Inventor · disambiguated record
Jianping Zhao
Also filed as: ZHAO JIANPING
67 granted patents·28 pending applications·479 citations·filing 2009–2024
98Inventor score
Files withTOKYO ELECTRON LTD51HUAWEI TECH CO LTD17ZHAO JIANPING8CHEN LEE4BEIJING SINOGENE BIOTECHNOLOGY CO LTD3
Top patents by PatentIndex Score
95 records- 0198US10991554B2Plasma processing system with synchronized signal modulationTOKYO ELECTRON LTD·Filed 2018·Granted Apr 27, 2021·49 cites·20 claims
- 0298US8415884B2Stable surface wave plasma sourceCHEN LEE·Filed 2009·Granted Apr 9, 2013·240 cites·20 claims
- 0397US9209032B2Electric pressure systems for control of plasma properties and uniformityTOKYO ELECTRON LTD·Filed 2014·Granted Dec 8, 2015·42 cites·10 claims
- 0495US11430643B2Quantification of processing chamber species by electron energy sweepTOKYO ELECTRON LTD·Filed 2020·Granted Aug 30, 2022·7 cites·20 claims
- 0595US11348761B2Impedance matching apparatus and control methodTOKYO ELECTRON LTD·Filed 2020·Granted May 31, 2022·4 cites·6 claims
- 0692US11295937B2Broadband plasma processing systems and methodsTOKYO ELECTRON LTD·Filed 2019·Granted Apr 5, 2022·7 cites·20 claims
- 0792US8883024B2Using vacuum ultra-violet (VUV) data in radio frequency (RF) sourcesCHEN LEE·Filed 2011·Granted Nov 11, 2014·11 cites·19 claims
- 0891US8877080B2Using vacuum ultra-violet (VUV) data in microwave sourcesCHEN LEE·Filed 2011·Granted Nov 4, 2014·10 cites·17 claims
- 0990US8968588B2Low electron temperature microwave surface-wave plasma (SWP) processing method and apparatusZHAO JIANPING·Filed 2012·Granted Mar 3, 2015·23 cites·13 claims
- 1089US11830709B2Broadband plasma processing systems and methodsTOKYO ELECTRON LTD·Filed 2021·Granted Nov 28, 2023·1 cites·20 claims
- 1189US8816281B2Ion energy analyzer and methods of manufacturing the sameFUNK MERRITT·Filed 2012·Granted Aug 26, 2014·16 cites·20 claims
- 1288US9087677B2Methods of electrical signaling in an ion energy analyzerFUNK MERRITT·Filed 2012·Granted Jul 21, 2015·8 cites·20 claims
- 1387US8847159B2Ion energy analyzerCHEN LEE·Filed 2012·Granted Sep 30, 2014·6 cites·25 claims
- 1485US11605536B2Cyclic low temperature film growth processesTOKYO ELECTRON LTD·Filed 2020·Granted Mar 14, 2023·1 cites·20 claims
- 1585US9396900B2Radio frequency (RF) power coupling system utilizing multiple RF power coupling elements for control of plasma propertiesTOKYO ELECTRON LTD·Filed 2012·Granted Jul 19, 2016·10 cites·18 claims
- 1684US8486798B1Variable capacitance chamber component incorporating a semiconductor junction and methods of manufacturing and using thereofCHEN ZHIYING·Filed 2012·Granted Jul 16, 2013·6 cites·20 claims
- 1783US9431218B2Scalable and uniformity controllable diffusion plasma sourceTOKYO ELECTRON LTD·Filed 2014·Granted Aug 30, 2016·5 cites·15 claims
- 1882US12387910B2Plasma processing with broadband RF waveformsTOKYO ELECTRON LTD·Filed 2024·Granted Aug 12, 2025·0 cites·22 claims
- 1982US11469525B2Antenna system, feeding network reconfiguration method, and apparatusHUAWEI TECH CO LTD·Filed 2020·Granted Oct 11, 2022·2 cites·15 claims
- 2082US11170981B2Broadband plasma processing systems and methodsTOKYO ELECTRON LTD·Filed 2019·Granted Nov 9, 2021·2 cites·20 claims
- 2181US2023399739A1Hard mask deposition using direct current superimposed radio frequency plasmaTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2280US8721833B2Variable capacitance chamber component incorporating ferroelectric materials and methods of manufacturing and using thereofCHEN ZHIYING·Filed 2012·Granted May 13, 2014·4 cites·15 claims
- 2380US8323521B2Plasma generation controlled by gravity-induced gas-diffusion separation (GIGDS) techniquesZHAO JIANPING·Filed 2010·Granted Dec 4, 2012·5 cites·20 claims
- 2480US2025095983A1Cyclic low temperature film growth processesTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2579US12176204B2Cyclic low temperature film growth processesTOKYO ELECTRON LTD·Filed 2023·Granted Dec 24, 2024·0 cites·20 claims
- 2678US11728135B2Electric pressure systems for control of plasma properties and uniformityTOKYO ELECTRON LTD·Filed 2015·Granted Aug 15, 2023·2 cites·19 claims
- 2777US8669705B2Stable surface wave plasma sourceTOKYO ELECTRON LTD·Filed 2013·Granted Mar 11, 2014·3 cites·17 claims
- 2876US11773484B2Hard mask deposition using direct current superimposed radio frequency plasmaTOKYO ELECTRON LTD·Filed 2021·Granted Oct 3, 2023·0 cites·20 claims
- 2973US12020902B2Plasma processing with broadband RF waveformsTOKYO ELECTRON LTD·Filed 2022·Granted Jun 25, 2024·0 cites·20 claims
- 3072US11581653B2Curved conformal frequency selective surface radomeUNIV QUFU NORMAL·Filed 2021·Granted Feb 14, 2023·1 cites·10 claims
- 3171US10069215B2Multi-beam antenna system and phase adjustment method for multi-beam antenna system, and dual-polarized antenna systemHUAWEI TECH CO LTD·Filed 2016·Granted Sep 4, 2018·2 cites·8 claims
- 3268US10354841B2Plasma generation and control using a DC ringTOKYO ELECTRON LTD·Filed 2016·Granted Jul 16, 2019·1 cites·17 claims
- 3368US9941126B2Microwave plasma deviceTOKYO ELECTRON LTD·Filed 2014·Granted Apr 10, 2018·1 cites·14 claims
- 3467US11925889B1Spliceable and foldable filter element deviceZHAO JIANPING·Filed 2023·Granted Mar 12, 2024·0 cites·12 claims
- 3566US12387919B2ALD process with plasma treatmentTOKYO ELECTRON LTD·Filed 2022·Granted Aug 12, 2025·0 cites·14 claims
- 3666US10333220B2Interleaved polarized multi-beam antennaHUAWEI TECH CO LTD·Filed 2017·Granted Jun 25, 2019·2 cites·4 claims
- 3764US10879610B2Antenna apparatus and beam adjustment methodHUAWEI TECH CO LTD·Filed 2019·Granted Dec 29, 2020·1 cites·20 claims
- 3862US2024170256A1VHF Broadband Coaxial AdapterTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 3962US2021249226A1Plasma Processing System with Synchronized Signal ModulationTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 4061US9111727B2Plasma tuning rods in microwave resonator plasma sourcesZHAO JIANPING·Filed 2011·Granted Aug 18, 2015·1 cites·7 claims
- 4161US2025308886A1Gap filling by atomic layer deposition (ald)TOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 4260US12451906B2Radio frequency unit, antenna, and signal processing methodHUAWEI TECH CO LTD·Filed 2023·Granted Oct 21, 2025·0 cites·20 claims
- 4360US12300466B2Plasma enhanced film formation methodTOKYO ELECTRON LTD·Filed 2021·Granted May 13, 2025·0 cites·20 claims
- 4460US10796916B2Microwave plasma deviceTOKYO ELECTRON LTD·Filed 2018·Granted Oct 6, 2020·0 cites·12 claims
- 4559US10424462B2Multi-cell resonator microwave surface-wave plasma apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Sep 24, 2019·1 cites·21 claims
- 4659US9906351B2Method of communication with distributed antenna array system and array systemHUAWEI TECH CO LTD·Filed 2015·Granted Feb 27, 2018·1 cites·20 claims
- 4759US2024418549A1Fluid measurement apparatusBITOBAR TECH CO LTD·Filed 2024·Application pending·0 cites
- 4859US2025308867A1High-performance adaptable sampling systemTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 4959US2025273428A1Plasma adjustment using source-less resonant structureTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 5059US2025364434A1Stress control of high-density carbon hardmask (chm)TOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
Showing the top 50 of 95 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →