Inventor · disambiguated record
Jochen Hetzler
Also filed as: HETZLER JOCHEN
27 granted patents·9 pending applications·134 citations·filing 2004–2024
95Inventor score
Top patents by PatentIndex Score
36 records- 0196US7605926B1Optical system, method of manufacturing an optical system and method of manufacturing an optical elementZEISS CARL SMT AG·Filed 2008·Granted Oct 20, 2009·47 cites·6 claims
- 0293US11774237B2Method for calibrating a measuring apparatusZEISS CARL SMT GMBH·Filed 2022·Granted Oct 3, 2023·3 cites·12 claims
- 0392US9442393B2Projection exposure tool for microlithography and method for microlithographic imagingZEISS CARL SMT GMBH·Filed 2014·Granted Sep 13, 2016·5 cites·20 claims
- 0491US10337850B2Interferometric measuring arrangementZEISS CARL SMT GMBH·Filed 2017·Granted Jul 2, 2019·10 cites·13 claims
- 0587US9046792B2Projection exposure tool for microlithography and method for microlithographic imagingZEISS CARL SMT GMBH·Filed 2013·Granted Jun 2, 2015·6 cites·22 claims
- 0685US10502545B2Measuring method and measuring arrangement for an imaging optical systemZEISS CARL SMT GMBH·Filed 2017·Granted Dec 10, 2019·4 cites·18 claims
- 0785US7061626B1Method of manufacturing an optical element using a hologramZEISS CARL SMT AG·Filed 2004·Granted Jun 13, 2006·29 cites·35 claims
- 0884US10101667B2Method for aligning a mirror of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Oct 16, 2018·2 cites·19 claims
- 0983US10527403B2Measuring device for interferometric determination of a shape of an optical surfaceZEISS CARL SMT GMBH·Filed 2019·Granted Jan 7, 2020·3 cites·19 claims
- 1083US9709902B2Projection exposure tool for microlithography and method for microlithographic imagingZEISS CARL SMT GMBH·Filed 2016·Granted Jul 18, 2017·2 cites·20 claims
- 1179US7848031B2Hologram and method of manufacturing an optical element using a hologramZEISS CARL SMT AG·Filed 2006·Granted Dec 7, 2010·11 cites·8 claims
- 1278US10422718B2Test device and method for testing a mirrorZEISS CARL SMT GMBH·Filed 2017·Granted Sep 24, 2019·2 cites·18 claims
- 1378US8089634B2Optical element and method of calibrating a measuring apparatus comprising a wave shaping structureHETZLER JOCHEN·Filed 2010·Granted Jan 3, 2012·4 cites·20 claims
- 1477US8617774B2Method and calibration mask for calibrating a position measuring apparatusKERWIEN NORBERT·Filed 2010·Granted Dec 31, 2013·4 cites·33 claims
- 1566US9606339B2Mirror of a projection exposure apparatus for microlithography with mirror surfaces on different mirror sides, and projection exposure apparatusHETZLER JOCHEN·Filed 2012·Granted Mar 28, 2017·1 cites·3 claims
- 1666US9052606B2Microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2012·Granted Jun 9, 2015·1 cites·19 claims
- 1764US2025137878A1Measuring assembly for detecting a distance between two elements, distance measuring device, optical measuring system and methodZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 1861US12105427B2Method and device for correcting a telecentricity error of an imaging deviceZEISS CARL SMT GMBH·Filed 2022·Granted Oct 1, 2024·0 cites·25 claims
- 1961US10359703B2Method for aligning a mirror of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2018·Granted Jul 23, 2019·0 cites·18 claims
- 2059US10303068B2Projection exposure tool for microlithography and method for microlithographic imagingZEISS CARL SMT GMBH·Filed 2017·Granted May 28, 2019·0 cites·18 claims
- 2158US2024077305A1Measurement device for interferometric measurement of a surface shapeZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 2258US2016116851A1Projection exposure tool for microlithography and method for microlithographic imagingZEISS CARL SMT GMBH·Filed 2015·Application pending·0 cites
- 2356US2022349700A1Measuring apparatus for interferometric shape measurementZEISS CARL SMT GMBH·Filed 2022·Application pending·0 cites
- 2455US12332043B2Measurement method for interferometrically determining a surface shapeZEISS CARL SMT GMBH·Filed 2021·Granted Jun 17, 2025·0 cites·10 claims
- 2555US11879720B2Device and method for characterizing the surface shape of a test objectZEISS CARL SMT GMBH·Filed 2021·Granted Jan 23, 2024·0 cites·15 claims
- 2655US8107054B2Microlithographic projection exposure apparatusTOTZECK MICHAEL·Filed 2008·Granted Jan 31, 2012·0 cites·24 claims
- 2754US8982325B2Microlithographic projection exposure apparatusTOTZECK MICHAEL·Filed 2011·Granted Mar 17, 2015·0 cites·24 claims
- 2853US12235097B2Diffractive optical element for a test interferometerZEISS CARL SMT GMBH·Filed 2022·Granted Feb 25, 2025·0 cites·20 claims
- 2951US11199396B2Compensation optical system for an interferometric measuring systemZEISS CARL SMT GMBH·Filed 2020·Granted Dec 14, 2021·0 cites·20 claims
- 3049US10054426B2Mask inspection system for inspecting lithography masksZEISS CARL SMT GMBH·Filed 2015·Granted Aug 21, 2018·0 cites·31 claims
- 3149US2010134768A1Projection exposure system for microlithographyZEISS CARL SMT AG·Filed 2009·Application pending·0 cites
- 3241US2013182264A1Projection Exposure Tool for Microlithography and Method for Microlithographic ExposureHETZLER JOCHEN·Filed 2013·Application pending·0 cites
- 3340US2005123840A1Mask for use in a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2004·Application pending·0 cites
- 3439US8436982B2Projection objective for microlithographyBEIERL HELMUT·Filed 2010·Granted May 7, 2013·0 cites·23 claims
- 3537US2015198438A1Diffractive optical element and measuring methodZEISS CARL SMT GMBH·Filed 2015·Application pending·0 cites
- 3631US2006274325A1Method of qualifying a diffraction grating and method of manufacturing an optical elementZEISS CARL SMT AG·Filed 2006·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Jochen Hetzler files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →