Inventor · disambiguated record
John C. Forster
Also filed as: FORSTER JOHN · FORSTER JOHN C · FORSTER JOHN CAMPBELL
98 granted patents·25 pending applications·3,004 citations·filing 1994–2025
99Inventor score
Top patents by PatentIndex Score
123 records- 0199US6679981B1Inductive plasma loop enhancing magnetron sputteringAPPLIED MATERIALS INC·Filed 2000·Granted Jan 20, 2004·329 cites·11 claims
- 0299US6306265B1High-density plasma for ionized metal deposition capable of exciting a plasma waveAPPLIED MATERIALS INC·Filed 2000·Granted Oct 23, 2001·138 cites·22 claims
- 0398US6217721B1Filling narrow apertures and forming interconnects with a metal utilizing a crystallographically oriented liner layerAPPLIED MATERIALS INC·Filed 1996·Granted Apr 17, 2001·206 cites·59 claims
- 0498US5897752AWafer bias ring in a sustained self-sputtering reactorAPPLIED MATERIALS INC·Filed 1997·Granted Apr 27, 1999·186 cites·10 claims
- 0597US11915918B2Cleaning of sin with CCP plasma or RPS cleanAPPLIED MATERIALS INC·Filed 2021·Granted Feb 27, 2024·4 cites·8 claims
- 0697US7253109B2Method of depositing a tantalum nitride/tantalum diffusion barrier layer systemAPPLIED MATERIALS INC·Filed 2005·Granted Aug 7, 2007·44 cites·67 claims
- 0796US5962923ASemiconductor device having a low thermal budget metal filling and planarization of contacts, vias and trenchesAPPLIED MATERIALS INC·Filed 1995·Granted Oct 5, 1999·142 cites·31 claims
- 0895US6344419B1Pulsed-mode RF bias for sidewall coverage improvementAPPLIED MATERIALS INC·Filed 1999·Granted Feb 5, 2002·180 cites·23 claims
- 0994US5763851ASlotted RF coil shield for plasma deposition systemAPPLIED MATERIALS INC·Filed 1996·Granted Jun 9, 1998·93 cites·64 claims
- 1093US12014906B2High temperature detachable very high frequency (VHF) electrostatic chuck (ESC) for PVD chamberAPPLIED MATERIALS INC·Filed 2021·Granted Jun 18, 2024·2 cites·20 claims
- 1193US7504006B2Self-ionized and capacitively-coupled plasma for sputtering and resputteringAPPLIED MATERIALS INC·Filed 2003·Granted Mar 17, 2009·49 cites·45 claims
- 1293US7048837B2End point detection for sputtering and resputteringAPPLIED MATERIALS INC·Filed 2003·Granted May 23, 2006·68 cites·26 claims
- 1393US6500762B2Method of depositing a copper seed layer which promotes improved feature surface coverageAPPLIED MATERIALS INC·Filed 2002·Granted Dec 31, 2002·56 cites·22 claims
- 1493US6190513B1Darkspace shield for improved RF transmission in inductively coupled plasma sources for sputter depositionAPPLIED MATERIALS INC·Filed 1997·Granted Feb 20, 2001·90 cites·28 claims
- 1592US8668816B2Self-ionized and inductively-coupled plasma for sputtering and resputteringDING PEIJUN·Filed 2007·Granted Mar 11, 2014·19 cites·16 claims
- 1692US6673724B2Pulsed-mode RF bias for side-wall coverage improvementAPPLIED MATERIALS INC·Filed 2001·Granted Jan 6, 2004·49 cites·21 claims
- 1792US6193855B1Use of modulated inductive power and bias power to reduce overhang and improve bottom coverageAPPLIED MATERIALS INC·Filed 1999·Granted Feb 27, 2001·125 cites·26 claims
- 1891US10763085B2Shaped electrodes for improved plasma exposure from vertical plasma sourceAPPLIED MATERIALS INC·Filed 2018·Granted Sep 1, 2020·5 cites·20 claims
- 1991US7569125B2Shields usable with an inductively coupled plasma reactorAPPLIED MATERIALS INC·Filed 2005·Granted Aug 4, 2009·16 cites·17 claims
- 2091US6911124B2Method of depositing a TaN seed layerAPPLIED MATERIALS INC·Filed 2002·Granted Jun 28, 2005·52 cites·26 claims
- 2191US6264812B1Method and apparatus for generating a plasmaAPPLIED MATERIALS INC·Filed 1995·Granted Jul 24, 2001·98 cites·21 claims
- 2290US10879042B2Symmetric plasma source to generate pie shaped treatmentAPPLIED MATERIALS INC·Filed 2017·Granted Dec 29, 2020·5 cites·16 claims
- 2390US7686926B2Multi-step process for forming a metal barrier in a sputter reactorAPPLIED MATERIALS INC·Filed 2005·Granted Mar 30, 2010·16 cites·11 claims
- 2490US6461483B1Method and apparatus for performing high pressure physical vapor depositionAPPLIED MATERIALS INC·Filed 2000·Granted Oct 8, 2002·35 cites·22 claims
- 2589US11898236B2Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2021·Granted Feb 13, 2024·1 cites·17 claims
- 2689US10692706B2Methods and apparatus for reducing sputtering of a grounded shield in a process chamberAPPLIED MATERIALS INC·Filed 2013·Granted Jun 23, 2020·3 cites·13 claims
- 2789US6368469B1Coils for generating a plasma and for sputteringAPPLIED MATERIALS INC·Filed 1997·Granted Apr 9, 2002·48 cites·54 claims
- 2889US6297595B1Method and apparatus for generating a plasmaAPPLIED MATERIALS INC·Filed 1998·Granted Oct 2, 2001·76 cites·25 claims
- 2989US6149784ASputtering chamber shield promoting reliable plasma ignitionAPPLIED MATERIALS INC·Filed 1999·Granted Nov 21, 2000·66 cites·25 claims
- 3088US9062372B2Self-ionized and capacitively-coupled plasma for sputtering and resputteringGOPALRAJA PRABURAM·Filed 2007·Granted Jun 23, 2015·13 cites·10 claims
- 3188US6254746B1Recessed coil for generating a plasmaAPPLIED MATERIALS INC·Filed 1997·Granted Jul 3, 2001·47 cites·60 claims
- 3288US6228229B1Method and apparatus for generating a plasmaAPPLIED MATERIALS INC·Filed 1998·Granted May 8, 2001·74 cites·21 claims
- 3387US11915917B2Methods and apparatus for reducing sputtering of a grounded shield in a process chamberAPPLIED MATERIALS INC·Filed 2020·Granted Feb 27, 2024·1 cites·20 claims
- 3487US7041201B2Sidewall magnet improving uniformity of inductively coupled plasma and shields used therewithAPPLIED MATERIALS INC·Filed 2003·Granted May 9, 2006·31 cites·18 claims
- 3587US6783639B2Coils for generating a plasma and for sputteringAPPLIED MATERIALS INC·Filed 2002·Granted Aug 31, 2004·21 cites·32 claims
- 3687US6620296B2Target sidewall design to reduce particle generation during magnetron sputteringAPPLIED MATERIALS INC·Filed 2001·Granted Sep 16, 2003·38 cites·21 claims
- 3787US6136095AApparatus for filling apertures in a film layer on a semiconductor substrateAPPLIED MATERIALS INC·Filed 1997·Granted Oct 24, 2000·52 cites·10 claims
- 3887US5685941AInductively coupled plasma reactor with top electrode for enhancing plasma ignitionAPPLIED MATERIALS INC·Filed 1995·Granted Nov 11, 1997·62 cites·45 claims
- 3987US2024186128A1Methods and apparatus for reducing sputtering of a grounded shield in a process chamberAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 4086US10047430B2Self-ionized and inductively-coupled plasma for sputtering and resputteringAPPLIED MATERIALS INC·Filed 2014·Granted Aug 14, 2018·5 cites·22 claims
- 4185US10903056B2Plasma source for rotating susceptorAPPLIED MATERIALS INC·Filed 2018·Granted Jan 26, 2021·3 cites·19 claims
- 4285US9984911B2Electrostatic chuck design for high temperature RF applicationsAPPLIED MATERIALS INC·Filed 2015·Granted May 29, 2018·4 cites·20 claims
- 4385US8920611B2Method for controlling radial distribution of plasma ion density and ion energy at a workpiece surface by multi-frequency RF impedance tuningFORSTER JOHN C·Filed 2008·Granted Dec 30, 2014·10 cites·15 claims
- 4485US8398832B2Coils for generating a plasma and for sputteringNULMAN JAIM·Filed 2005·Granted Mar 19, 2013·10 cites·25 claims
- 4585US7704887B2Remote plasma pre-clean with low hydrogen pressureAPPLIED MATERIALS INC·Filed 2006·Granted Apr 27, 2010·10 cites·15 claims
- 4685US6391776B1Method of depositing a copper seed layer which promotes improved feature surface coverageAPPLIED MATERIALS INC·Filed 2001·Granted May 21, 2002·27 cites·24 claims
- 4784US9721757B2Elongated capacitively coupled plasma source for high temperature low pressure environmentsAPPLIED MATERIALS INC·Filed 2016·Granted Aug 1, 2017·3 cites·18 claims
- 4884US6723214B2Apparatus for improved power coupling through a workpiece in a semiconductor wafer processing systemAPPLIED MATERIALS INC·Filed 2002·Granted Apr 20, 2004·22 cites·22 claims
- 4984US6132566AApparatus and method for sputtering ionized material in a plasmaAPPLIED MATERIALS INC·Filed 1998·Granted Oct 17, 2000·80 cites·25 claims
- 5083US7687909B2Metal / metal nitride barrier layer for semiconductor device applicationsAPPLIED MATERIALS INC·Filed 2007·Granted Mar 30, 2010·7 cites·13 claims
Showing the top 50 of 123 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →