Inventor · disambiguated record
Kaustuve Bhattacharyya
Also filed as: BHATTACHARYYA KAUSTUVE
57 granted patents·8 pending applications·140 citations·filing 2002–2023
98Inventor score
Files withASML NETHERLANDS BV59BHATTACHARYYA KAUSTUVE2DEN BOEF ARIE JEFFREY1KLA TENCOR TECH CORP1SMILDE HENDRIK JAN HIDDE1
Top patents by PatentIndex Score
65 records- 0199US11640116B2Metrology method, computer product and systemASML NETHERLANDS BV·Filed 2020·Granted May 2, 2023·5 cites·20 claims
- 0298US11204239B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2020·Granted Dec 21, 2021·7 cites·36 claims
- 0397US11428521B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2021·Granted Aug 30, 2022·3 cites·29 claims
- 0497US10718604B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2019·Granted Jul 21, 2020·6 cites·22 claims
- 0596US10078268B2Determination of stack difference and correction using stack differenceASML NETHERLANDS BV·Filed 2017·Granted Sep 18, 2018·6 cites·26 claims
- 0695US10527953B2Metrology recipe selectionASML NETHERLANDS BV·Filed 2017·Granted Jan 7, 2020·5 cites·24 claims
- 0795US10338484B2Recipe selection based on inter-recipe consistencyASML NETHERLANDS BV·Filed 2016·Granted Jul 2, 2019·10 cites·29 claims
- 0894US11385553B2Metrology method, patterning device, apparatus and computer programASML NETHERLANDS BV·Filed 2021·Granted Jul 12, 2022·2 cites·20 claims
- 0994US10386176B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2015·Granted Aug 20, 2019·5 cites·20 claims
- 1093US10527949B2Metrology method, computer product and systemASML NETHERLANDS BV·Filed 2015·Granted Jan 7, 2020·4 cites·34 claims
- 1192US11422476B2Methods and apparatus for monitoring a lithographic manufacturing processASML NETHERLANDS BV·Filed 2020·Granted Aug 23, 2022·2 cites·20 claims
- 1292US11385552B2Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2020·Granted Jul 12, 2022·2 cites·11 claims
- 1392US8908147B2Method and apparatus for determining an overlay errorDEN BOEF ARIE JEFFREY·Filed 2011·Granted Dec 9, 2014·9 cites·20 claims
- 1491US12032299B2Metrology method and associated metrology and lithographic apparatusesASML NETHERLANDS BV·Filed 2020·Granted Jul 9, 2024·2 cites·25 claims
- 1591US10809628B2Method of designing metrology targets, substrates having metrology targets, method of measuring overlay, and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Oct 20, 2020·6 cites·8 claims
- 1691US9223227B2Inspection apparatus and method, lithographic apparatus, lithographic processing cell and device manufacturing methodBHATTACHARYYA KAUSTUVE·Filed 2012·Granted Dec 29, 2015·16 cites·21 claims
- 1790US10831109B2Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted Nov 10, 2020·5 cites·14 claims
- 1890US10698322B2Metrology method, computer product and systemASML NETHERLANDS BV·Filed 2019·Granted Jun 30, 2020·2 cites·35 claims
- 1989US12276921B2Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology methodASML NETHERLANDS BV·Filed 2021·Granted Apr 15, 2025·2 cites·17 claims
- 2089US10025199B2Method of designing metrology targets, substrates having metrology targets, method of measuring overlay, and device manufacturing methodASML NETHERLANDS BV·Filed 2015·Granted Jul 17, 2018·6 cites·9 claims
- 2186US10996570B2Metrology method, patterning device, apparatus and computer programASML NETHERLANDS BV·Filed 2019·Granted May 4, 2021·2 cites·25 claims
- 2285US9714827B2Metrology method and apparatus, lithographic system, device manufacturing method and substrateASML NETHERLANDS BV·Filed 2013·Granted Jul 25, 2017·6 cites·10 claims
- 2383US10908513B2Metrology method and apparatus and computer programASML NETHERLANDS BV·Filed 2018·Granted Feb 2, 2021·3 cites·19 claims
- 2482US12429328B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2022·Granted Sep 30, 2025·0 cites·20 claims
- 2582US11022896B2Mark position determination methodASML NETHERLANDS BV·Filed 2017·Granted Jun 1, 2021·3 cites·20 claims
- 2682US10001711B2Inspection method, lithographic apparatus, mask and substrateASML NETHERLANDS BV·Filed 2014·Granted Jun 19, 2018·3 cites·23 claims
- 2781US10884342B2Method and apparatus for predicting performance of a metrology systemASML NETHERLANDS BV·Filed 2016·Granted Jan 5, 2021·2 cites·20 claims
- 2880US11249404B2System and method for measurement of alignmentASML NETHERLANDS BV·Filed 2018·Granted Feb 15, 2022·2 cites·17 claims
- 2980US10635004B2Correction using stack differenceASML NETHERLANDS BV·Filed 2017·Granted Apr 28, 2020·3 cites·27 claims
- 3080US2024168388A1Method for inferring a local uniformity metricASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 3176US10394137B2Inspection method, lithographic apparatus, mask and substrateASML NETHERLANDS BV·Filed 2018·Granted Aug 27, 2019·1 cites·24 claims
- 3276US8709687B2Substrate and patterning device for use in metrology, metrology method and device manufacturing methodVAN DER SCHAAR MAURITS·Filed 2012·Granted Apr 29, 2014·3 cites·6 claims
- 3374US10656533B2Metrology in lithographic processesASML NETHERLANDS BV·Filed 2018·Granted May 19, 2020·1 cites·19 claims
- 3473US10481499B2Determination of stack difference and correction using stack differenceASML NETHERLANDS BV·Filed 2019·Granted Nov 19, 2019·0 cites·20 claims
- 3572US12130246B2Method for overlay metrology and apparatus thereofASML NETHERLANDS BV·Filed 2019·Granted Oct 29, 2024·1 cites·18 claims
- 3672US11886125B2Method for inferring a local uniformity metricASML NETHERLANDS BV·Filed 2021·Granted Jan 30, 2024·0 cites·20 claims
- 3772US11703772B2Recipe selection based on inter-recipe consistencyASML NETHERLANDS BV·Filed 2020·Granted Jul 18, 2023·0 cites·20 claims
- 3871US10345709B2Determination of stack difference and correction using stack differenceASML NETHERLANDS BV·Filed 2018·Granted Jul 9, 2019·0 cites·21 claims
- 3970US11580274B2Method and apparatus for inspection and metrologyASML NETHERLANDS BV·Filed 2016·Granted Feb 14, 2023·1 cites·20 claims
- 4070US11106142B2Metrology recipe selectionASML NETHERLANDS BV·Filed 2020·Granted Aug 31, 2021·0 cites·20 claims
- 4170US10845707B2Determination of stack difference and correction using stack differenceASML NETHERLANDS BV·Filed 2019·Granted Nov 24, 2020·0 cites·21 claims
- 4269US12204826B2Method and apparatus for inspection and metrologyASML NETHERLANDS BV·Filed 2023·Granted Jan 21, 2025·0 cites·20 claims
- 4365US12013647B2Metrology methodASML NETHERLANDS BV·Filed 2019·Granted Jun 18, 2024·0 cites·12 claims
- 4465US10901330B2Recipe selection based on inter-recipe consistencyASML NETHERLANDS BV·Filed 2019·Granted Jan 26, 2021·0 cites·20 claims
- 4563US12189305B2Metrology method and apparatus and computer programASML NETHERLANDS BV·Filed 2021·Granted Jan 7, 2025·0 cites·14 claims
- 4663US7457454B1Detailed grey scale inspection method and apparatusKLA TENCOR TECH CORP·Filed 2002·Granted Nov 25, 2008·4 cites·25 claims
- 4762US12158435B2Illumination and detection apparatus for a metrology apparatusASML NETHERLANDS BV·Filed 2020·Granted Dec 3, 2024·0 cites·20 claims
- 4861US10866527B2Methods and apparatus for monitoring a lithographic manufacturing processASML NETHERLANDS BV·Filed 2018·Granted Dec 15, 2020·0 cites·20 claims
- 4961US2025036033A1Method and apparatus for lithographic imagingASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 5060US12189314B2Metrology method and associated metrology and lithographic apparatusesASML NETHERLANDS BV·Filed 2021·Granted Jan 7, 2025·0 cites·20 claims
Showing the top 50 of 65 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →