Inventor · disambiguated record
Junjiang Lei
Also filed as: LEI JUNJIANG
27 granted patents·2 pending applications·118 citations·filing 2007–2024
95Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD12CADENCE DESIGN SYSTEMS INC5MENTOR GRAPHICS CORP4LAI YA-CHIEH3LEI JUNJIANG3
Top patents by PatentIndex Score
29 records- 0192US10838305B2Lithographic mask correction using volume correction techniquesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Nov 17, 2020·4 cites·19 claims
- 0292US9836556B2Optical proximity correction for directed-self-assembly guiding patternsMENTOR GRAPHICS CORP·Filed 2016·Granted Dec 5, 2017·6 cites·16 claims
- 0391US8079005B2Method and system for performing pattern classification of patterns in integrated circuit designsLAI YA-CHIEH·Filed 2008·Granted Dec 13, 2011·29 cites·29 claims
- 0490US10671052B2Synchronized parallel tile computation for large area lithography simulationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jun 2, 2020·5 cites·20 claims
- 0589US11340584B2Synchronized parallel tile computation for large area lithography simulationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted May 24, 2022·2 cites·20 claims
- 0688US10990002B2Sub-resolution assist featuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Apr 27, 2021·3 cites·20 claims
- 0787US10915090B2Synchronized parallel tile computation for large area lithography simulationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Feb 9, 2021·2 cites·20 claims
- 0886US11610043B2Machine learning based model builder and its applications for pattern transferring in semiconductor manufacturingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Mar 21, 2023·1 cites·20 claims
- 0986US8677301B2Method and system for model-based design and layout of an integrated circuitLAI YA-CHIEH·Filed 2012·Granted Mar 18, 2014·8 cites·20 claims
- 1084US7966586B2Intelligent pattern signature based on lithography effectsCADENCE DESIGN SYSTEMS INC·Filed 2007·Granted Jun 21, 2011·8 cites·23 claims
- 1184US2024370636A1Machine learning based model builder and its applications for pattern transferring in semiconductor manufacturingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 1283US12416857B2Sub-resolution assist featuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Sep 16, 2025·0 cites·20 claims
- 1383US8645887B2Method and system for model-based design and layout of an integrated circuitLAI YA-CHIEH·Filed 2012·Granted Feb 4, 2014·6 cites·20 claims
- 1483US8381152B2Method and system for model-based design and layout of an integrated circuitCADENCE DESIGN SYSTEMS INC·Filed 2008·Granted Feb 19, 2013·10 cites·33 claims
- 1581US12112116B2Machine learning based model builder and its applications for pattern transferring in semiconductor manufacturingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Oct 8, 2024·0 cites·20 claims
- 1681US8910098B1Neighbor-aware edge fragment adjustment for optical proximity correctionMENTOR GRAPHICS CORP·Filed 2014·Granted Dec 9, 2014·10 cites·30 claims
- 1779US11747786B2Synchronized parallel tile computation for large area lithography simulationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Sep 5, 2023·0 cites·20 claims
- 1879US7631289B1Method and system for implementing optimized lithography models for accuracy and resolutionCADENCE DESIGN SYSTEMS INC·Filed 2007·Granted Dec 8, 2009·5 cites·71 claims
- 1977US8341571B1Pattern signatureLEI JUNJIANG·Filed 2011·Granted Dec 25, 2012·5 cites·21 claims
- 2076US7904853B1Pattern signatureCADENCE DESIGN SYSTEMS INC·Filed 2007·Granted Mar 8, 2011·7 cites·18 claims
- 2173US8539391B2Edge fragment correlation determination for optical proximity correctionLEI JUNJIANG·Filed 2012·Granted Sep 17, 2013·4 cites·21 claims
- 2272US8881070B1Optical proximity correction based on edge fragment correlationMENTOR GRAPHICS CORP·Filed 2014·Granted Nov 4, 2014·3 cites·30 claims
- 2371US11829066B2Sub-resolution assist featuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Nov 28, 2023·0 cites·20 claims
- 2468US12411405B2Optical proximity correction based on combining inverse lithography technology with pattern classificationSIEMENS IND SOFTWARE INC·Filed 2022·Granted Sep 9, 2025·0 cites·19 claims
- 2568US11531273B2Lithographic mask correction using volume correction techniquesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Dec 20, 2022·0 cites·20 claims
- 2652US10311165B2Guiding patterns optimization for directed self-assemblyMENTOR GRAPHICS CORP·Filed 2016·Granted Jun 4, 2019·0 cites·20 claims
- 2752US2024427967A1Monotonic Machine Learning-Based Sub-Resolution Assist FeaturesSIEMENS IND SOFTWARE INC·Filed 2023·Application pending·0 cites
- 2847US8291351B2Intelligent pattern signature based on lithography effectsLEI JUNJIANG·Filed 2011·Granted Oct 16, 2012·0 cites·10 claims
- 2945US8358828B2Interpolation of irregular data in a finite-dimensional metric space in lithographic simulationCADENCE DESIGN SYSTEMS INC·Filed 2007·Granted Jan 22, 2013·0 cites·26 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →