Inventor · disambiguated record
Joshua Baillargeon
Also filed as: BAILLARGEON JOSHUA
0 granted patents·12 pending applications·0 citations·filing 2023–2024
Files withTOKYO ELECTRON LTD12
Top patents by PatentIndex Score
12 records- 0158US2025305149A1Etching bi-metal oxides with alkaline earth metalsTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0254US2025271374A1In-situ variable temperature bow metrologyTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0351US2025308897A1Hard mask protection of metal interconnectsTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0450US2025293042A1Harc etch chemistry for seminconductorsTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0550US2025379054A1Method of forming hard mask structureTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0648US2025210368A1Single mask multi-critical dimension etching using etch stopTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0745US2025239457A1Tungsten-based additive for through-substrate etchingTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0842US2025308883A1Integrating nitride stress compensation layers for thick oxide wafer creationTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0942US2025379053A1Method for etching a metal hard maskTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1042US2025259855A1In-situ metal deposition for reduced charging during dielectric etchTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1141US2025299945A1Metal encapsulation of etch mask via sputteringTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1239US2025037981A1Systems and methods for depositing metalTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →