Inventor · disambiguated record
Jun Xue
Also filed as: XUE JUN
34 granted patents·12 pending applications·374 citations·filing 2008–2025
96Inventor score
Files withAPPLIED MATERIALS INC17LAM RES CORP10TENCENT TECH SHENZHEN CO LTD7HUAWEI TECH CO LTD3SHENZHEN FEIYANG PROTECH CORP LTD2
Top patents by PatentIndex Score
46 records- 0198US9502258B2Anisotropic gap etchAPPLIED MATERIALS INC·Filed 2014·Granted Nov 22, 2016·129 cites·14 claims
- 0297US9777378B2Advanced process flow for high quality FCVD filmsAPPLIED MATERIALS INC·Filed 2015·Granted Oct 3, 2017·18 cites·19 claims
- 0397US9412613B2Development of high etch selective hardmask material by ion implantation into amorphous carbon filmsAPPLIED MATERIALS INC·Filed 2014·Granted Aug 9, 2016·54 cites·10 claims
- 0497US9190290B2Halogen-free gas-phase silicon etchAPPLIED MATERIALS INC·Filed 2014·Granted Nov 17, 2015·97 cites·15 claims
- 0595US11988965B2Underlayer for photoresist adhesion and dose reductionLAM RES CORP·Filed 2021·Granted May 21, 2024·13 cites·42 claims
- 0695US11314168B2Underlayer for photoresist adhesion and dose reductionLAM RES CORP·Filed 2021·Granted Apr 26, 2022·24 cites·79 claims
- 0794US12474638B2Underlayer for photoresist adhesion and dose reductionLAM RES CORP·Filed 2024·Granted Nov 18, 2025·2 cites·63 claims
- 0893US12474640B2Integration of dry development and etch processes for EUV patterning in a single process chamberLAM RES CORP·Filed 2024·Granted Nov 18, 2025·4 cites·20 claims
- 0989US9502262B2Nanocrystalline diamond carbon film for 3D NAND hardmask applicationAPPLIED MATERIALS INC·Filed 2015·Granted Nov 22, 2016·5 cites·18 claims
- 1085US10096466B2Pulsed plasma for film depositionAPPLIED MATERIALS INC·Filed 2016·Granted Oct 9, 2018·4 cites·24 claims
- 1184US2025328076A1Underlayer for photoresist adhesion and dose reductionLAM RES CORP·Filed 2025·Application pending·0 cites
- 1280US9865464B2Nanocrystalline diamond carbon film for 3D NAND hardmask applicationAPPLIED MATERIALS INC·Filed 2016·Granted Jan 9, 2018·2 cites·20 claims
- 1380US9620407B23D material modification for advanced processingAPPLIED MATERIALS INC·Filed 2015·Granted Apr 11, 2017·3 cites·16 claims
- 1479US9852902B2Material deposition for high aspect ratio structuresAPPLIED MATERIALS INC·Filed 2014·Granted Dec 26, 2017·3 cites·14 claims
- 1574US2024395542A1High etch selectivity, low stress ashable carbon hard maskLAM RES CORP·Filed 2024·Application pending·0 cites
- 1673US8278072B1Method for synthesis of sialylated products using reversible sialylationMATTA KHUSHI L·Filed 2008·Granted Oct 2, 2012·7 cites·12 claims
- 1768US8074739B2Sampling method and sampler for gas hydrates by hole bottom freezingSUN YOUHONG·Filed 2009·Granted Dec 13, 2011·5 cites·12 claims
- 1866US12187838B2Preparation method of self-thixotropic polyurethane curing agent, self-thixotropic polyurethane curing agent and application thereofSHENZHEN FEIYANG PROTECH CORP LTD·Filed 2023·Granted Jan 7, 2025·0 cites·3 claims
- 1965US9534289B2Plasma process chambers employing distribution grids having focusing surfaces thereon enabling angled fluxes to reach a substrate, and related methodsAPPLIED MATERIALS INC·Filed 2015·Granted Jan 3, 2017·1 cites·20 claims
- 2063US12062537B2High etch selectivity, low stress ashable carbon hard maskLAM RES CORP·Filed 2020·Granted Aug 13, 2024·0 cites·34 claims
- 2163US9619107B2Methods and systems for dynamically displaying icons on a user interface for security check and other functionsTENCENT TECH SHENZHEN CO LTD·Filed 2014·Granted Apr 11, 2017·2 cites·19 claims
- 2259US9382625B2Remote plasma source based cyclic CVD process for nanocrystalline diamond depositionAPPLIED MATERIALS INC·Filed 2014·Granted Jul 5, 2016·0 cites·20 claims
- 2359US2024420057A1Systems and methods for collecting and displaying business insights in a cloud-based systemZSCALER INC·Filed 2024·Application pending·0 cites
- 2458US2023279259A1Aspartic polyurea coatingSHENZHEN FEIYANG PROTECH CORP LTD·Filed 2023·Application pending·0 cites
- 2556US10276369B2Material deposition for high aspect ratio structuresAPPLIED MATERIALS INC·Filed 2017·Granted Apr 30, 2019·0 cites·8 claims
- 2655US10643021B2Method and device for processing web page contentTENCENT TECH SHENZHEN CO LTD·Filed 2018·Granted May 5, 2020·0 cites·18 claims
- 2753US9773675B23D material modification for advanced processingAPPLIED MATERIALS INC·Filed 2017·Granted Sep 26, 2017·0 cites·20 claims
- 2852US11157576B2Method, system and terminal for performing search in a browserTENCENT TECH SHENZHEN CO LTD·Filed 2018·Granted Oct 26, 2021·0 cites·17 claims
- 2951US2025244677A1All-in-one dry development for metal-containing photoresistLAM RES CORP·Filed 2025·Application pending·0 cites
- 3050US9062509B2Forced cooling circulation system for drilling mudSUN YOUHONG·Filed 2010·Granted Jun 23, 2015·1 cites·7 claims
- 3148US12222823B2User data backup to data partition of storage mediumHUAWEI TECH CO LTD·Filed 2018·Granted Feb 11, 2025·0 cites·20 claims
- 3247US10019414B2Method and device for processing web page contentTENCENT TECH SHENZHEN CO LTD·Filed 2015·Granted Jul 10, 2018·0 cites·16 claims
- 3346US10152546B2Method, system and terminal for performing search in a browserTENCENT TECH SHENZHEN CO LTD·Filed 2016·Granted Dec 11, 2018·0 cites·16 claims
- 3446US9520267B2Bias voltage frequency controlled angular ion distribution in plasma processingGODET LUDOVIC·Filed 2014·Granted Dec 13, 2016·0 cites·17 claims
- 3546US2024309007A1Crystalline forms of 3-{4-[(2r)-2-aminopropoxy]phenyl}-n-[(1r)- 1-(3-fluorophenyl) ethyl]imidazo[1,2-b]pyridazin-6-amine and salts thereofANHEART THERAPEUTICS HANGZHOU CO LTD·Filed 2021·Application pending·0 cites
- 3645US12435412B2High density, modulus, and hardness amorphous carbon films at low pressureLAM RES CORP·Filed 2020·Granted Oct 7, 2025·0 cites·27 claims
- 3745US2016079034A1Flowable film properties tuning using implantationAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 3845US2015380526A1Methods for forming fin structures with desired dimensions for 3d structure semiconductor applicationsAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 3944US2015256352A1Method and device for sharing content between different terminalsTENCENT TECH SHENZHEN CO LTD·Filed 2014·Application pending·0 cites
- 4043US11521860B2Selectively etching for nanowiresLAM RES CORP·Filed 2019·Granted Dec 6, 2022·0 cites·18 claims
- 4143US9595467B2Air gap formation in interconnection structure by implantation processAPPLIED MATERIALS INC·Filed 2015·Granted Mar 14, 2017·0 cites·19 claims
- 4240US2018046399A1Storage Partitioning Method and TerminalHUAWEI TECH CO LTD·Filed 2017·Application pending·0 cites
- 4340US2013115778A1Dry Etch ProcessesXUE JUN·Filed 2012·Application pending·0 cites
- 4439US11360696B2System startup method and apparatus, electronic device, and storage mediumHUAWEI TECH CO LTD·Filed 2020·Granted Jun 14, 2022·0 cites·20 claims
- 4539US9313321B2Screen unlocking method and device for mobile terminalTENCENT TECH SHENZHEN CO LTD·Filed 2015·Granted Apr 12, 2016·0 cites·16 claims
- 4637US2017200587A1Atomic layer etching system with remote plasma source and dc electrodeAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →