Inventor · disambiguated record
Joern Weber
Also filed as: WEBER JOERN · WEBER JOERN HENDRIK
8 granted patents·5 pending applications·25 citations·filing 2011–2025
78Inventor score
Top patents by PatentIndex Score
13 records- 0193US9453749B1Hybrid sensing ultrasonic flowmeterHONEYWELL INT INC·Filed 2015·Granted Sep 27, 2016·21 cites·16 claims
- 0268US8928972B2Reflective optical element for EUV lithographyWEBER JOERN·Filed 2011·Granted Jan 6, 2015·3 cites·20 claims
- 0367US2025216794A1Mirror device, for example for a microlithographic projection exposure system, and method for measuring the temperature of a mirrorZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 0467US2025216801A1Mirror device, projection objective and method for measuring the temperature of a mirrorZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 0566US2025068084A1Mirror, in particular for a microlithographic projection exposure systemZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 0665US10061205B2Reflective optical elementZEISS CARL SMT GMBH·Filed 2017·Granted Aug 28, 2018·1 cites·20 claims
- 0758US12406777B2Optical element for a EUV projection exposure systemZEISS CARL SMT GMBH·Filed 2022·Granted Sep 2, 2025·0 cites·14 claims
- 0857US2023257866A1Method for producing an optical element, optical element, device for producing an optical element, secondary gas and projection exposure systemZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 0944US8937709B2Reflective optical element for EUV lithographyWEBER JOERN·Filed 2011·Granted Jan 20, 2015·0 cites·16 claims
- 1042US11328831B2Method for treating a reflective optical element for the EUV wavelength range, method for producing same, and treating apparatusZEISS CARL SMT GMBH·Filed 2018·Granted May 10, 2022·0 cites·16 claims
- 1137US9494718B2Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objectiveMUELLENDER STEPHAN·Filed 2012·Granted Nov 15, 2016·0 cites·27 claims
- 1236US2019064405A1Optical element and optical assembly comprising sameZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 1334US9915873B2Reflective optical element, and optical system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Mar 13, 2018·0 cites·24 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →