Inventor · disambiguated record
Jonghoon Baek
Also filed as: BAEK JONGHOON
24 granted patents·4 pending applications·850 citations·filing 2009–2024
96Inventor score
Files withAPPLIED MATERIALS INC13ASML NETHERLANDS BV7BAEK JONGHOON5SAMSUNG ELECTRONICS CO LTD2KUDELA JOZEF1
Top patents by PatentIndex Score
28 records- 0198US10032606B2Semiconductor processing with DC assisted RF power for improved controlAPPLIED MATERIALS INC·Filed 2016·Granted Jul 24, 2018·94 cites·13 claims
- 0298US9892888B2Particle generation suppresor by DC bias modulationAPPLIED MATERIALS INC·Filed 2017·Granted Feb 13, 2018·26 cites·12 claims
- 0398US9593421B2Particle generation suppressor by DC bias modulationAPPLIED MATERIALS INC·Filed 2014·Granted Mar 14, 2017·63 cites·10 claims
- 0498US9384997B2Dry-etch selectivityAPPLIED MATERIALS INC·Filed 2015·Granted Jul 5, 2016·146 cites·20 claims
- 0598US9373517B2Semiconductor processing with DC assisted RF power for improved controlAPPLIED MATERIALS INC·Filed 2013·Granted Jun 21, 2016·137 cites·20 claims
- 0698US8969212B2Dry-etch selectivityAPPLIED MATERIALS INC·Filed 2013·Granted Mar 3, 2015·184 cites·20 claims
- 0797US10504697B2Particle generation suppresor by DC bias modulationAPPLIED MATERIALS INC·Filed 2017·Granted Dec 10, 2019·8 cites·13 claims
- 0896US9888554B2System, method and apparatus for target material debris cleaning of EUV vessel and EUV collectorASML NETHERLANDS BV·Filed 2016·Granted Feb 6, 2018·9 cites·14 claims
- 0996US8312839B2Mixing frequency at multiple feeding pointsBAEK JONGHOON·Filed 2010·Granted Nov 20, 2012·159 cites·18 claims
- 1090US11347154B2Cleaning a structure surface in an EUV chamberASML NETHERLANDS BV·Filed 2019·Granted May 31, 2022·3 cites·21 claims
- 1187US10362664B2System, method and apparatus for target material debris cleaning of EUV vessel and EUV collectorASML NETHERLANDS BV·Filed 2018·Granted Jul 23, 2019·2 cites·10 claims
- 1287US9039864B2Off-center ground return for RF-powered showerheadBAEK JONGHOON·Filed 2010·Granted May 26, 2015·9 cites·7 claims
- 1386US9068262B2Tightly fitted ceramic insulator on large area electrodeKUDELA JOZEF·Filed 2011·Granted Jun 30, 2015·6 cites·16 claims
- 1484US2025085643A1Cleaning a structure surface in an euv chamberASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 1576US12189313B2Cleaning a structure surface in an EUV chamberASML NETHERLANDS BV·Filed 2022·Granted Jan 7, 2025·0 cites·16 claims
- 1676US11339475B2Film stack overlay improvementAPPLIED MATERIALS INC·Filed 2019·Granted May 24, 2022·2 cites·17 claims
- 1776US8875657B2Balancing RF bridge assemblyBAEK JONGHOON·Filed 2011·Granted Nov 4, 2014·1 cites·17 claims
- 1867US10477662B2System, method and apparatus for target material debris cleaning of EUV vessel and EUV collectorASML NETHERLANDS BV·Filed 2019·Granted Nov 12, 2019·0 cites·20 claims
- 1966US2018119281A1Anti-arc zero field plateAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
- 2065US11013096B2System, method and apparatus for target material debris cleaning of EUV vessel and EUV collectorASML NETHERLANDS BV·Filed 2019·Granted May 18, 2021·0 cites·13 claims
- 2164US11264482B2Semiconductor device including dummy gate patterns and manufacturing method thereofSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Mar 1, 2022·1 cites·20 claims
- 2261US9850576B2Anti-arc zero field plateBAEK JONGHOON·Filed 2010·Granted Dec 26, 2017·0 cites·12 claims
- 2358US12432972B2Semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Sep 30, 2025·0 cites·18 claims
- 2458US12136536B2Electrostatic chuck with multiple radio frequency meshes to control plasma uniformityAPPLIED MATERIALS INC·Filed 2019·Granted Nov 5, 2024·0 cites·24 claims
- 2558US2010089319A1Rf return path for large plasma processing chamberAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 2656US9827578B2Tightly fitted ceramic insulator on large area electrodeAPPLIED MATERIALS INC·Filed 2015·Granted Nov 28, 2017·0 cites·18 claims
- 2752US11908662B2Device and method for tuning plasma distribution using phase controlAPPLIED MATERIALS INC·Filed 2019·Granted Feb 20, 2024·0 cites·14 claims
- 2839US2013071581A1Plasma monitoring and minimizing stray capacitanceBAEK JONGHOON·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →