Inventor · disambiguated record
Joseph J. Sizensky
Also filed as: SIZENSKY JOSEPH · SIZENSKY JOSEPH J
16 granted patents·371 citations·filing 1985–2000
94Inventor score
Files withOCG MICROELECTRONIC MATERIALS6ARCH SPEC CHEM INC3OLIN HUNT SPECIALTY PROD3OLIN MICROELECTRONIC CHEM INC2ARCH CHEM INC1
Top patents by PatentIndex Score
16 records- 0196US4617251AStripping composition and method of using the sameOLIN HUNT SPECIALTY PROD·Filed 1985·Granted Oct 14, 1986·195 cites·11 claims
- 0274US6133412AProduction of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulationsARCH CHEM INC·Filed 1999·Granted Oct 17, 2000·21 cites·5 claims
- 0373US5001040AProcess of forming resist image in positive photoresist with thermally stable phenolic resinOLIN HUNT SPECIALTY PROD·Filed 1990·Granted Mar 19, 1991·21 cites·3 claims
- 0471US5985507ASelected high thermal novolaks and positive-working radiation-sensitive compositionsOLIN MICROELECTRONIC CHEM INC·Filed 1998·Granted Nov 16, 1999·23 cites·20 claims
- 0567US6159653AProduction of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulationsARCH SPEC CHEM INC·Filed 1998·Granted Dec 12, 2000·24 cites·15 claims
- 0667US5413894AHigh ortho-ortho bonded novolak binder resins and their use in radiation-sensitive compositionsOCG MICROELECTRONIC MATERIALS·Filed 1993·Granted May 9, 1995·12 cites·15 claims
- 0764US5494785AHigh ortho-ortho bonded novolak binder resins and their use in a process for forming positive resist patternsOCG MICROELECTRONIC MATERIALS·Filed 1995·Granted Feb 27, 1996·15 cites·12 claims
- 0859US4959292ALight-sensitive o-quinone diazide composition and product with phenolic novolak prepared by condensation with haloacetoaldehydeOLIN HUNT SPECIALTY PROD·Filed 1988·Granted Sep 25, 1990·13 cites·18 claims
- 0958US5473045AHigh ortho-ortho bonded novolak binder resins and their use in radiation-sensitive compositionsOCG MICROELECTRONIC MATERIALS·Filed 1995·Granted Dec 5, 1995·14 cites·20 claims
- 1056US6309793B1Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulationsARCH SPEC CHEM INC·Filed 2000·Granted Oct 30, 2001·9 cites·20 claims
- 1151US6027853AProcess for preparing a radiation-sensitive compositionOLIN MICROELECTRONIC CHEM INC·Filed 1998·Granted Feb 22, 2000·12 cites·21 claims
- 1239US6380317B1Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulationsARCH SPEC CHEM INC·Filed 1999·Granted Apr 30, 2002·5 cites·10 claims
- 1337US5306594ARadiation-sensitive compositions using novolak resins made from a substituted bis(hydroxyphenyl)methane and a bis-(methylol)-cresolOCG MICROELECTRONIC MATERIALS·Filed 1991·Granted Apr 26, 1994·3 cites·17 claims
- 1434US5053479AThermally stable phenolic resin compositions and their use in light-sensitive compositionsOCG MICROELECTRONIC MATERIALS·Filed 1990·Granted Oct 1, 1991·3 cites·9 claims
- 1531US5350827ASelected structurally defined novolak binder resins and their use in radiation-sensitive compositionsOCG MICROELECTRONIC MATERIALS·Filed 1994·Granted Sep 27, 1994·1 cites·5 claims
- 1623US5338652ASelected structurally defined novolak binder resins and their use in photoresist pattern formationOCG MICROELECTRONIC MARTERIALS·Filed 1994·Granted Aug 16, 1994·0 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →