Inventor · disambiguated record
Kazuki Denpoh
Also filed as: DENPOH KAZUKI
20 granted patents·10 pending applications·482 citations·filing 1995–2020
95Inventor score
Top patents by PatentIndex Score
30 records- 0198US9941097B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Apr 10, 2018·110 cites·8 claims
- 0298US9313872B2Plasma processing apparatus and plasma processing methodYAMAZAWA YOHEI·Filed 2010·Granted Apr 12, 2016·52 cites·27 claims
- 0395US9997332B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2016·Granted Jun 12, 2018·11 cites·6 claims
- 0494US5718763AResist processing apparatus for a rectangular substrateTOKYO ELECTRON LTD·Filed 1995·Granted Feb 17, 1998·154 cites·7 claims
- 0593US9253867B2Plasma processing apparatus and plasma processing methodYAMAZAWA YOHEI·Filed 2010·Granted Feb 2, 2016·11 cites·10 claims
- 0689US7847247B2Method of plasma particle simulation, storage medium, plasma particle simulator and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2008·Granted Dec 7, 2010·32 cites·11 claims
- 0788US8741097B2Plasma processing apparatus and plasma processing methodYAMAZAWA YOHEI·Filed 2010·Granted Jun 3, 2014·7 cites·11 claims
- 0888US8608903B2Plasma processing apparatus and plasma processing methodYAMAZAWA YOHEI·Filed 2010·Granted Dec 17, 2013·9 cites·13 claims
- 0988US8124539B2Plasma processing apparatus, focus ring, and susceptorENDOH SHOSUKE·Filed 2010·Granted Feb 28, 2012·12 cites·14 claims
- 1088US7713431B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2005·Granted May 11, 2010·16 cites·3 claims
- 1181US10804076B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2016·Granted Oct 13, 2020·3 cites·6 claims
- 1278US6828243B2Apparatus and method for plasma treatmentTOKYO ELECTRON LTD·Filed 2002·Granted Dec 7, 2004·18 cites·8 claims
- 1377US6514347B2Apparatus and method for plasma treatmentTOKYO ELECTRON LTD·Filed 2001·Granted Feb 4, 2003·17 cites·13 claims
- 1476US8409459B2Hollow cathode device and method for using the device to control the uniformity of a plasma processDENPOH KAZUKI·Filed 2008·Granted Apr 2, 2013·6 cites·4 claims
- 1576US7691226B2Electron temperature measurement method, electron temperature measurement program for implementing the method, and storage medium storing the electron temperature measurement programTOKYO ELECTRON LTD·Filed 2006·Granted Apr 6, 2010·9 cites·4 claims
- 1668US9899191B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Feb 20, 2018·1 cites·6 claims
- 1768US2020357606A1Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 1864US8829387B2Plasma processing apparatus having hollow electrode on periphery and plasma control methodKOSHIMIZU CHISHIO·Filed 2011·Granted Sep 9, 2014·1 cites·15 claims
- 1964US2020058467A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 2061US9136097B2Shower plate and substrate processing apparatusKOSHIMIZU CHISHIO·Filed 2008·Granted Sep 15, 2015·1 cites·14 claims
- 2160US2018308662A1Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 2255US2016118222A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 2352US9455133B2Hollow cathode device and method for using the device to control the uniformity of a plasma processTOKYO ELECTRON LTD·Filed 2013·Granted Sep 27, 2016·0 cites·15 claims
- 2451US2010321029A1Plasma measuring method, plasma measuring device and storage mediumTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 2550US5853803AResist processing method and apparatusTOKYO ELECTRON LTD·Filed 1997·Granted Dec 29, 1998·12 cites·7 claims
- 2648US2017256381A1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 2748US2011094682A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
- 2848US2010012274A1Focus ring, substrate mounting table and plasma processing apparatus having sameTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 2947US2007187363A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 3041US2004261946A1Plasma processing apparatus, focus ring, and susceptorTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →