAPPLIED MATERIALS INC·Filed 2017·Granted Oct 22, 2019·0 cites·16 claims
- 1170US10106081B2Laser guided parking assistance deviceLU JIANG·Filed 2016·Granted Oct 23, 2018·3 cites·12 claims
- 1268US10700525B2Method and apparatus for controlling hybrid direct-current transmission systemNR ELECTRIC CO LTD·Filed 2017·Granted Jun 30, 2020·1 cites·10 claims
- 1368US2023343645A1Gradient oxidation and etch of pvd molybdenum for bottom up gap fillAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1466US10365955B2Resource allocation in cloud environmentIBM·Filed 2014·Granted Jul 30, 2019·3 cites·2 claims
- 1565US11133155B2Apparatus for depositing metal films with plasma treatmentAPPLIED MATERIALS INC·Filed 2019·Granted Sep 28, 2021·0 cites·12 claims
- 1665US2023343643A1Gradient oxidation and etch for pvd metal as bottom liner in bottom up gap fillAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1765US2025372449A1Methods for forming low resistivity contactsAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 1865US2025372448A1Methods for forming low resistivity contactsAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 1965US2025372450A1Methods for forming low resistivity contactsAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 2064US7290723B1Aerosol splitter for ELSDLU JIANG·Filed 2004·Granted Nov 6, 2007·10 cites·4 claims
- 2164US2025376762A1Cyclic plasma and thermal process to improve pecvd ti silicide deposition selectivityAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 2263USD1071886SSubstrate support for a substrate processing chamberAPPLIED MATERIALS INC·Filed 2022·Granted Apr 22, 2025·3 cites·1 claims
- 2363US10797487B2On-line input control method, on-line input and quit device for voltage-source converter unitNR ELECTRIC CO LTD·Filed 2017·Granted Oct 6, 2020·1 cites·7 claims
- 2463US9953926B2Methods of depositing cobalt manganese filmsAPPLIED MATERIALS INC·Filed 2015·Granted Apr 24, 2018·0 cites·9 claims
- 2561US2025379031A1Tuning deposition selectivityAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 2660US2025379059A1Method of bottom reaction efficiency modulation for ald and aleAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 2760US2025006552A1Bottom-up gap fill processes for semiconductor substratesAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2859US10640870B2Gas feedthrough assemblyAPPLIED MATERIALS INC·Filed 2017·Granted May 5, 2020·0 cites·20 claims
- 2958US12272551B2Selective metal removal with flowable polymerAPPLIED MATERIALS INC·Filed 2022·Granted Apr 8, 2025·0 cites·23 claims
- 3057US2025157824A1Selective metal Capping with Metal Halide enhancementAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3156US2025125195A1Oligomer film for bottom-up gap fill processesAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3256US2024153790A1Process chamber with pressure charging and pulsing capabilityAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3355US2024371654A1Silicon nitride damage-free dry etch method for tungsten removal in middle of line bottom-up tungsten integrationAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3454US2024363407A1Low-energy underlayer for room temperature physical vapor deposition of electrically conductive featuresAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3553US10476261B2Method and system for fault positioning and recovery of voltage source converterNR ELECTRIC CO LTD·Filed 2017·Granted Nov 12, 2019·0 cites·46 claims
- 3653US2025112091A1Surface treatment enabling super-conformal metal cap profile on middle of-line (mol) silicidesAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3753US2023420295A1Treatment of tungsten surface for tungsten gap-fillAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3852US2010062149A1Method for tuning a deposition rate during an atomic layer deposition processAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 3952US2025174456A1Thermal cvd of titanium silicide methods to form semiconductor structuresAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4051US2018246881A1Method and system for processing semantic fragmentsIBM·Filed 2018·Application pending·0 cites
- 4151US2025054767A1Selective metal capping processes for a junction silicideAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 4251US2022322907A1Dust box and cleaning deviceANKER INNOVATIONS TECH CO LTD·Filed 2022·Application pending·0 cites
- 4351US2024379363A1Methods for forming low resistivity contactsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 4450US2025054812A1Selective bottom-up metal fill/cap on junction silicide by selective metal removalAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4550US2023069071A1Cleaning Device and Dust BoxANKER INNOVATIONS TECH CO LTD·Filed 2022·Application pending·0 cites
- 4650US2025079239A1Selective capping for gate-all-around field effect transistorsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4749US10559578B2Deposition of cobalt films with high deposition rateAPPLIED MATERIALS INC·Filed 2018·Granted Feb 11, 2020·0 cites·20 claims
- 4849US10326275B2Method for controlling zero sequence voltage of voltage source converterNR ELECTRIC CO LTD·Filed 2017·Granted Jun 18, 2019·0 cites·7 claims
- 4949US9460932B2Surface poisoning using ALD for high selectivity deposition of high aspect ratio featuresAPPLIED MATERIALS INC·Filed 2014·Granted Oct 4, 2016·0 cites·19 claims
- 5048US10396562B2Series compensation device applicable to double-circuit lineNR ELECTRIC CO LTD·Filed 2017·Granted Aug 27, 2019·0 cites·9 claims
Showing the top 50 of 67 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →