Inventor · disambiguated record
Jiri Pecen
Also filed as: PECEN JIRI
11 granted patents·1,079 citations·filing 1983–2000
94Inventor score
Top patents by PatentIndex Score
11 records- 0197US6068539AWafer polishing device with movable windowLAM RES CORP·Filed 1998·Granted May 30, 2000·200 cites·35 claims
- 0296US6254459B1Wafer polishing device with movable windowLAM RES CORP·Filed 1999·Granted Jul 3, 2001·143 cites·20 claims
- 0393US6111634AMethod and apparatus for in-situ monitoring of thickness using a multi-wavelength spectrometer during chemical-mechanical polishingLAM RES CORP·Filed 1997·Granted Aug 29, 2000·155 cites·21 claims
- 0493US4766324AParticle detection method including comparison between sequential scansTENCOR INSTRUMENTS·Filed 1987·Granted Aug 23, 1988·138 cites·19 claims
- 0593US4641967AParticle position correlator and correlation method for a surface scannerTENCOR INSTRUMENTS·Filed 1985·Granted Feb 10, 1987·115 cites·13 claims
- 0691US6621584B2Method and apparatus for in-situ monitoring of thickness during chemical-mechanical polishingLAM RES CORP·Filed 2000·Granted Sep 16, 2003·36 cites·22 claims
- 0791US6146248AMethod and apparatus for in-situ end-point detection and optimization of a chemical-mechanical polishing process using a linear polisherLAM RES CORP·Filed 1997·Granted Nov 14, 2000·114 cites·37 claims
- 0891US6108091AMethod and apparatus for in-situ monitoring of thickness during chemical-mechanical polishingLAM RES CORP·Filed 1997·Granted Aug 22, 2000·86 cites·27 claims
- 0988US6261155B1Method and apparatus for in-situ end-point detection and optimization of a chemical-mechanical polishing process using a linear polisherLAM RES CORP·Filed 2000·Granted Jul 17, 2001·42 cites·20 claims
- 1070US4512659AApparatus for calibrating a surface scannerTENCOR INSTRUMENTS·Filed 1983·Granted Apr 23, 1985·25 cites·6 claims
- 1162US5083035APosition location in surface scanning using interval timing between scan marks on test wafersTENCOR INSTRUMENTS·Filed 1990·Granted Jan 21, 1992·25 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →