Inventor · disambiguated record
Joerg Bischoff
Also filed as: BISCHOFF JOERG
24 granted patents·4 pending applications·530 citations·filing 2002–2012
96Inventor score
Top patents by PatentIndex Score
28 records- 0198US6772084B2Overlay measurements using periodic gratingsTIMBRE TECH INC·Filed 2002·Granted Aug 3, 2004·203 cites·91 claims
- 0293US7388677B2Optical metrology optimization for repetitive structuresTIMBRE TECH INC·Filed 2005·Granted Jun 17, 2008·26 cites·29 claims
- 0393US6775015B2Optical metrology of single featuresTIMBRE TECH INC·Filed 2002·Granted Aug 10, 2004·42 cites·55 claims
- 0492US7224471B2Azimuthal scanning of a structure formed on a semiconductor waferTIMBRE TECH INC·Filed 2003·Granted May 29, 2007·45 cites·23 claims
- 0592US6947141B2Overlay measurements using zero-order cross polarization measurementsTIMBRE TECH INC·Filed 2004·Granted Sep 20, 2005·37 cites·20 claims
- 0692US6804005B2Overlay measurements using zero-order cross polarization measurementsTIMBRE TECH INC·Filed 2002·Granted Oct 12, 2004·38 cites·116 claims
- 0791US7046375B2Edge roughness measurement in optical metrologyTIMBRE TECH INC·Filed 2003·Granted May 16, 2006·41 cites·46 claims
- 0884US7567353B2Automated process control using optical metrology and photoresist parametersTOKYO ELECTRON LTD·Filed 2007·Granted Jul 28, 2009·10 cites·24 claims
- 0984US7414733B2Azimuthal scanning of a structure formed on a semiconductor waferTIMBRE TECH INC·Filed 2007·Granted Aug 19, 2008·7 cites·18 claims
- 1084US7379192B2Optical metrology of single featuresTIMBRE TECH INC·Filed 2006·Granted May 27, 2008·6 cites·19 claims
- 1176US7274472B2Resolution enhanced optical metrologyTIMBRE TECH INC·Filed 2003·Granted Sep 25, 2007·20 cites·45 claims
- 1275US8762100B1Numerical aperture integration for optical critical dimension (OCD) metrologyCHU HANYOU·Filed 2012·Granted Jun 24, 2014·2 cites·20 claims
- 1372US7030999B2Optical metrology of single featuresTIMBRE TECH INC·Filed 2004·Granted Apr 18, 2006·11 cites·27 claims
- 1471US7949618B2Training a machine learning system to determine photoresist parametersTOKYO ELECTRON LTD·Filed 2007·Granted May 24, 2011·10 cites·19 claims
- 1571US7728976B2Determining photoresist parameters using optical metrologyTOKYO ELECTRON LTD·Filed 2007·Granted Jun 1, 2010·4 cites·21 claims
- 1671US7598099B2Method of controlling a fabrication process using an iso-dense biasTOKYO ELECTRON LTD·Filed 2007·Granted Oct 6, 2009·4 cites·9 claims
- 1771US7274465B2Optical metrology of a structure formed on a semiconductor wafer using optical pulsesTIMBRE TECH INC·Filed 2005·Granted Sep 25, 2007·3 cites·27 claims
- 1867US7427521B2Generating simulated diffraction signals for two-dimensional structuresTIMBRE TECH INC·Filed 2002·Granted Sep 23, 2008·6 cites·43 claims
- 1964US7616325B2Optical metrology optimization for repetitive structuresTOKYO ELECTRON LTD·Filed 2008·Granted Nov 10, 2009·3 cites·20 claims
- 2063US7639370B2Apparatus for deriving an iso-dense biasTOKYO ELECTRON LTD·Filed 2007·Granted Dec 29, 2009·1 cites·20 claims
- 2161US9625937B2Computation efficiency by diffraction order truncationBISCHOFF JOERG·Filed 2008·Granted Apr 18, 2017·2 cites·18 claims
- 2261US7586623B2Optical metrology of single featuresTOKYO ELECTRON LTD·Filed 2008·Granted Sep 8, 2009·2 cites·20 claims
- 2358US8195435B2Hybrid diffraction modeling of diffracting structuresBISCHOFF JOERG·Filed 2008·Granted Jun 5, 2012·3 cites·10 claims
- 2457US7630873B2Approximating eigensolutions for use in determining the profile of a structure formed on a semiconductor waferTOKYO ELECTRON LTD·Filed 2003·Granted Dec 8, 2009·4 cites·39 claims
- 2546US2008013107A1Generating a profile model to characterize a structure to be examined using optical metrologyTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 2646US2009116040A1Method of Deriving an Iso-Dense Bias Using a Hybrid Grating LayerTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 2738US2005275850A1Shape roughness measurement in optical metrologyTIMBRE TECH INC·Filed 2004·Application pending·0 cites
- 2836US2006187466A1Selecting unit cell configuration for repeating structures in optical metrologyTIMBRE TECH INC·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →