Inventor · disambiguated record
Juan Carlos Rocha-Alvarez
Also filed as: ROCHA-ALVAREZ JUAN C · ROCHA-ALVAREZ JUAN CARLOS
153 granted patents·79 pending applications·3,207 citations·filing 2001–2025
99Inventor score
Top patents by PatentIndex Score
232 records- 0198US10950477B2Ceramic heater and esc with enhanced wafer edge performanceAPPLIED MATERIALS INC·Filed 2016·Granted Mar 16, 2021·280 cites·9 claims
- 0298US10774423B2Tunable ground planes in plasma chambersAPPLIED MATERIALS INC·Filed 2014·Granted Sep 15, 2020·41 cites·20 claims
- 0398US8911553B2Quartz showerhead for nanocure UV chamberBALUJA SANJEEV·Filed 2011·Granted Dec 16, 2014·479 cites·9 claims
- 0498US7566891B2Apparatus and method for treating a substrate with UV radiation using primary and secondary reflectorsAPPLIED MATERIALS INC·Filed 2007·Granted Jul 28, 2009·553 cites·33 claims
- 0597US11492705B2Isolator apparatus and methods for substrate processing chambersAPPLIED MATERIALS INC·Filed 2020·Granted Nov 8, 2022·8 cites·14 claims
- 0697US9466469B2Remote plasma source for controlling plasma skewAPPLIED MATERIALS INC·Filed 2016·Granted Oct 11, 2016·121 cites·20 claims
- 0797US9157730B2PECVD processAPPLIED MATERIALS INC·Filed 2013·Granted Oct 13, 2015·49 cites·18 claims
- 0897US7692171B2Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectorsKASZUBA ANDRZEI·Filed 2007·Granted Apr 6, 2010·471 cites·26 claims
- 0997US7572337B2Blocker plate bypass to distribute gases in a chemical vapor deposition systemAPPLIED MATERIALS INC·Filed 2005·Granted Aug 11, 2009·43 cites·15 claims
- 1096US10483141B2Semiconductor process equipmentAPPLIED MATERIALS INC·Filed 2017·Granted Nov 19, 2019·13 cites·19 claims
- 1196US9458537B2PECVD processAPPLIED MATERIALS INC·Filed 2015·Granted Oct 4, 2016·12 cites·20 claims
- 1296US7663121B2High efficiency UV curing systemAPPLIED MATERIALS INC·Filed 2006·Granted Feb 16, 2010·38 cites·12 claims
- 1396US7589336B2Apparatus and method for exposing a substrate to UV radiation while monitoring deterioration of the UV source and reflectorsAPPLIED MATERIALS INC·Filed 2007·Granted Sep 15, 2009·39 cites·23 claims
- 1496US7500445B2Method and apparatus for cleaning a CVD chamberAPPLIED MATERIALS INC·Filed 2003·Granted Mar 10, 2009·187 cites·2 claims
- 1596US6946033B2Heated gas distribution plate for a processing chamberAPPLIED MATERIALS INC·Filed 2002·Granted Sep 20, 2005·227 cites·17 claims
- 1696US6591850B2Method and apparatus for fluid flow controlAPPLIED MATERIALS INC·Filed 2001·Granted Jul 15, 2003·68 cites·28 claims
- 1795US11827980B2Isolator apparatus and methods for substrate processing chambersAPPLIED MATERIALS INC·Filed 2022·Granted Nov 28, 2023·2 cites·18 claims
- 1895US10480074B2Apparatus for radical-based deposition of dielectric filmsAPPLIED MATERIALS INC·Filed 2017·Granted Nov 19, 2019·15 cites·20 claims
- 1995US9816187B2PECVD processAPPLIED MATERIALS INC·Filed 2016·Granted Nov 14, 2017·8 cites·20 claims
- 2095US7777198B2Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiationAPPLIED MATERIALS INC·Filed 2007·Granted Aug 17, 2010·29 cites·30 claims
- 2194US10403535B2Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition systemAPPLIED MATERIALS INC·Filed 2015·Granted Sep 3, 2019·11 cites·17 claims
- 2294US10236197B2Processing system containing an isolation region separating a deposition chamber from a treatment chamberAPPLIED MATERIALS INC·Filed 2015·Granted Mar 19, 2019·11 cites·20 claims
- 2394US7829145B2Methods of uniformity control for low flow process and chamber to chamber matchingAPPLIED MATERIALS INC·Filed 2008·Granted Nov 9, 2010·18 cites·16 claims
- 2494US7622005B2Uniformity control for low flow process and chamber to chamber matchingAPPLIED MATERIALS INC·Filed 2005·Granted Nov 24, 2009·19 cites·8 claims
- 2593US11613812B2PECVD processAPPLIED MATERIALS INC·Filed 2020·Granted Mar 28, 2023·2 cites·20 claims
- 2693US8203126B2Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiationROCHA-ALVAREZ JUAN CARLOS·Filed 2010·Granted Jun 19, 2012·26 cites·15 claims
- 2793US7909595B2Apparatus and method for exposing a substrate to UV radiation using a reflector having both elliptical and parabolic reflective sectionsAPPLIED MATERIALS INC·Filed 2007·Granted Mar 22, 2011·18 cites·7 claims
- 2893US6797643B2Plasma enhanced CVD low k carbon-doped silicon oxide film deposition using VHF-RF powerAPPLIED MATERIALS INC·Filed 2002·Granted Sep 28, 2004·84 cites·24 claims
- 2992US11587817B2High temperature bipolar electrostatic chuckAPPLIED MATERIALS INC·Filed 2020·Granted Feb 21, 2023·2 cites·20 claims
- 3092US10431480B2External substrate rotation in a semiconductor processing systemAPPLIED MATERIALS INC·Filed 2016·Granted Oct 1, 2019·6 cites·20 claims
- 3192US9725806B2Multi-zone pedestal for plasma processingAPPLIED MATERIALS INC·Filed 2015·Granted Aug 8, 2017·7 cites·17 claims
- 3291US10276353B2Dual-channel showerhead for formation of film stacksAPPLIED MATERIALS INC·Filed 2016·Granted Apr 30, 2019·4 cites·20 claims
- 3391US10192717B2Conditioning remote plasma source for enhanced performance having repeatable etch and deposition ratesAPPLIED MATERIALS INC·Filed 2015·Granted Jan 29, 2019·3 cites·10 claims
- 3491US10083818B2Auto frequency tuned remote plasma sourceAPPLIED MATERIALS INC·Filed 2015·Granted Sep 25, 2018·8 cites·19 claims
- 3591US8657961B2Method for UV based silylation chamber cleanAPPLIED MATERIALS INC·Filed 2013·Granted Feb 25, 2014·8 cites·16 claims
- 3691US8455849B2Method and apparatus for modulating wafer treatment profile in UV chamberBALUJA SANJEEV·Filed 2011·Granted Jun 4, 2013·13 cites·18 claims
- 3790US12217937B2Radio frequency source for inductively coupled and capacitively coupled plasmas in substrate processing chambersAPPLIED MATERIALS INC·Filed 2022·Granted Feb 4, 2025·1 cites·20 claims
- 3890US10793954B2PECVD processAPPLIED MATERIALS INC·Filed 2018·Granted Oct 6, 2020·3 cites·13 claims
- 3990US10060032B2PECVD processAPPLIED MATERIALS INC·Filed 2017·Granted Aug 28, 2018·3 cites·20 claims
- 4090US9840777B2Apparatus for radical-based deposition of dielectric filmsAPPLIED MATERIALS INC·Filed 2014·Granted Dec 12, 2017·4 cites·20 claims
- 4190US9556507B2Yttria-based material coated chemical vapor deposition chamber heaterAPPLIED MATERIALS INC·Filed 2014·Granted Jan 31, 2017·4 cites·16 claims
- 4290US7189658B2Strengthening the interface between dielectric layers and barrier layers with an oxide layer of varying composition profileAPPLIED MATERIALS INC·Filed 2005·Granted Mar 13, 2007·11 cites·20 claims
- 4389US11501993B2Semiconductor substrate supports with improved high temperature chuckingAPPLIED MATERIALS INC·Filed 2020·Granted Nov 15, 2022·2 cites·20 claims
- 4489US10100408B2Edge hump reduction faceplate by plasma modulationAPPLIED MATERIALS INC·Filed 2015·Granted Oct 16, 2018·6 cites·18 claims
- 4588US11031262B2Loadlock integrated bevel etcher systemAPPLIED MATERIALS INC·Filed 2020·Granted Jun 8, 2021·2 cites·20 claims
- 4688US10570517B2Apparatus and method for UV treatment, chemical treatment, and depositionAPPLIED MATERIALS INC·Filed 2016·Granted Feb 25, 2020·2 cites·20 claims
- 4788US10233543B2Showerhead assembly with multiple fluid delivery zonesAPPLIED MATERIALS INC·Filed 2015·Granted Mar 19, 2019·4 cites·16 claims
- 4888US9506145B2Method and hardware for cleaning UV chambersAPPLIED MATERIALS INC·Filed 2016·Granted Nov 29, 2016·3 cites·20 claims
- 4988US9364871B2Method and hardware for cleaning UV chambersAPPLIED MATERIALS INC·Filed 2013·Granted Jun 14, 2016·4 cites·11 claims
- 5087US11643725B2Hardware to prevent bottom purge incursion in application volume and process gas diffusion below heaterAPPLIED MATERIALS INC·Filed 2021·Granted May 9, 2023·1 cites·14 claims
Showing the top 50 of 232 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Juan Carlos Rocha-Alvarez files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →