Inventor · disambiguated record
Jun Koshiyama
Also filed as: KOSHIYAMA JUN
25 granted patents·8 pending applications·157 citations·filing 1995–2016
95Inventor score
Top patents by PatentIndex Score
33 records- 0189US7741260B2Rinsing fluid for lithographyTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Jun 22, 2010·12 cites·4 claims
- 0287US7795197B2Cleaning liquid for lithography and method for resist pattern formationTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Sep 14, 2010·10 cites·13 claims
- 0383US9244358B2Surface treatment liquid, surface treatment method, hydrophobilization method, and hydrophobilized substrateKOSHIYAMA JUN·Filed 2009·Granted Jan 26, 2016·9 cites·8 claims
- 0483US8623131B2Surface treatment agent and surface treatment methodYOSHIDA MASAAKI·Filed 2010·Granted Jan 7, 2014·4 cites·4 claims
- 0582US8124312B2Method for forming pattern, and material for forming coating filmISHIKAWA KIYOSHI·Filed 2007·Granted Feb 28, 2012·11 cites·5 claims
- 0680US8367312B2Detergent for lithography and method of forming resist pattern with the sameTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Feb 5, 2013·5 cites·8 claims
- 0779US8410296B2Surface treatment agent and surface treatment methodYOSHIDA MASAAKI·Filed 2010·Granted Apr 2, 2013·3 cites·8 claims
- 0875US6015467AMethod of removing coating from edge of substrateTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Jan 18, 2000·49 cites·22 claims
- 0973US8058220B2Cleaning liquid for lithography and a cleaning method using it for photoexposure devicesKOSHIYAMA JUN·Filed 2010·Granted Nov 15, 2011·2 cites·9 claims
- 1073US7884062B2Cleaning liquid for lithography and cleaning method using sameTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted Feb 8, 2011·4 cites·12 claims
- 1172US8409360B2Cleaning method for a process of liquid immersion lithographyKOSHIYAMA JUN·Filed 2010·Granted Apr 2, 2013·2 cites·6 claims
- 1271US7897325B2Lithographic rinse solution and method for forming patterned resist layer using the sameTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Mar 1, 2011·2 cites·8 claims
- 1367US7811748B2Resist pattern forming method and composite rinse agentTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Oct 12, 2010·2 cites·12 claims
- 1463US6734258B2Protective coating composition for dual damascene processTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted May 11, 2004·5 cites·4 claims
- 1560US8158328B2Composition for formation of anti-reflection film, and method for formation of resist pattern using the sameSAWANO ATSUSHI·Filed 2008·Granted Apr 17, 2012·2 cites·13 claims
- 1654US9291905B2Developing solution for photolithography, method for forming resist pattern, and method and apparatus for producing developing solution for photolithographyTOKYO OHKA KOGYO CO LTD·Filed 2015·Granted Mar 22, 2016·0 cites·7 claims
- 1754US6117623ARemover solvent for partial removal of photoresist layerTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Sep 12, 2000·21 cites·9 claims
- 1852US5518860APositive-working quinonediazide photoresist composition containing hydroxyalkyl substituted pyridine compoundTOKYO OHKA KOGYO CO LTD·Filed 1995·Granted May 21, 1996·13 cites·5 claims
- 1948US2011159447A1Developing solution for photolithography, method for forming resist pattern, and method and apparatus for producing developing solution for photolithographyTOKYO OHKA KOGYO CO LTD·Filed 2010·Application pending·0 cites
- 2047US2010255429A1Fine pattern forming method and coat film forming materialTOKYO OHKA KOGYO CO LTD·Filed 2008·Application pending·0 cites
- 2146US8216775B2Anti-reflection film forming material, and method for forming resist pattern using the sameSHIRAI YURIKO·Filed 2009·Granted Jul 10, 2012·0 cites·7 claims
- 2244US6835530B2Base material for lithographyTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Dec 28, 2004·1 cites·9 claims
- 2342US8455182B2Composition for antireflection film formation and method for resist pattern formation using the compositionSAWANO ATSUSHI·Filed 2008·Granted Jun 4, 2013·0 cites·7 claims
- 2441US2008193876A1Rinsing Liquid for Lithography and Method for Resist Pattern FormationTOKYO OHKA KOGYO CO LTD·Filed 2005·Application pending·0 cites
- 2540US10576432B2Polyimide and/or polyamideimide porous body and method for manufacturing same, method for separation and/or adsorption, separation material, adsorption material, filter media, laminate, and filter deviceTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Mar 3, 2020·0 cites·13 claims
- 2640US7576046B2Cleaning liquid for lithography and method of cleaning therewithTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Aug 18, 2009·0 cites·2 claims
- 2740US2007218412A1Rinse Solution For LithographyTOKYO OHKA KOGYO CO LTD·Filed 2005·Application pending·0 cites
- 2840US2007292808A1Developing Solution Composition for Lithography and Method for Resist Pattern FormationKOSHIYAMA JUN·Filed 2005·Application pending·0 cites
- 2939US2012141940A1Chemically amplified positive-type photoresist composition for thick film, and method for producing thick film resist patternSHIMIZU TAKAHIRO·Filed 2011·Application pending·0 cites
- 3037US10576433B2Method for purifying liquid, method for producing chemical solution or cleaning solution, filter medium, and filter deviceTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Mar 3, 2020·0 cites·12 claims
- 3137US7179399B2Material for forming protective filmTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Feb 20, 2007·0 cites·21 claims
- 3237US2011054184A1Surface treatment agent and surface treatment methodTOKYO OHKA KOGYO CO LTD·Filed 2010·Application pending·0 cites
- 3335US2010248164A1Cleaning liquid for lithography and method for forming a resist pattern using the sameTOKYO OHKA KOGYO CO LTD·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →